Journal of Photopolymer Science and Technology

Papers
(The TQCC of Journal of Photopolymer Science and Technology is 1. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2020-11-01 to 2024-11-01.)
ArticleCitations
Characterization of Surface Variation of Chemically Amplified Photoresist to Evaluate Extreme Ultraviolet Lithography Stochastics Effects9
Fabrication of Shock Absorbing Photopolymer Composite Material for 3D Printing Sports Mouthguard9
Novel Effective Photoinitiators for the Production of Dental Fillings8
Low Stress and Low Temperature Curable Photosensitive Polyimide7
Synthesis and Structure-Activity Relationship of <i>N</i>-Substituted Carbazole Oxime Ester Photoinitiators7
New Approaches to EUV Photoresists: Studies of Polyacetals and Polypeptoids to Expand the Photopolymer Toolbox7
Chemical Mechanisms of Metal-Based Extreme Ultraviolet Resists7
Soft Actuator with DN-gel Dispersed with Magnetic Particles5
EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing5
Controlled Sequence Photoresists from Polypeptoids5
Grazing-Incidence Soft-X-ray Scattering for the Chemical Structure Size Distribution Analysis in EUV Resist5
Photoluminescence Properties of Copolyimides Containing Naphthalene Core and Analysis of Excitation Energy Transfer between the Dianhydride Moieties5
Viscoelastic Properties of Cholesteric Liquid Crystals from Hydroxypropyl Cellulose Derivatives5
Biomimetic Diamond-like Carbon Coating on a Lumen of Small-diameter Long-sized Tube Modified Surface Uniformly with Carboxyl Group using Oxygen Plasma4
Synthesis, Properties, and Photovoltaic Characteristics of Arch- and S-shaped Naphthobisthiadiazole-based Acceptors4
Affinity Analysis of Photoacid Generator in the Thin Film of Chemical Amplification Resist by Contact Angle Measurement4
Polymerizable Olefins Groups in Antimony EUV Photoresists4
Fundamental Evaluation of Resist on EUV Lithography at NewSUBARU Synchrotron Light Facility4
Improved Uniformity of Photoresist Ashing for a Half-Inch Wafer with Double U-shaped Antenna Structure in a Microwave-Excited Water Vapor Plasma4
Nodule Deformation on Cleaning of PVA Roller Brushes and its Relation to Cross-contamination4
Designed, Flexible Electrochromic Display Device with Fe(II)-Based Metallo-Supramolecular Polymer Using Mechanically Etched ITO Film4
Influence of Counteranions on the Performance of Tin-based EUV Photoresists4
Micro Stirrer with Heater Mounted on SAW Actuator for High-speed Chemical Reaction4
Effect of pH on Decomposition of Organic Compounds Using Ozone Microbubble Water4
Development of Bile Direct Stent Having Antifouling Properties by Atmospheric Pressure Low-Temperature Plasma4
Fabrication of Colloidal Crystal Gel Film Using Poly(<i>N</i>-vinylcaprolactam)4
Recent Status of the Stochastic Issues of Photoresist Materials in EUV Lithography3
Effect of Cross-linker on Photosensitive Polyimide to Achieve Full Imidization and Lower Stress for Good Reliability3
Additive Manufacturing of a Micropatterned Stamp for Transfer Printing of Quantum Dots3
Polymeric Antibacterial Surfaces with Nano-pillar Arrays Mimicking Cicada Wings3
Analyses of Charge Accumulation of PTzBT Ternary Polymer Solar Cells Using ESR Spectroscopy3
Molecular Dynamics Simulation of the Resist Filling Process in UV-nanoimprint Lithography3
Microstructure Formation on Poly (Methyl Methacrylate) Film Using Atmospheric Pressure Low-Temperature Plasma3
Evaluation of Color Stability of Experimental Dental Composite Resins Prepared from Bis-EFMA, A Novel Monomer System3
Fabrication and Characterizations of Polymer Electrolyte Composite Membranes Consisted of Polymer Nanofiber Framework Bearing Connected Proton Conductive Pathways3
Study on Fabrication of X-ray Collimators by X-ray Lithography Using Synchrotron Radiation3
Recent Progress in Research on “Liquid-Like” Surfaces Showing Low Contact Angle Hysteresis and Excellent Liquid Sliding Behavior3
Preparation and Applications of a Polysilane-allyl Methacrylate Copolymer3
The Measurement of the Refractive Index <i>n</i> and <i>k</i> Value of the EUV Resist by EUV Reflectivity Measurement Method3
Synthesis and Characterization of High Refractive Index Polythiocyanurates3
Temporal Variations of Optical Emission Spectra in Microwave-Excited Plasma in Saturated Water Vapor under Reduced Pressure during Photoresist Removal3
Development of Materials Informatics Platform3
Low Temperature Curable Low Dk & Df Polyimide for Redistribution Layer3
Protrusion Formation of Polymer Surface by Atomic Hydrogen Annealing3
Synthesis and Optical Properties of Completely Etherified Hydroxypropyl Cellulose Derivatives3
Top Thermal Annealing of 2D/3D Lead Halide Perovskites: Anisotropic Photoconductivity and Vertical Gradient of Dimensionality3
Ultraviolet-curable Material with High Fluorine Content for Biomimetic Functional Structures Achieved by Nanoimprint Lithography with Gas-permeable Template for Life Science and Electronic Application3
Research on a New Lithography Method Utilizing Laser Speckles for Printing Random Patterns3
Surface Nanopatterning of Bioabsorbable Materials Using Thermal Imprinting Technology3
Synthesis of Photo-degradable Polyphthalaldehyde Macromonomer and Adhesive Property Changes of its Copolymer with Butyl Acrylate on UV-irradiation2
Synthesis and Properties of Polyguanamines Containing <i>N</i>-Phenylmelamine Units2
Development of Bile Duct Stent with Antifouling Property Using Atmospheric Pressure and Low Temperature Plasma2
Electrical and Optical Model of Reverse Mode Liquid Crystal Cells with Low Driving Voltage2
Effect of Alternative Developer Solutions on EUVL Patterning2
Multifunctional Top-Coats Strategy for DSA of High-χ Block Copolymers2
Purification Method for Achieving Low Trace Metals in Ultra-High Purity Chemicals2
Influence of Glycerol in Developer on Novolak-Type Positive-Tone Resist Solubility2
Comparison of Photoresist Sensitivity between KrF, EB and EUV Exposure2
Dependence of Dissolution Kinetics of Main-Chain Scission Type Resists on Molecular Weight2
Micropatterning Performance and Physical Characteristics of Water-soluble High Molecular Weight Polysaccharide Photoresist Materials2
EUV Photochemistry of α-Substituted Antimony Carboxylate Complexes2
Petal-like Microstructures Formed from Sterically Crowded Chromophores2
Fabrication of Diffractive Waveplates by Scanning Wave Photopolymerization with Digital Light Processor2
Designing Er<sup>3+</sup>/Ho<sup>3+</sup>-Doped Near-Infrared (NIR-II) Fluorescent Ceramic Particles for Avoiding Optical Absorption by Water2
Nanoimprint Lithography and Microinjection Molding Using Gas-Permeable Hybrid Mold for Antibacterial Nanostructures2
Surface Functionalization of Diamond-like Carbon Film with Biocompatible Polymer Brushes2
Water-Repellency Model of the Water Strider, <i>Aquarius paludum paludum</i>, by the Curved Structure of Leg Micro-Hairs2
Effect of Sugar Chain Binding Mode on Water-soluble Micropatterning Performance and Physical Characteristics2
Finite Element Analysis of Advanced Imprint Process to Multilayered Material2
Resist Thickness Dependence of Latent Images in Chemically Amplified Resists Used for Electron Beam Lithography2
Surface Cleaning and Modification of Oxide Films by Atomic Hydrogen Annealing2
Stochastic Simulation of Development Process in Electron Beam Lithography2
Improvement of Resist Characteristics by Synthesis of a Novel Dissolution Inhibitor for Chemically Amplified Three-Component Novolac Resist2
A Study On Ant Colony Optimization2
Resist Characteristic of Chemically Amplified Three-Component Novolac Resist Containing a Dissolution Inhibitor with Different Protection Ratio1
Siloxane Oligomer with Random Structure for Use in Photosensitive White Decorative Coatings1
Removal of Novolac Photoresist with Various Concentrations of Photo-active Compound Using H<sub>2</sub>/O<sub>2</sub> Mixtures Activated on a Tungsten Hot-wire Catalyst1
Synthesis of a Dipyridyl Disulfide Cross-linking Reagent and Its Application to Photo-adhesion of Dissimilar Materials1
Randomness of Polymer Microstructure in the Resist Film as Shot Noise1
Visible-Light Sensitive Reworkable Resins: A Rheological Study1
Glass Microchannel Formation by Mycelium1
Effect of Modified Chemical Junction of a Diblock Copolymer on the Microphase Separation Behavior1
Characterization of Hydrogel Films with Reflective Colors Templated by Colloidal Crystals1
Stabilization of Spontaneous Orientation Polarization by Preventing Charge Injection from Electrodes1
Development of A Phenolic Resin-Based Material with Low Coefficient of Thermal Expansion Patternable by Laser Ablation1
Preparation of a Polysilane–Methacrylate Copolymer with Two Methacrylate Species1
Synthesis, Properties, and Photovoltaic Characteristics of Fluoranthenedione-containing Nonfullerene Acceptors for Organic Solar Cells1
Fabrication of Glass Microchannels Using Plant Roots and Nematodes1
Surface Modification of Fluoropolymers by Atomic Hydrogen1
Non-chemically Amplified Negative Molecular Resist Materials using Polarity Change by EUV Exposure1
Polymer-Based Near-Infrared Afterglow Fluorescent Complex of Dye and Rare-Earth-Doped Ceramics1
Electron Generation in Tin-oxo Cage Extreme Ultraviolet Photoresists1
Control of Radical Polymerization and Cationic Polymerization in Photocurable Resin for 3D Printers1
Synthesis and Resist Sensitive Property of Iodine-Containing Materials using Extreme Ultraviolet (EUV) Exposure Tool1
Measurement of Liquid Film Thickness Distribution Formed on a Two-fluid Jet Sprayed Surface Using a Fiber Optic Probe1
Flexible and Semi-Transparent Antenna for ISM Band Fabricated by Direct Laser Writing1
Effect of Acrylic and Epoxy Hybrid Crosslinker on the Mechanical Strength of Photocurable Resin for 3D Printing1
Emission Properties of Hybrid Films of Benzylideneaniline-based Amorphous Molecular Materials with Organic Acids1
Characterization of Shape of Polymer Nano-Films Possessing Various Crosslinking Chain Length1
A 3D-Simulation and Experimental Study of the Fluid Flow Around a Nano-Step Structure Formed by UV-NIL1
Birefringent Control of Photo-Oriented Polymeric Films by <i>in situ</i> Exchange of Functional Moieties1
Droplet-Dispensed Ultraviolet Nanoimprint Lithography in Mixed Condensable Gas of Trans-1,3,3,3-Tetrafluoropropene and Trans-1-Chloro-3,3,3-Trifluoropropene1
Fabrication of a Rose-Petal-Inspired Micro/Nanostructured Surface via the Ultraviolet Nanoimprint Lithography and Roll-Press Methods1
Photoinduced Charge Carrier Dynamics of Metal Chalcogenide Semiconductor Quantum Dot Sensitized TiO<sub>2</sub> Film for Photovoltaic Application1
Proposal of hybrid deep learning systems for process and material design in thermal nanoimprint lithography1
Investigating High Opacity and Increased Activation Energy in the Multi-Trigger Resist1
Preparation of a Polysilane-(1-Pyrene)Methyl Methacrylate Copolymer1
Evaluation of Surface-Enhanced Raman Scattering Substrate Consisting of Gold Nanoparticles Grown on Nanoarrays of Boehmite Fabricated using Magnetron Sputtering Process1
Fabrication of Polyimide Nano-Particles by Precipitation Polymerization1
Unimolecular Benzodioxole-based Photoinitiators for Free Radical and Cationic Photopolymerization Under LED Light Irradiation1
Process and Sensitivity Optimisation of the Multi-Trigger Resist1
Self-assembly of Crosslinked Polyimides Templated by Block Copolymers for Fabrication of Porous Films1
Antifouling Activity of Hydroxyl Functional Groups in PVA Thin Films Against the Settlement of Sessile Organisms in Laboratory and Field Conditions1
Fabrication of Moth-eye Antireflective Nanostructures via Oxygen Ion-beam Etching on a UV-curable Polymer1
The Removal of Acid Violet 7 from Aqueous Solutions by Photocatalytic-Poly(Ethylene Glycol Dimethacrylate-<i>co</i>-4-Vinylpyridine)-Titanium Dioxide Nanocomposite Beads: Kinetic, Isotherm1
Evolution of Secondary Electrons Emission During EUV Exposure in Photoresists1
Preparation of Fast Light-curing Water-based UV Ink and Wear Resistance of Ink Film1
Photo-degradation of Di- and Trifunctional Oxime Ethers Bearing Polyphthalaldehyde Arms1
Synthesis of Amino Acid-derived Curing Reagents Containing a Disulfide Bond and Their Application to Anionic UV Curing Materials1
Effect of 2-propanol Immersing on Organohalide Perovskite Layer in Perovskite Solar Cells Fabricated by Two-step Method1
Photoresist Design to Address Stochastics Issues in EUV Resists1
Developing an Endoscope Lens with Anti-Fogging and Anti-Fouling Properties using Nanoparticle Materials1
Low-Temperature-Curable and Positive-Type Photosensitive Polyimide with High Mechanical Strength, High Resolution and Good Pot-Life Based on Chain Extendable Poly(Amic Acid), Thermal Degradable Crossl1
Acid-responsive Emission Color Changes of Diarylaminobenzylideneanilines1
Synthesis and Higher-order Structural Characterization of Polyimides Containing Chain-length-controlled Polysiloxanes1
Three-dimensional Numerical Simulation of Liquid Film Formation and the Distribution of Cleaning Solutions on a Rotating Disk1
Effect of Phase Separation due to Solvent Evaporation on Particle Aggregation in the Skin Layer of the Gas Separation Membrane1
Amylopectin-based Eco-friendly Photoresist Material in Water-developable Lithography Processes for Surface Micropatterns on Polymer Substrates1
Ultra-hydrophilic Diamond-like Carbon Coating on an Inner Surface of a Small-diameter Long Tube with an Amino Group by AC High-voltage Plasma Discharge1
Suspensions of Polymer Hydrogel Microparticles with Highly Sensitive Detectability of Glucose1
Novel Temporary Bonding/Debonding System Enabling Advanced Packaging Process1
Progress in EUV Photoresists for High-Resolution Patterning1
Visible-Light Sensitive Reworkable Resins for Dental Application1
Adhesion Improvement Mechanism of Polytetrafluoroethylene by Heat-assisted Atmospheric Pressure Glow Plasma Treatment1
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