Progress in Electromagnetics Research-PIER

Papers
(The H4-Index of Progress in Electromagnetics Research-PIER is 16. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2021-02-01 to 2025-02-01.)
ArticleCitations
Systemically Delivered, Deep-tissue Nanoscopic Light Sources49
Theoretical Analysis on Generating Composite-Orbital Angular Momentum Beam42
Fast Calculations of Vector Electromagnetics in 3D Periodic Structures Based on Multiple Scattering Theory and Broadband Green's Function40
Optical Neural Networks for Holographic Image Recognition (Invited Paper)33
Two-dimensional Acoustic Asymmetric Vortex Focusing Lens by Binary-phase Mode Converters29
Optimization Design of Photonic-crystal Surface-emitting Lasers: Toward Large Bandwidth and Single-lane 200 G Optical Transmission27
Confocal Microscopy with Optimized Excitation and Emission Wavelength for Ultradeep and Multi-channel Bioimaging24
Large Dynamic Range Slope-assisted BOTDA Based on Unbalanced Frequency-shifted Double Sidebands Detection22
Dual-modal Fluorescent Hyperspectral Micro-CT for Precise Bioimaging Detection21
Fabricated Magnetic-dielectric Synergy Fe@Carbon Microspheres by Spray-Pyrolysis with Excellent Microwave Absorption in C-band19
Josephson Traveling Wave Parametric Amplifier as Quantum Source of Entangled Photons for Microwave Quantum Radar Applications19
Wideband High Gain Lens Antenna Based on Deep Learning Assisted Near-zero Refractive Index Metamaterial19
Highly Transparent Tunable Microwave Perfect Absorption for Broadband Microwave Shielding18
Research on the Radiation Properties of Tapered Slot Magnetoelectric Antenna17
VOC DETECTIONS WITH OPTICAL SPECTROSCOPY17
Information-theoretic Measures for Reconfigurable Metasurface-enabled Direct Digital Modulation Systems: An Electromagnetic Perspective16
A Novel Optical Proximity Correction (OPC) System Based on Deep Learning Method for the Extreme Ultraviolet (EUV) Lithography16
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