Journal of Photopolymer Science and Technology

Papers
(The TQCC of Journal of Photopolymer Science and Technology is 1. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2021-08-01 to 2025-08-01.)
ArticleCitations
Synthesis of a Dipyridyl Disulfide Cross-linking Reagent and Its Application to Photo-adhesion of Dissimilar Materials10
Chemical Mechanisms of Metal-Based Extreme Ultraviolet Resists9
Positive-Tone Organoantimony Resists9
Synthesis and Properties of Polyguanamines Containing <i>N</i>-Phenylmelamine Units8
Reliability Study for Photosensitive RDL Material7
Comparison of Photoresist Sensitivity between KrF, EB and EUV Exposure6
Preparation of Rigid Polyimides from Various Dianhydrides and 4,4’’’-Diaminoquaterphenyl and Comparison with Properties of Polyimides from 3,3’’’,4,4’’’-<i>p</i>-Quaterphenyltetracarboxyli6
Magnetically-Actuated Dynamic Culture System for Investigating Mechanical Effects on Biological Growth5
Theory of Photodecomposable Base in Chemically Amplified Resist4
Nanoimprint Lithography for Collagen Micropatterning at Low-Temperature 5℃ with TiO<sub>2</sub>-SiO<sub>2</sub> Gas-Permeable Porous Mold4
Polymeric Antibacterial Surfaces with Nano-pillar Arrays Mimicking Cicada Wings4
Photocured Blended Films of Diarylfluorene having Naphthalene Moieties and TiO<sub>2</sub> with High Refractive Indices4
The Photopolymer Science and Technology Award3
Functional Group Influence on Block Copolymer Segment Interactions: An Analysis via Flory–Huggins and Hansen Solubility Parameters3
Agitation inside the Liquid Film on Two-Fluid Jet Sprayed Surface3
The Photopolymer Science and Technology Award3
Raman Spectral Data–Driven Analysis of Diamond-like Carbon Films Deposited Using the Radio-frequency Plasma-enhanced Chemical Vapor Deposition Method3
Optical Oxygen Measurement using Microneedle of Bioabsorable Polymer3
Development of Selenonium PAGs in EUV Lithography toward High Sensitivity Achievement3
Characterization of Photoacid Generator Bound Resist with X-ray Absorption Spectroscopy at NewSUBARU3
The Effect of Side-Chain Modification via Hydrogen Bonding on the Microphase-Separated Structure of PS-<i>b</i>-P4VP-<i>b</i>-PMMA3
Synthesis of Kapton-type Polyamide Ester and Study of Their Electrophoretic Deposition Function3
Resist Removal Using Laser Irradiation Combined with Ozone Water Treatment3
Low Temperature Curable Low Dk & Df Polyimide for Redistribution Layer3
Evaluation of Surface-Enhanced Raman Scattering Substrate Consisting of Gold Nanoparticles Grown on Nanoarrays of Boehmite Fabricated using Magnetron Sputtering Process3
Benzothiadiazole-Based Fused-Ring Electron Acceptors for Green-Light Wavelength-Selective Organic Solar Cells3
High-Refractive-Index Photosensitive Siloxane Coatings for Optical Fingerprint Sensor2
The Removal of Acid Violet 7 from Aqueous Solutions by Photocatalytic-Poly(Ethylene Glycol Dimethacrylate-<i>co</i>-4-Vinylpyridine)-Titanium Dioxide Nanocomposite Beads: Kinetic, Isotherm2
Visible-Light Sensitive Reworkable Resins for Dental Application: Improved Stability2
Composite Membrane of Bi<sub>2</sub>WO<sub>6</sub>-NCQDs Laminated Hetero-junction Loaded on PES Support for Photo-catalytic Degradation of Organic Pollutants2
Synthesis of ABC/ACB-Type Triblock Copolymers Composed of Polystyrene and Polymethacrylate via Living Anionic Polymerization and Analyzing the Effect of Casting Solvents on Higher-Order Structures2
Synthesis of Highly Luminescent CsPbCl<sub>3</sub> Perovskite Nanocrystals with Oleylammonium Chloride as an Alternative Halide Source2
A Novel Process to Reduce Roughness in Chemically Amplified Resist (CAR) for Next-Generation Lithography2
Multi-Trigger Resist for EUV lithography2
Synthesis and Photocuring Properties of One-component Polymerizable Thioxanthone-based Photoinitiators with High Migration Stability2
Droplet-Dispensed Ultraviolet Nanoimprint Lithography in Mixed Condensable Gas of Trans-1,3,3,3-Tetrafluoropropene and Trans-1-Chloro-3,3,3-Trifluoropropene2
Ultra-hydrophilic Diamond-like Carbon Coating on an Inner Surface of a Small-diameter Long Tube with an Amino Group by AC High-voltage Plasma Discharge2
Breaking Boundaries of Photoinitiators: New Ways to Improve the Reactivity of Radical Polymerization2
High Speed Ashing of Ion Implanted Photoresist by Microwave Excited Water Vapor Plasma with Powered Substrate2
Antibacterial Property of Si Nanopillars for Anti-Microbial Resistance (AMR) Bacteria2
Evaluation of Basic Behavior of Acrylic Polymer Changing Composition by KrF, ArF and EUV Exposure1
Synthesis and Structural Characterization of Polyimide Containing Diphenylsiloxane Unit1
Thermal, Optical, and Dielectric Properties of Bio-based Polyimides Derived from an Isosorbide-containing Dianhydride and Diamines with Long Alkyl Chains1
Relationship between Defect Risks and Effective Reaction Radius for Deprotection in Chemically Amplified Resist Process for Extreme Ultraviolet Lithography1
Stochastic Simulation Study of Pattern Formation in EUV resists with Photo-Decomposable Quenchers1
Degradation of Modified Polystyrenes Having Degradable Units by Near Infrared Light Irradiation in The Presence of A Photon Upconversion Nanoparticle and A Photoacid Generator1
Photo-reactivity of 2,4,6-Tris(benzylthio)-1,3,5-triazines and Accompanying Refractive Index Change1
High Packing Efficiency Deployment Method Using Swelling Hydrogels Inspired by Out-of-Plane Biological Deformation1
TiO<sub>2</sub>-SiO<sub>2</sub> Radical-Based Gas-Permeable Mold for High-Precision UV Nanoimprint Lithography1
Preparation of a Polysilane–Methacrylate Copolymer with Two Methacrylate Species1
Nanoimprint Lithography and Microinjection Molding Using Gas-Permeable Hybrid Mold for Antibacterial Nanostructures1
Durability Test of Replica Mold in UV Nanoimprinting and Enlargement of Mold Patterned Area by Mold Stitching1
Novel Low <i>D<sub>f</sub></i> Photosensitive Materials for Redistribution Layer1
Surface Cleaning and Modification of Oxide Films by Atomic Hydrogen Annealing1
Spatial Distribution Imaging of Resist Thin Film with Micrometer Resolution using Reflection Type Soft X-ray Projection Microscope1
High Resolution and Low Stress Photo-Definable Polyimide1
Behavior of Secondary Electrons: Estimation of the Ionization Yield in Poly(hydroxystyrene) under EUV Irradiation Based on Binary Encounter Theory and Continuous Slowing-Down Spectrum1
Characteristic of Immunosorbent Assay using Micro Capillary Arrays coated by SiCOxHy CVD Films1
A 3D-Simulation and Experimental Study of the Fluid Flow Around a Nano-Step Structure Formed by UV-NIL1
Surface Modification of Fluoropolymers by Atomic Hydrogen1
Novel Temporary Bonding/Debonding System Enabling Advanced Packaging Process1
Fundamental Evaluation of KrF Resist Changing Formulation by EB and EUV Exposure1
Present Status of EUV Interference Lithography at NewSUBARU1
Immobilization of CYP1A2 and CYP Reductase onto Self-assembled Phospholipid Layer and Evaluation of their Activity1
Influence of Alkyl Length on the Morphology and Higher-Order Structure of Poly(amic acid) Flower-Like Particles1
Molecular Dynamics Study of Dependence of Loading Pressure on Shear Properties of Organic Nanofilms1
Repeated <i>trans</i>↔<i>cis</i> Isomerization and Fluorescence Regulation of a Carbazole-Based Azobenzene Derivative by Acid/Base Addition1
Photomechanical Rolling Motion of Mixed Molecular Glass Microspheres Containing an Azobenzene-based Amorphous Molecular Material1
Printing of Random Patterns on Stepped Surfaces Using Speckle Lithography1
Biomimetic Wave Propagation in Magnetic Soft Actuator1
Spin-on Metal Oxide Hard Mask as Underlayer for EUV Lithography with Chemically Amplified Resist1
Fabrication of Moth-eye-structured Films with Two Types of Resin Separated by Micro-order Regions1
Soft Motion of Dielectric Driven Balloon Actuator1
Going Beyond the Ohnishi Parameter: Correlating Dissociation Energies to Polymer Etch Rates1
Bright Outlook for High-tech Industry1
Investigation of Control of Water Contact Angle by Composition Control of SiCO<sub>x</sub>H<sub>y</sub> Film Formed on Si Substrate1
Influence of Counteranions on the Performance of Tin-based EUV Photoresists1
Recent Status of the Stochastic Issues of Photoresist Materials in EUV Lithography1
Improvement of Sensitivity and Resolution by Carboxylic Acid Type Dissolution Inhibitor in Three-Component Chemically Amplified Photosensitive Polyimide1
The Photopolymer Science and Technology Award1
EUV Lithography: Past, Present and Future1
Synthesis of Imide-based Semiconducting Polymers by Nonstoichiometric Step-growth Polycondensation via Intramolecular Catalyst-transfer System1
Mechanistic Studies of Positive-Tone Organoantimony Resists1
Expanding the Formation Region of Double Gyroid Structures from ABC Triblock Terpolymers by Solution Casting1
Printing of Random Needle-like Resist Patterns Utilizing Laser Speckle Lithography1
The Photopolymer Science and Technology Award1
Spatial Distribution Analysis of Functional Groups in Resist Thin Film Using Reflection-Mode Resonant Soft X-ray Scattering1
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