Journal of Vacuum Science & Technology B

Papers
(The median citation count of Journal of Vacuum Science & Technology B is 1. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2021-02-01 to 2025-02-01.)
ArticleCitations
Physical vapor deposition of Yb-doped Cs2AgSbBr6 films22
In situ electron-beam-induced mechanical loading and fracture of suspended strained silicon nanowires18
Fabrication of microstructures on curved hydrogel substrates17
High-temperature characteristics of GaN/InGaN multiple-quantum-well UV photodetectors fabricated on sapphire substrate: Analysis of photovoltaic and carrier transit time properties17
Exploring oxide-nitride-oxide scalloping behavior with small gap structure and chemical analysis after fluorocarbon or hydrofluorocarbon plasma processing16
Topological impact of a simple self-replication geometric structure with great application potential in vacuum pumping and photovoltaic industry16
Selective metal-carbides hardmask strip with chlorine and oxygen plasma15
Tungsten oxide nanowires prepared by thermal oxidation for application in cold cathode flat panel x-ray source15
Determining the oxygen detection limit with magnetic sector dynamic secondary ion mass spectrometry (SIMS)15
Experimental research on airflow efficiency of dynamic gas lock for extreme ultraviolet lithography14
Physical vapor deposition simulator by graphical processor unit ray casting14
Effect of the kinetic energy on particle ejection process from carbon nanotubes bombarded by kilo-electron-volt C6014
Fabrication of pyramid-shaped gold tip for adiabatic nanofocusing of surface plasmon polaritons14
A novel design of a retarding field electron energy analyzer with a cavity electrode providing extremely high energy resolution11
Thickness dependent field emission study of LaB6 coated Si nanowire arrays10
Low-macroscopic field emission structure: Using the shape of the conductor to identify a local difference in electric potential9
Observing secondary-electron yield and charging in an insulating material by ultralow-voltage scanning electron microscope9
Behavior of the field enhancement due to mutual depolarization on a pair of triangular emitters at short and large separations9
X-ray photoelectron spectroscopy surface oxidation study of remote plasma-enhanced chemical vapor deposition-grown Ge1−xSnx/Si alloys9
Accuracy requirements of the microarrayed Einzel lens9
Sensitivity of thermal conductivity vacuum gauges for constant current and constant temperature operation8
ZnO/Ag/graphene transparent conductive oxide film with ultrathin Ag layer8
Computational analysis of vertical comb-drive microactuator with extended mirror for manipulation of light8
Comparison of temperature, current density, and light intensity distributions of nano-resistor patterns for an improved solid state incandescent light emitting device simulation model8
Formation of ideally ordered porous anodic zirconia by anodization of vacuum deposited Zr on molds8
Trilayer process for T-gate and Γ-gate lithography using ternary developer and proximity effect correction superposition8
Simplified CVD route to near-zero thickness silicon nitride films8
Top electrode dependence of the write-once-read-many-times resistance switching in BiFeO3 films7
Response to “Comment on ‘Restoration of the original depth distribution from the SIMS profile using the depth resolution function in framework of RMR model’” [J. Vac. Sci. Technol. B 41, 024003 (207
Degradation of GaN field emitter arrays induced by O2 exposure7
Comment on “Restoration of the original depth distribution from the SIMS profile using the depth resolution function in framework of RMR model” [J. Vac. Sci. Technol. B 41, 024003 (2023)]7
Experimental study of flake graphite large-area explosion electron emission cathode performance based on particle size discrepancy7
Characterization of GeO2 films formed on Ge substrate using high pressure oxidation7
Computational study of plasma dynamics and reactive chemistry in a low-pressure inductively coupled CF4/O2 plasma7
Research on the improvement of the adhesion strength of the Cu films deposited on the Al2O3 films7
Sodium adsorption on nanometer-thick TiO2 channel thin-film transistors for enhanced drain currents7
Mechanism and solution of sharp defects in trench double-diffused metal-oxide semiconductor polysilicon recess etching7
E-mode AlGaN/GaN HEMTs using p-NiO gates7
Plasma-assisted thermal-cyclic atomic-layer etching of tungsten and control of its selectivity to titanium nitride7
Highly selective GaAs/AlGaAs dry etching using HBr/SF6/He7
Fabrication of black GaAs by maskless inductively coupled plasma etching in Cl2/BCl3/O2/Ar chemistry6
Strong-field electron emission from gold needle tips6
Heating samples to 2000 °C and above for scanning tunneling microscopy studies in ultrahigh vacuum6
In situ determination of sputtered Ni–Cu film composition from emission intensities6
Scanning electron microscope imaging by selective e-beaming using photoelectron beams from semiconductor photocathodes6
Vacuum technique of nanodiamond dispersing on a substrate from an aqueous suspension6
Soft and hard trimming of imprint resist masks to fabricate silicon nanodisk arrays with different edge roughness6
Impact of electrical aging on x-ray image quality and dose rate with vertically aligned carbon nanotube based cold cathode electron beam (C-beam)6
Strain engineering in III-V photonic components through structuration of SiNx films6
Roughness-generation mechanism of Ru etching using Cl2/O2-based plasma for advanced interconnect6
Numerical investigation of flow and particles contamination in reticle mini environment for extreme ultraviolet lithography6
In situ metrology of direct-write laser ablation using optical emission spectroscopy6
Evolution of lithography-to-etch bias in multi-patterning processes6
Modification of discharge sequences to control the random dispersion of flake particles during wafer etching6
Rubbing-induced site-selective deposition of 2D material patterns on nanomembranes6
Si-capping-induced surface roughening on the strip structures of Ge selectively grown on an Si substrate6
Optical and electronic properties of Ge1−xSnx/Si alloys grown by remote plasma-enhanced chemical vapor deposition6
Vacuum system of the Space Plasma Environment Research Facility6
Chemical and electrical modifications of few-layer graphene films via sub-10 keV electron beam irradiation6
Fluorescence alignment simulation for atomic-scale position adjustment in ultraviolet nanoimprint lithography6
Impact of photovoltaic effect on performance enhancement of triboelectric nanogenerator for energy harvesting applications6
Influence of thermal contact resistance on the field emission characteristics of a carbon nanotube6
Cryogenic etching of positively tapered silicon pillars with controllable profiles5
GaAs/GeSn/Ge n–i–p diodes and light emitting diodes formed via grafting5
Field electron emission and field ion microscope images of layered material MoS25
Multiple electron beam generation from InGaN photocathode5
Strain-tuned optical properties of bilayer silicon at midinfrared wavelengths5
Limitations of the independent control of ion flux and energy distribution function in high-density inductively coupled chlorine plasmas5
Investigation of the deposition of α-tantalum (110) films on a-plane sapphire substrate by molecular beam epitaxy for superconducting circuit5
Temperature dependence of the infrared dielectric function and the direct bandgap of InSb from 80 to 725 K5
Ultralow impact energy dynamic secondary ion mass spectrometry with nonfully oxidizing surface conditions5
Multi-step plasma etching of high aspect ratio silicon nanostructures for metalens fabrication5
Ion-beam-assisted growth of cesium-antimonide photocathodes5
Comparative study of thermal desorption and pumping performance for TiZrV-, Pd-, or Pd/TiZrV-coated copper tubes5
Numerical analysis of high vacuum packaging efficiency for narrow structured devices5
Comparison of GeSn alloy films prepared by ion implantation and remote plasma-enhanced chemical vapor deposition methods5
Electron transport in macroscopic borosilicate capillaries with bending angles of 90° and 360°5
Seesaw-type modulation of secondary electron emission characteristics of polytetrafluoroethylene-MgO composite coating5
Numerical simulations of heterojunction GaN nanopillar light emitting diodes5
High quality factor silicon nitride nanomechanical resonators fabricated by maskless femtosecond laser micromachining5
Effects of graphene doping and gas adsorption on the peak positions of graphene plasmon resonance and adsorbate infrared absorption5
Nonevaporable getter-MEMS for generating UHV conditions in small volumina5
Enhancement of performance and reliability in MOSFETs via high-pressure microwave annealing4
Novel low-temperature and high-flux hydrogen plasma source for extreme-ultraviolet lithography applications4
Optoelectronic performance characterization of MoS2 photodetectors for low frequency sensing applications4
Integrated silicon electron source for high vacuum microelectromechanical system devices4
Erratum: “Electronic structure of InSb (001), (110), and (111)B surfaces” [J. Vac. Sci. Technol. B 41, 032808 (2023)]4
Fundamental study on the selective etching of SiGe and Si in ClF3 gas for nanosheet gate-all-around transistor manufacturing: A first principle study4
Morphology of Ge thin films crystallized by Au-induced layer exchange at low temperature (220 °C)4
Fabrication of ultrahigh aspect ratio Si nanopillar and nanocone arrays4
Enhancing performance of microbolometers by utilizing low-temperature polycrystalline silicon4
Device feasibility and performance improvement methodologies for thin film transistors using In-Ga-Sn-O channels prepared by atomic-layer deposition4
Photoassisted electron emission from planar-type electron source based on graphene/oxide/silicon structure4
Comparing the properties and growth of graphene on electrolytic and rolled Cu foils by chemical vapor deposition4
Rapid detection of radiation susceptible regions in electronics4
Graphene-based capacitive monolithic microphone with optimized air gap thickness and damping4
4H-SiC layer with multiple trenches in lateral double-diffused metal-oxide-semiconductor transistors for high temperature and high voltage applications4
Rapid SARS-CoV-2 diagnosis using disposable strips and a metal-oxide-semiconductor field-effect transistor platform4
Wet and dry etching of ultrawide bandgap LiGa5O8 and LiGaO24
Optical metasurface fabricated using 3D nanoimprint lithography4
Measurements of He-Ar, He-N2, and He-air thermal creep slip and accommodation coefficients at high temperatures4
Field emission arrays from graphite fabricated by laser micromachining4
Monitoring of rapid thermal anneal with secondary ion mass spectrometry4
Nanofabrication of high transition temperature superconductive electronics with focused helium ion irradiation4
Novel process integration flow of germanium-on-silicon FinFETs for low-power technologies4
Engineering of ZrO2-based RRAM devices for low power in-memory computing4
Exploring electromechanical utility of GaAs interdigitated transducers; using finite-element-method-based parametric analysis and experimental comparison4
In-plasma photo-assisted etching of Si with chlorine aided by an external vacuum ultraviolet source4
Synthesis of silver-decorated titanium dioxide nanostructured films for enhanced visible light photocatalysis4
Heat-transfer modeling of the gas gap under a wafer4
Effect of ultraviolet light on field emission performance and lifetime of lateral field emitter devices4
Electron emission performance analysis and application of carbon nanotube cold cathode prepared by cold pressing process4
Modeling basic tip forms and its effective field emission parameters4
Stacked hydrogel-based brain-on-chips utilizing capillary force flow pinning4
Preface for the Special Topic Collection Honoring Dr. Gary McGuire’s Research and Leadership as Editor of the Journal of Vacuum Science & Technology for Three Decades4
Current–voltage characteristics of Ag/Nb:SrTiO3/Ag and Au/Nb:SrTiO3/Ag heterostructures4
Analytic study of exposure contrast over feature edge in electron-beam lithography4
Temperature dependence of the optical phonon reflection band in GaP4
Long term field emission current stability characterization of planar field emitter devices4
Atomic-resolution lithography with an on-chip scanning tunneling microscope4
MeV proton and neutron damage effects on deep-ultraviolet light-emitting diodes4
Time response measurement of pulsed electron beam from InGaN photocathode4
Comparative studies of metamorphic and strained InGaAs p-type semiconductor - intrinsic absorption layer - n-type semiconductor photodetector for low-temperature CH4 detection4
Self-aligned fabrication of vertical, fin-based structures3
Fabrication of blazed gratings by tilted reactive ion beam etching with the side mask for augmented reality applications3
Surface wetting on micromilled and laser-etched aluminum with ion-beam postprocessing3
Multipurpose active scanning probe cantilevers for near-field spectroscopy, scanning tunnel imaging, and atomic-resolution lithography3
Review on remote phonon scattering in transistors with metal-oxide-semiconductor structures adopting high-k gate dielectrics3
Compositional dependence of direct transition energies in SixGe1−xySny alloys lattice-matched to Ge/GaAs3
Gate offset and emitter design effects of triode cold cathode electron beams on focal spot sizes for x-ray imaging techniques3
Electron emission properties of titanium nitride coated volcano-structured silicon emitters3
Retraction: “Dependence of structural and optical properties of In0.23Ga0.77As/GaAs quantum wells on misfit dislocations: Different critical thickness for dislocation generation and degradation of opt3
Selective plasma etching of silicon-containing high chi block copolymer for directed self-assembly (DSA) application3
Selectively patterned Mg-doped GaN by SiNx-driven hydrogen injection3
Bilayer metal etch mask strategy for deep diamond etching3
Organotrialkoxysilane-mediated synthesis of Ni–Pd nanocatalysts at lower concentrations of noble metal: Catalysts for faster hydrogen evolution kinetics3
Rapid preparation of amorphous Al2O3 on graphene surface by plasma electrolysis technology3
Tapered quantum cascade lasers with isolated channel emitting at 9 μm3
Novel excitation structure to improve the performance of a miniature radio frequency ion thruster3
Spectroscopic, structural, and strain-dependent analysis of suspended bulk WSe2 sheets3
Calibrated in-vacuum quantum efficiency system for metallic and III-V thin-film photocathodes3
Effects of H+ ion bombardment on GaAs photocathode surface with Cs-O and Cs-F activation layers3
In situ mass spectrometric investigation to probe GeSn growth dynamics and mechanisms in the chemical vapor deposition processes3
Infrared optical properties of SiGeSn and GeSn layers grown by molecular beam epitaxy3
Low power silicon evaporation source—Construction, performances, and applications3
Defect formation in InGaAs/AlSb/InAs memory devices3
Hafnium oxide films grown on silicon substrates by electron beam-induced deposition3
Microstructure, creep properties, and electrical resistivity of magnetron sputtering deposited SAC305 thin films3
Dynamic switching operation of diamond MOSFETs with NO2 p-type doping and Al2O3 gate insulation and passivation3
Roll-to-roll reactive ion etching of large-area nanostructure arrays in Si: Process development, characterization, and optimization3
Investigation on the heat transfer characteristics of flexible vacuum glass based on cross-laminated microcavities3
Leakage rate detection of ConFlat seals in aluminum and stainless steel flanges under mechanical loads for quantum optical experiments in space3
Fabrication of ultrathin suspended membranes from atomic layer deposition films3
Electrical characterization of gate stack charge traps in floating body gate-all-around field-effect-transistors3
Hybrid cross correlation and line-scan alignment strategy for CMOS chips electron-beam lithography processing3
Diagnostics of target-cavity confined plasmas produced by nanosecond pulsed laser ablation of graphite3
Heat transfer mechanism of electrostatic chuck surface and wafer backside to improve wafer temperature uniformity3
On the charge density and potential near the surface of a field emitter3
In situ plasma pin-up clean process for backside bevel polymer removal, defect reduction, and queue time relaxation3
Optical metrology of characterizing wetting states3
Noise reduction and peak detection in x-ray diffraction data by linear and nonlinear methods3
Radiation damage in GaN/AlGaN and SiC electronic and photonic devices3
Photoinduced carrier transport mechanism in pn- and nn-GaN/GaON heterojunctions3
Morphologic and electronic changes induced by thermally supported hydrogen cleaning of GaAs(110) facets3
Application of deep-learning based techniques for automatic metrology on scanning and transmission electron microscopy images3
Modeling and algorithm of three-dimensional metrology with critical dimension scanning electron microscope3
AlGaN nanowire deep ultraviolet LEDs with polarization enhanced tunnel junction and p-AlGaN layer by molecular beam epitaxy3
Overlay control solution for high aspect ratio etch process induced overlay error3
Reduction of exposing time in massively-parallel E-beam systems3
Synthesis of NiS2 nanomaterial as wide range pressure sensor3
Comparison of single and concentric split-ring resonator generated microplasmas3
Investigating the pattern transfer fidelity of Norland Optical Adhesive 81 for nanogrooves by microtransfer molding3
Enhanced optoelectronic properties of magnetron sputtered ITO/Ag/ITO multilayers by electro-annealing3
Optical properties of Mo and amorphous MoOx, and application to antireflection coatings for metals3
Thin films residual stress profile evaluation using test microstructures: Illustrated on an example of AlN film3
Oxygen-free transport of samples in silane-doped inert gas atmospheres for surface analysis2
Field emission: Applying the “magic emitter” validity test to a recent paper, and related research-literature integrity issues2
Coaxial ion source: Pressure dependence of gas flow and field ion emission2
Development of GeSn epitaxial films with strong direct bandgap luminescence in the mid-wave infrared region using a commercial chemical vapor deposition reactor2
Understanding 3D anisotropic reactive ion etching of oxide-metal stacks2
Investigating pathways for deep-UV photolithography of large-area nanopost-based metasurfaces with high feature-size contrast2
Postdeposition annealing effect on atomic-layer-deposited Al2O3 gate insulator on (001) β-Ga2O32
Nanometer-scale capillary-driven flow and molecular weight govern polymer nanostructure deposition from a heated tip2
Effects of gases on the field emission performance of silicon gated field emitter array2
Thermally stable radio frequency power and noise behaviors of AlGaN/GaN high electron mobility transistor without voltage-blocking buffer layer design2
Selective growth of graphene films on gallium-focused ion beam irradiated domains2
Ordered silicon nanocone fabrication by using pseudo-Bosch process and maskless etching2
Transmission conductance of a cylindrical tube with wall pumping2
Investigation into the effect of a PECVD-deposited SiOx chamber coating on the selective, radical-based NF3 etching of TaN with respect to BEOL low-k2
Physics based model of an AlGaN/GaN vacuum field effect transistor2
Surface treatment of carbon fiber reinforced polymer for adhesive bonding with pioneer epoxy using atmospheric pressure plasma jet2
Temperature effects on gated silicon field emission array performance2
Optimization of silicon etch rate in a CF4/Ar/O2 inductively coupled plasma2
Designing MoS2 channel properties for analog memory in neuromorphic applications2
Measurement of field emission array current distributions by metal-coated CMOS image sensors2
Depth-resolved cathodoluminescence and surface photovoltage spectroscopies of gallium vacancies in β-Ga2O3 with neutron irradiation and forming gas anneals2
Proposal that interpretation of field emission current–voltage characteristics should be treated as a specialized form of electrical engineering2
Improving detection of plasma etching end point using light compensation on optical emission spectra2
Outgassing rate comparison of seven geometrically similar vacuum chambers of different materials and heat treatments2
Acquisition of field ion microscope image using deflector during atom probe analysis2
Grain growth of Cu wires during Joule heat welding2
Simulation analyses of carrier dynamics in npn-type GaN-heterojunction bipolar transistors with different hole-concentration p-base layers2
Thermal-field emission from cones and wires2
Spongy TiO2 layers deposited by gig-lox sputtering processes: Contact angle measurements2
Model for the current plateau observed on the (310) plane of a room temperature W field electron source2
High current field emission from Si nanowires on pillar structures2
Observation of ground loop signals in GaN monolithically integrated devices2
Thermal sensitivity and current-voltage-temperature characteristics in Pt/epitaxy n-Si/n+Si structures as a function of Schottky contact area2
Film characteristics of atmospheric pressure plasma-treated chitosan solution2
Hardmask engineering by mask encapsulation for enabling next generation reactive ion etch scaling2
Publisher’s Note: “Silicon field emitters fabricated by dicing-saw and wet-chemical-etching” [J. Vac. Sci. Technol. B 39, 013205 (2021)]2
Large-area fabrication of nanometer-scale features on GaN using e-beam lithography2
Facile fabrication of nanoporous structure on β titanium alloy to eliminate stress shielding for bone implant2
Evaluation of dry stored disposable sensor strip on rapid SARS-CoV-2 detection platform2
Electrochemically fabricated ultrafine nickel masks for the fabrication of MoS2-based devices2
Diffusive separation in rarefied plume interaction2
Multiple material stack grayscale patterning using electron-beam lithography and a single plasma etching step2
Magnetron co-sputtered μm-thick Mo–Cu films as structural material with low heat extension for key parts of high-power millimeter-band vacuum microelectronic devices2
Secondary ion mass spectrometry quantification: Do you remember when a factor of 2 was good enough?2
Piezoelectric effect of crystal nanodomains on the friction force2
Design, modeling, and fabrication of high frequency Oersted lines for electron spin manipulation in silicon based quantum devices2
Observation of interfacial strain relaxation and electron beam damage thresholds in Al0.3In0.7N/GaN heterostructures by transmission electron microscopy2
Near zero-field magnetoresistance and defects in gallium nitride pn junctions2
Threshold switching stabilization of NbO2 films via nanoscale devices2
Using block-copolymer nanolithography as a tool to sensitively evaluate variation in chemical dry etching rates of semiconductor materials with sub-5 nm resolution2
Volatile vapor knife of immersion lithography hood using solutal Marangoni effect2
Flexible refractive and diffractive micro-optical films shaped by fitting aspherical microprofiles with featured aperture and depth and their spatial arrangement for imaging applications2
A novel thermionic crystal electron emission effect similar to Kikuchi lines2
Blue and near infrared luminescence degradation by electron beam irradiation in Y2O3:Tm3+ nanophosphors2
Rate-controlled cycle etching of GaN by cycle exposure to BCl3 and F2-added Ar plasma at a substrate temperature of 400 °C2
Thermal analysis with high accuracy of multi-beam mask fabrication2
Integrated interferometry for in-process monitoring of critical dimension in vertical NAND flash memory dry etch2
Effect of inductively coupled plasma etch on the interface barrier behavior of (001) β-Ga2O3 Schottky barrier diode2
Fabrication of silicon W and G center embedded light-emitting diodes for electroluminescence2
Role of tin clustering in band structure and thermodynamic stability of GeSn by atomistic modeling2
Endoscope-assisted manipulator for precooling and deposition in low-temperature scanning tunneling microscope systems2
All field emission models are wrong, … but are any of them useful?1
Cr and CrOx etching using SF6 and O2 plasma1
In situ monitoring of sapphire nanostructure etching using optical emission spectroscopy1
Patterning characteristic control of sol-gel-derived random-structure oligomeric silsesquioxanes having a diazonaphthoquinone derivative1
Novel wet transfer technology of manufacturing flexible suspended two-dimensional material devices1
Microsphere photolithography using reusable microsphere array mask for low-cost infrared metasurface fabrication1
Pyroelectric lithium niobate electron emission-based ion-pump1
Novel technique to control the focal spot size using carbon nanotube based cold cathode electron beam (C-beam) architecture1
Evolution of hard carbon layers on Ti-45Al-2Nb-2Mn-1B by plasma enhanced chemical vapor deposition of hydrocarbons and hydrogen1
Method for improving dry etching end point detection based on change in time accumulation correlation of plasma emitting wavelengths1
Effects of athermal carrier injection on Co-60 gamma-ray damage in SiC merged-PiN Schottky diodes1
Nanofabricating neural networks: Strategies, advances, and challenges1
Long, stitch-free slot waveguide with s-bend tapered couplers for IR-sensing applications using electron beam lithography1
Influence of structure and composition of diamond-like nanocomposite coatings on cell viability1
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