JM3: Journal of Micro-Nanopatterning Materials and Metrology

Papers
(The median citation count of JM3: Journal of Micro-Nanopatterning Materials and Metrology is 4. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2020-04-01 to 2024-04-01.)
ArticleCitations
Perspectives and tradeoffs of absorber materials for high NA EUV lithography19
Mask-absorber optimization: the next phase18
High-power EUV lithography: spectral purity and imaging performance11
Deep learning-based detection, classification, and localization of defects in semiconductor processes9
Efficient Bayesian inversion for shape reconstruction of lithography masks7
High-voltage CD-SEM-based application to monitor 3D profile of high-aspect-ratio features5
Cascade and cluster of correlated reactions as causes of stochastic defects in extreme ultraviolet lithography5
Particle and pattern discriminant freeze-cleaning method4
Thermoplastic polyurethane-based flexible multilayer microfluidic devices4
Resolution enhancement with source-wavelength optimization according to illumination angle in optical lithography4
Investigating extreme ultraviolet radiation chemistry with first-principles quantum chemistry calculations4
Understanding the influence of three-dimensional sidewall roughness on observed line-edge roughness in scanning electron microscopy images4
Rayleigh or Abbe? Origin and naming of the resolution formula of microlithography4
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