JM3: Journal of Micro-Nanopatterning Materials and Metrology

Papers
(The H4-Index of JM3: Journal of Micro-Nanopatterning Materials and Metrology is 5. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2020-04-01 to 2024-04-01.)
ArticleCitations
Perspectives and tradeoffs of absorber materials for high NA EUV lithography19
Mask-absorber optimization: the next phase18
High-power EUV lithography: spectral purity and imaging performance11
Deep learning-based detection, classification, and localization of defects in semiconductor processes9
Efficient Bayesian inversion for shape reconstruction of lithography masks7
Cascade and cluster of correlated reactions as causes of stochastic defects in extreme ultraviolet lithography5
High-voltage CD-SEM-based application to monitor 3D profile of high-aspect-ratio features5
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