JM3: Journal of Micro-Nanopatterning Materials and Metrology

Papers
(The median citation count of JM3: Journal of Micro-Nanopatterning Materials and Metrology is 4. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2020-03-01 to 2024-03-01.)
ArticleCitations
Perspectives and tradeoffs of absorber materials for high NA EUV lithography19
Mask-absorber optimization: the next phase18
High-power EUV lithography: spectral purity and imaging performance10
Deep learning-based detection, classification, and localization of defects in semiconductor processes9
Efficient Bayesian inversion for shape reconstruction of lithography masks7
Line edge roughness measurement on vertical sidewall for reference metrology using a metrological tilting atomic force microscope7
High-voltage CD-SEM-based application to monitor 3D profile of high-aspect-ratio features5
Cascade and cluster of correlated reactions as causes of stochastic defects in extreme ultraviolet lithography4
Investigating extreme ultraviolet radiation chemistry with first-principles quantum chemistry calculations4
Particle and pattern discriminant freeze-cleaning method4
Rayleigh or Abbe? Origin and naming of the resolution formula of microlithography4
Resolution enhancement with source-wavelength optimization according to illumination angle in optical lithography4
Thermoplastic polyurethane-based flexible multilayer microfluidic devices4
Understanding the influence of three-dimensional sidewall roughness on observed line-edge roughness in scanning electron microscopy images4
0.013355016708374