Journal of Photopolymer Science and Technology

Papers
(The TQCC of Journal of Photopolymer Science and Technology is 1. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2021-05-01 to 2025-05-01.)
ArticleCitations
Synthesis of Highly Ordered Si-Containing Fluorinated Block Copolymers11
Microstructure Formation on Poly (Methyl Methacrylate) Film Using Atmospheric Pressure Low-Temperature Plasma10
Synthesis of a Dipyridyl Disulfide Cross-linking Reagent and Its Application to Photo-adhesion of Dissimilar Materials8
Reliability Study for Photosensitive RDL Material8
Synthesis and Properties of Polyguanamines Containing <i>N</i>-Phenylmelamine Units8
Positive-Tone Organoantimony Resists8
Chemical Mechanisms of Metal-Based Extreme Ultraviolet Resists7
Oriented Nanowire Arrays with Phthalocyanine – C<sub>60</sub> Multi-Heterojunctions6
Birefringent Control of Photo-Oriented Polymeric Films by <i>in situ</i> Exchange of Functional Moieties6
Investigations of Matrix-Exposure Lithography Using Stacked Linear Arrays of Squared Optical Fibers6
A Study On Ant Colony Optimization5
Preparation of Rigid Polyimides from Various Dianhydrides and 4,4’’’-Diaminoquaterphenyl and Comparison with Properties of Polyimides from 3,3’’’,4,4’’’-<i>p</i>-Quaterphenyltetracarboxyli5
Comparison of Photoresist Sensitivity between KrF, EB and EUV Exposure5
Improved Uniformity of Photoresist Ashing for a Half-Inch Wafer with Double U-shaped Antenna Structure in a Microwave-Excited Water Vapor Plasma5
Evaluation of Surface-Enhanced Raman Scattering Substrate Consisting of Gold Nanoparticles Grown on Nanoarrays of Boehmite Fabricated using Magnetron Sputtering Process4
Theory of Photodecomposable Base in Chemically Amplified Resist4
Resist Removal Using Laser Irradiation Combined with Ozone Water Treatment4
Development of Selenonium PAGs in EUV Lithography toward High Sensitivity Achievement4
Agitation inside the Liquid Film on Two-Fluid Jet Sprayed Surface4
Investigating High Opacity and Increased Activation Energy in the Multi-Trigger Resist4
Polymeric Antibacterial Surfaces with Nano-pillar Arrays Mimicking Cicada Wings4
Biocompatibility of Different Universal Adhesives During Short and Long Periods on Rat Model4
Study on Fabrication of X-ray Collimators by X-ray Lithography Using Synchrotron Radiation4
Low Temperature Curable Low Dk & Df Polyimide for Redistribution Layer4
Synthesis of Kapton-type Polyamide Ester and Study of Their Electrophoretic Deposition Function4
Nanoimprint Lithography for Collagen Micropatterning at Low-Temperature 5℃ with TiO<sub>2</sub>-SiO<sub>2</sub> Gas-Permeable Porous Mold4
Optical Oxygen Measurement using Microneedle of Bioabsorable Polymer4
Functional Group Influence on Block Copolymer Segment Interactions: An Analysis via Flory–Huggins and Hansen Solubility Parameters4
Characterization of Photoacid Generator Bound Resist with X-ray Absorption Spectroscopy at NewSUBARU4
Electrical and Optical Model of Reverse Mode Liquid Crystal Cells with Low Driving Voltage4
Ultra-hydrophilic Diamond-like Carbon Coating on an Inner Surface of a Small-diameter Long Tube with an Amino Group by AC High-voltage Plasma Discharge3
Multi-Trigger Resist for EUV lithography3
Photoluminescence Properties of Copolyimides Containing Naphthalene Core and Analysis of Excitation Energy Transfer between the Dianhydride Moieties3
Synthesis of ABC/ACB-Type Triblock Copolymers Composed of Polystyrene and Polymethacrylate via Living Anionic Polymerization and Analyzing the Effect of Casting Solvents on Higher-Order Structures3
A Novel Process to Reduce Roughness in Chemically Amplified Resist (CAR) for Next-Generation Lithography3
Synthesis of Highly Luminescent CsPbCl<sub>3</sub> Perovskite Nanocrystals with Oleylammonium Chloride as an Alternative Halide Source3
Droplet-Dispensed Ultraviolet Nanoimprint Lithography in Mixed Condensable Gas of Trans-1,3,3,3-Tetrafluoropropene and Trans-1-Chloro-3,3,3-Trifluoropropene3
Temporal Variations of Optical Emission Spectra in Microwave-Excited Plasma in Saturated Water Vapor under Reduced Pressure during Photoresist Removal3
Behavior of Secondary Electrons: Estimation of the Ionization Yield in Poly(hydroxystyrene) under EUV Irradiation Based on Binary Encounter Theory and Continuous Slowing-Down Spectrum3
The Removal of Acid Violet 7 from Aqueous Solutions by Photocatalytic-Poly(Ethylene Glycol Dimethacrylate-<i>co</i>-4-Vinylpyridine)-Titanium Dioxide Nanocomposite Beads: Kinetic, Isotherm3
Thermal Conversion of Polyamic Acid Gel to Polyimide Solution Having Amino Group Sidechains3
High-Refractive-Index Photosensitive Siloxane Coatings for Optical Fingerprint Sensor3
Randomness of Polymer Microstructure in the Resist Film as Shot Noise3
Development of Materials Informatics Platform3
High Speed Ashing of Ion Implanted Photoresist by Microwave Excited Water Vapor Plasma with Powered Substrate3
Computational Lithography for 3-Dimensional Fine Photolithography using Sophisticated Built-in Lens Mask3
Visible-Light Sensitive Reworkable Resins for Dental Application: Improved Stability3
Evaluation of Color Stability of Experimental Dental Composite Resins Prepared from Bis-EFMA, A Novel Monomer System3
Properties of Imidazolinium-containing Multiblock Amphiphile in Lipid Bilayer Membranes3
Composite Membrane of Bi<sub>2</sub>WO<sub>6</sub>-NCQDs Laminated Hetero-junction Loaded on PES Support for Photo-catalytic Degradation of Organic Pollutants3
Experimental Evaluation and Modeling of Adsorption Phenomena of Nanoliposomes on Poly(dimethylsiloxane) Surfaces3
Evaluation of Basic Behavior of Acrylic Polymer Changing Composition by KrF, ArF and EUV Exposure2
Fabrication of Moth-eye-structured Films with Two Types of Resin Separated by Micro-order Regions2
Printing of Random Patterns on Stepped Surfaces Using Speckle Lithography2
Novel Low <i>D<sub>f</sub></i> Photosensitive Materials for Redistribution Layer2
Nanoimprint Lithography and Microinjection Molding Using Gas-Permeable Hybrid Mold for Antibacterial Nanostructures2
Preparation and Applications of a Polysilane-allyl Methacrylate Copolymer2
Stochastic Simulation Study of Pattern Formation in EUV resists with Photo-Decomposable Quenchers2
Effect of pH on Decomposition of Organic Compounds Using Ozone Microbubble Water2
Control of Radical Polymerization and Cationic Polymerization in Photocurable Resin for 3D Printers2
Designed, Flexible Electrochromic Display Device with Fe(II)-Based Metallo-Supramolecular Polymer Using Mechanically Etched ITO Film2
Printing of Random Needle-like Resist Patterns Utilizing Laser Speckle Lithography2
Spin-on Metal Oxide Hard Mask as Underlayer for EUV Lithography with Chemically Amplified Resist2
Improvement of Resist Characteristics by Synthesis of a Novel Dissolution Inhibitor for Chemically Amplified Three-Component Novolac Resist2
Present Status of EUV Interference Lithography at NewSUBARU2
Influence of Counteranions on the Performance of Tin-based EUV Photoresists2
Photo-reactivity of 2,4,6-Tris(benzylthio)-1,3,5-triazines and Accompanying Refractive Index Change2
Synthesis of Photo-degradable Polyphthalaldehyde Macromonomer and Adhesive Property Changes of its Copolymer with Butyl Acrylate on UV-irradiation2
Fabrication of Moth-eye Antireflective Nanostructures via Oxygen Ion-beam Etching on a UV-curable Polymer2
High Resolution and Low Stress Photo-Definable Polyimide2
Spatial Distribution Analysis of Functional Groups in Resist Thin Film Using Reflection-Mode Resonant Soft X-ray Scattering2
Soft Motion of Dielectric Driven Balloon Actuator2
Synthesis and Structural Characterization of Polyimide Containing Diphenylsiloxane Unit2
Immobilization of CYP1A2 and CYP Reductase onto Self-assembled Phospholipid Layer and Evaluation of their Activity2
Novel Temporary Bonding/Debonding System Enabling Advanced Packaging Process2
Spatial Distribution Imaging of Resist Thin Film with Micrometer Resolution using Reflection Type Soft X-ray Projection Microscope2
Impact of Water Treatment Reactor using TiO<sub>2</sub>-coated Micropillar Made by UV-NIL1
Molecular Assemblies of Minor Trigonal Molecules Regulated with the Help of Major Light-sensitive Components1
EUV Photochemistry of α-Substituted Antimony Carboxylate Complexes1
The Photopolymer Science and Technology Award1
Expanding the Formation Region of Double Gyroid Structures from ABC Triblock Terpolymers by Solution Casting1
Characteristic of Immunosorbent Assay using Micro Capillary Arrays coated by SiCOxHy CVD Films1
Formation and Stability of Cs<sub>2</sub>SnBr<sub>6</sub> Perovskite Nanocrystals from CsSn<sub>2</sub>Br<sub>5</sub> Nanocubes1
A 3D-Simulation and Experimental Study of the Fluid Flow Around a Nano-Step Structure Formed by UV-NIL1
Characterization of Shape of Polymer Nano-Films Possessing Various Crosslinking Chain Length1
Degradation of Modified Polystyrenes Having Degradable Units by Near Infrared Light Irradiation in The Presence of A Photon Upconversion Nanoparticle and A Photoacid Generator1
Proposal of hybrid deep learning systems for process and material design in thermal nanoimprint lithography1
Erratum to “Synthesis, Properties, and Photovoltaic Characteristics of Arch- and S-shaped Naphthobisthiadiazole-based Acceptors”[J. Photopolym. Sci. Technol. 34 (2021) 285-290]1
Fundamental Evaluation of KrF Resist Changing Formulation by EB and EUV Exposure1
Three-dimensional Numerical Simulation of Liquid Film Formation and the Distribution of Cleaning Solutions on a Rotating Disk1
Development of Dimethylaminotolane-Incorporated Poly(<i>N</i>-Isopropylacrylamide) Gel Exhibiting External Stimuli Responsive Fluorescence1
Mechanistic Studies of Positive-Tone Organoantimony Resists1
Fabrication of Diffractive Waveplates by Scanning Wave Photopolymerization with Digital Light Processor1
Relationship between Defect Risks and Effective Reaction Radius for Deprotection in Chemically Amplified Resist Process for Extreme Ultraviolet Lithography1
Synthesis of Star-shaped Miktoarm Terpolymers Composed of Polyisoprene, Polystyrene, and Poly (2,2,2-trifluoroethyl methacrylate) via Arm-first Approach1
Thermal, Optical, and Dielectric Properties of Bio-based Polyimides Derived from an Isosorbide-containing Dianhydride and Diamines with Long Alkyl Chains1
Development of Bile Direct Stent Having Antifouling Properties by Atmospheric Pressure Low-Temperature Plasma1
Biomimetic Wave Propagation in Magnetic Soft Actuator1
Surface Cleaning and Modification of Oxide Films by Atomic Hydrogen Annealing1
Photomechanical Rolling Motion of Mixed Molecular Glass Microspheres Containing an Azobenzene-based Amorphous Molecular Material1
Preparation of a Polysilane–Methacrylate Copolymer with Two Methacrylate Species1
Direct Observation of Gastropod's Locomotion for Soft Robot Application1
Evaluating the Anti-biofilm Performance of Si and Resin Based Nanopillars1
Flexible in-plane Micro-Supercapacitor Prepared by Laser Annealing and Ablation of a Graphene/Polyamide Acid Composite1
Grazing-Incidence Soft-X-ray Scattering for the Chemical Structure Size Distribution Analysis in EUV Resist1
Self-assembly of Crosslinked Polyimides Templated by Block Copolymers for Fabrication of Porous Films1
Synthesis of Methacryl Monomer Having a 6-Chloropyridyl Group and Their Application to Photo-adhesive Material1
Evaluation of Electron Blur for Different Electron Energies1
Going Beyond the Ohnishi Parameter: Correlating Dissociation Energies to Polymer Etch Rates1
Physical and Chemical Drying of Coatings with NIR Absorbers to Replace Oven Technologies1
The Impact of (Poly)glycerol in Developer on the Dissolution and Sensitivity of Positive-tone Photosensitive Polyimides1
Investigation of Control of Water Contact Angle by Composition Control of SiCO<sub>x</sub>H<sub>y</sub> Film Formed on Si Substrate1
Crack Resistance Evaluation Method of Photoimageable Dielectrics for Redistribution Layer1
Study on Irradiation Effects by Femtosecond-pulsed Extreme Ultraviolet in Resist Materials1
Enhanced Adhesion and Resolution of Negative Photoresists on Copper Substrates with Polyglycerin-Based Methacrylate1
The Photopolymer Science and Technology Award1
Non-chemically Amplified Negative Molecular Resist Materials using Polarity Change by EUV Exposure1
Recent Status of the Stochastic Issues of Photoresist Materials in EUV Lithography1
Resist Thickness Dependence of Latent Images in Chemically Amplified Resists Used for Electron Beam Lithography1
Low Stress and Low Temperature Curable Photosensitive Polyimide1
Durability Test of Replica Mold in UV Nanoimprinting and Enlargement of Mold Patterned Area by Mold Stitching1
Molecular Dynamics Study of Dependence of Loading Pressure on Shear Properties of Organic Nanofilms1
Glass Microchannel Formation by Mycelium1
Self-assembly of Amphiphilic Peptide in Phospholipid Membrane1
Heat Treatment for a Membrane Composed of Polymer Nanofibers and a Perfluorosulfonic-Acid Polymer Matrix: Effect on Proton-Exchange-Membrane Properties1
Negative Photo-Definable Polyimide Dry Films for Fine and High Aspect Ratio Patterning1
Protrusion Formation of Polymer Surface by Atomic Hydrogen Annealing1
Substitution Effect on Self-Assembly and the Resulting Fluorescence Efficiency of Triangular Azo Chromophores1
Effect of Acrylic and Epoxy Hybrid Crosslinker on the Mechanical Strength of Photocurable Resin for 3D Printing1
Metal Purifiers Specific to Lithography Related Chemicals1
Hybrid Soft Replica Molds for Residual Layer-Free Patterning1
Surface Modification of Fluoropolymers by Atomic Hydrogen1
Designing Er<sup>3+</sup>/Ho<sup>3+</sup>-Doped Near-Infrared (NIR-II) Fluorescent Ceramic Particles for Avoiding Optical Absorption by Water1
Bright Outlook for High-tech Industry1
Preparation of poly(methyl methacrylate) photochromic microcapsules containing spiro-pyran by solvent volatilization1
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