JM3: Journal of Micro-Nanopatterning Materials and Metrology

Papers
(The H4-Index of JM3: Journal of Micro-Nanopatterning Materials and Metrology is 6. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2020-03-01 to 2024-03-01.)
ArticleCitations
Perspectives and tradeoffs of absorber materials for high NA EUV lithography19
Mask-absorber optimization: the next phase18
High-power EUV lithography: spectral purity and imaging performance10
Deep learning-based detection, classification, and localization of defects in semiconductor processes9
Efficient Bayesian inversion for shape reconstruction of lithography masks7
Line edge roughness measurement on vertical sidewall for reference metrology using a metrological tilting atomic force microscope7
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