Journal of Photopolymer Science and Technology

Papers
(The median citation count of Journal of Photopolymer Science and Technology is 0. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2022-01-01 to 2026-01-01.)
ArticleCitations
Positive-Tone Organoantimony Resists12
Synthesis of a Dipyridyl Disulfide Cross-linking Reagent and Its Application to Photo-adhesion of Dissimilar Materials10
Synthesis and Properties of Polyguanamines Containing <i>N</i>-Phenylmelamine Units9
Comparison of Photoresist Sensitivity between KrF, EB and EUV Exposure9
Chemical Mechanisms of Metal-Based Extreme Ultraviolet Resists9
Reliability Study for Photosensitive RDL Material9
Preparation of Rigid Polyimides from Various Dianhydrides and 4,4’’’-Diaminoquaterphenyl and Comparison with Properties of Polyimides from 3,3’’’,4,4’’’-<i>p</i>-Quaterphenyltetracarboxyli8
Magnetically-Actuated Dynamic Culture System for Investigating Mechanical Effects on Biological Growth7
Photocured Blended Films of Diarylfluorene having Naphthalene Moieties and TiO<sub>2</sub> with High Refractive Indices7
The Photopolymer Science and Technology Award6
Nanoimprint Lithography for Collagen Micropatterning at Low-Temperature 5℃ with TiO<sub>2</sub>-SiO<sub>2</sub> Gas-Permeable Porous Mold5
Functional Group Influence on Block Copolymer Segment Interactions: An Analysis via Flory–Huggins and Hansen Solubility Parameters5
Polymeric Antibacterial Surfaces with Nano-pillar Arrays Mimicking Cicada Wings5
Resist Removal Using Laser Irradiation Combined with Ozone Water Treatment5
Theory of Photodecomposable Base in Chemically Amplified Resist5
Characterization of Photoacid Generator Bound Resist with X-ray Absorption Spectroscopy at NewSUBARU4
Development of Selenonium PAGs in EUV Lithography toward High Sensitivity Achievement4
Agitation inside the Liquid Film on Two-Fluid Jet Sprayed Surface4
Low Temperature Curable Low Dk & Df Polyimide for Redistribution Layer4
Optical Oxygen Measurement using Microneedle of Bioabsorable Polymer4
Evaluation of Surface-Enhanced Raman Scattering Substrate Consisting of Gold Nanoparticles Grown on Nanoarrays of Boehmite Fabricated using Magnetron Sputtering Process4
Raman Spectral Data–Driven Analysis of Diamond-like Carbon Films Deposited Using the Radio-frequency Plasma-enhanced Chemical Vapor Deposition Method4
High-Refractive-Index Photosensitive Siloxane Coatings for Optical Fingerprint Sensor3
Visible-Light Sensitive Reworkable Resins for Dental Application: Improved Stability3
High Resolution and Low Stress Photo-Definable Polyimide3
Synthesis of Highly Luminescent CsPbCl<sub>3</sub> Perovskite Nanocrystals with Oleylammonium Chloride as an Alternative Halide Source3
Antibacterial Property of Si Nanopillars for Anti-Microbial Resistance (AMR) Bacteria3
The Effect of Side-Chain Modification via Hydrogen Bonding on the Microphase-Separated Structure of PS-<i>b</i>-P4VP-<i>b</i>-PMMA3
A Novel Process to Reduce Roughness in Chemically Amplified Resist (CAR) for Next-Generation Lithography3
The Removal of Acid Violet 7 from Aqueous Solutions by Photocatalytic-Poly(Ethylene Glycol Dimethacrylate-<i>co</i>-4-Vinylpyridine)-Titanium Dioxide Nanocomposite Beads: Kinetic, Isotherm3
High Speed Ashing of Ion Implanted Photoresist by Microwave Excited Water Vapor Plasma with Powered Substrate3
Spin-on Metal Oxide Hard Mask as Underlayer for EUV Lithography with Chemically Amplified Resist3
Synthesis of ABC/ACB-Type Triblock Copolymers Composed of Polystyrene and Polymethacrylate via Living Anionic Polymerization and Analyzing the Effect of Casting Solvents on Higher-Order Structures3
Benzothiadiazole-Based Fused-Ring Electron Acceptors for Green-Light Wavelength-Selective Organic Solar Cells3
Ultra-hydrophilic Diamond-like Carbon Coating on an Inner Surface of a Small-diameter Long Tube with an Amino Group by AC High-voltage Plasma Discharge3
Synthesis of Kapton-type Polyamide Ester and Study of Their Electrophoretic Deposition Function3
Composite Membrane of Bi<sub>2</sub>WO<sub>6</sub>-NCQDs Laminated Hetero-junction Loaded on PES Support for Photo-catalytic Degradation of Organic Pollutants3
Evaluation of Basic Behavior of Acrylic Polymer Changing Composition by KrF, ArF and EUV Exposure3
Breaking Boundaries of Photoinitiators: New Ways to Improve the Reactivity of Radical Polymerization3
Synthesis and Photocuring Properties of One-component Polymerizable Thioxanthone-based Photoinitiators with High Migration Stability3
The Photopolymer Science and Technology Award3
Droplet-Dispensed Ultraviolet Nanoimprint Lithography in Mixed Condensable Gas of Trans-1,3,3,3-Tetrafluoropropene and Trans-1-Chloro-3,3,3-Trifluoropropene3
Repeated <i>trans</i>↔<i>cis</i> Isomerization and Fluorescence Regulation of a Carbazole-Based Azobenzene Derivative by Acid/Base Addition2
Printing of Random Patterns on Stepped Surfaces Using Speckle Lithography2
Stochastic Simulation Study of Pattern Formation in EUV resists with Photo-Decomposable Quenchers2
Spatial Distribution Analysis of Functional Groups in Resist Thin Film Using Reflection-Mode Resonant Soft X-ray Scattering2
Influence of Counteranions on the Performance of Tin-based EUV Photoresists2
Novel Temporary Bonding/Debonding System Enabling Advanced Packaging Process2
Characteristic of Immunosorbent Assay using Micro Capillary Arrays coated by SiCOxHy CVD Films2
Spatial Distribution Imaging of Resist Thin Film with Micrometer Resolution using Reflection Type Soft X-ray Projection Microscope2
EUV Lithography: Past, Present and Future2
Fabrication of Moth-eye-structured Films with Two Types of Resin Separated by Micro-order Regions2
Printing of Random Needle-like Resist Patterns Utilizing Laser Speckle Lithography2
Influence of Alkyl Length on the Morphology and Higher-Order Structure of Poly(amic acid) Flower-Like Particles2
Photo-reactivity of 2,4,6-Tris(benzylthio)-1,3,5-triazines and Accompanying Refractive Index Change2
Nanoimprint Lithography and Microinjection Molding Using Gas-Permeable Hybrid Mold for Antibacterial Nanostructures2
Durability Test of Replica Mold in UV Nanoimprinting and Enlargement of Mold Patterned Area by Mold Stitching2
Soft Motion of Dielectric Driven Balloon Actuator2
Multi-Trigger Resist for EUV lithography2
Behavior of Secondary Electrons: Estimation of the Ionization Yield in Poly(hydroxystyrene) under EUV Irradiation Based on Binary Encounter Theory and Continuous Slowing-Down Spectrum2
Synthesis and Structural Characterization of Polyimide Containing Diphenylsiloxane Unit2
Improvement of Sensitivity and Resolution by Carboxylic Acid Type Dissolution Inhibitor in Three-Component Chemically Amplified Photosensitive Polyimide2
Present Status of EUV Interference Lithography at NewSUBARU2
Immobilization of CYP1A2 and CYP Reductase onto Self-assembled Phospholipid Layer and Evaluation of their Activity2
TiO<sub>2</sub>-SiO<sub>2</sub> Radical-Based Gas-Permeable Mold for High-Precision UV Nanoimprint Lithography2
Novel Low <i>D<sub>f</sub></i> Photosensitive Materials for Redistribution Layer2
Synthesis of Imide-based Semiconducting Polymers by Nonstoichiometric Step-growth Polycondensation via Intramolecular Catalyst-transfer System1
Fundamental Evaluation of KrF Resist Changing Formulation by EB and EUV Exposure1
Evaluation of Electron Blur for Different Electron Energies1
Photochemistry and Reaction Pathway of Oxime Esters as Radical Photoinitiators1
Synthesis of Methacryl Monomer Having a 6-Chloropyridyl Group and Their Application to Photo-adhesive Material1
Relationship between Defect Risks and Effective Reaction Radius for Deprotection in Chemically Amplified Resist Process for Extreme Ultraviolet Lithography1
Physical and Chemical Drying of Coatings with NIR Absorbers to Replace Oven Technologies1
Thermal, Optical, and Dielectric Properties of Bio-based Polyimides Derived from an Isosorbide-containing Dianhydride and Diamines with Long Alkyl Chains1
Formation and Stability of Cs<sub>2</sub>SnBr<sub>6</sub> Perovskite Nanocrystals from CsSn<sub>2</sub>Br<sub>5</sub> Nanocubes1
Preparation of poly(methyl methacrylate) photochromic microcapsules containing spiro-pyran by solvent volatilization1
Going Beyond the Ohnishi Parameter: Correlating Dissociation Energies to Polymer Etch Rates1
Enhanced Adhesion and Resolution of Negative Photoresists on Copper Substrates with Polyglycerin-Based Methacrylate1
High Packing Efficiency Deployment Method Using Swelling Hydrogels Inspired by Out-of-Plane Biological Deformation1
Emission Patterning Using a Novel Amorphous Molecular Fluorophore with Three Cyanostilbene Moieties1
Biomimetic Wave Propagation in Magnetic Soft Actuator1
Synthesis of Star-shaped Miktoarm Terpolymers Composed of Polyisoprene, Polystyrene, and Poly (2,2,2-trifluoroethyl methacrylate) via Arm-first Approach1
Mechanistic Studies of Positive-Tone Organoantimony Resists1
Grazing-Incidence Soft-X-ray Scattering for the Chemical Structure Size Distribution Analysis in EUV Resist1
Heat Treatment for a Membrane Composed of Polymer Nanofibers and a Perfluorosulfonic-Acid Polymer Matrix: Effect on Proton-Exchange-Membrane Properties1
Etching Mechanism of Si-rich SiO<sub>x</sub> Film by Atomic Hydrogen Annealing1
Hybrid Soft Replica Molds for Residual Layer-Free Patterning1
Fabrication of a Methacrylic Photo-adhesive Material Incorporating Hydroxypyridyl Groups1
Investigation of Control of Water Contact Angle by Composition Control of SiCO<sub>x</sub>H<sub>y</sub> Film Formed on Si Substrate1
Metal Purifiers Specific to Lithography Related Chemicals1
Bright Outlook for High-tech Industry1
Flexible in-plane Micro-Supercapacitor Prepared by Laser Annealing and Ablation of a Graphene/Polyamide Acid Composite1
Crack Resistance Evaluation Method of Photoimageable Dielectrics for Redistribution Layer1
Degradation of Modified Polystyrenes Having Degradable Units by Near Infrared Light Irradiation in The Presence of A Photon Upconversion Nanoparticle and A Photoacid Generator1
Synthesis and Photovoltaic Properties of Non-Fullerene Acceptors with Quinoxaline-Based Central Unit1
Surface Cleaning and Modification of Oxide Films by Atomic Hydrogen Annealing1
The Impact of (Poly)glycerol in Developer on the Dissolution and Sensitivity of Positive-tone Photosensitive Polyimides1
The Photopolymer Science and Technology Award1
Evaluating the Anti-biofilm Performance of Si and Resin Based Nanopillars1
Photomechanical Rolling Motion of Mixed Molecular Glass Microspheres Containing an Azobenzene-based Amorphous Molecular Material1
Development of Dimethylaminotolane-Incorporated Poly(<i>N</i>-Isopropylacrylamide) Gel Exhibiting External Stimuli Responsive Fluorescence1
Preparation of a Polysilane–Methacrylate Copolymer with Two Methacrylate Species1
Expanding the Formation Region of Double Gyroid Structures from ABC Triblock Terpolymers by Solution Casting1
Substitution Effect on Self-Assembly and the Resulting Fluorescence Efficiency of Triangular Azo Chromophores1
Photoreaction of Polysilyne and Methyl Methacrylate1
Novel EUV Underlayer Design for Metal Oxide Resist Patterning1
Wafer Edge Protection Layer: A Solution for Metal Contamination Issue in Advanced Patterning Process1
Surface Modification of Fluoropolymers by Atomic Hydrogen1
Three-dimensional Numerical Simulation of Liquid Film Formation and the Distribution of Cleaning Solutions on a Rotating Disk1
Negative Photo-Definable Polyimide Dry Films for Fine and High Aspect Ratio Patterning1
Erratum to “Synthesis, Properties, and Photovoltaic Characteristics of Arch- and S-shaped Naphthobisthiadiazole-based Acceptors”[J. Photopolym. Sci. Technol. 34 (2021) 285-290]1
Nanoimprint with CO<sub>2</sub> Ambient1
A 3D-Simulation and Experimental Study of the Fluid Flow Around a Nano-Step Structure Formed by UV-NIL1
Designing Er<sup>3+</sup>/Ho<sup>3+</sup>-Doped Near-Infrared (NIR-II) Fluorescent Ceramic Particles for Avoiding Optical Absorption by Water1
Recent Status of the Stochastic Issues of Photoresist Materials in EUV Lithography1
Analysis of Deprotection Activation Energy of Dissolution Inhibitors in Three-Component Chemically Amplified Novolac-based Resists (2)1
Molecular Dynamics Study of Dependence of Loading Pressure on Shear Properties of Organic Nanofilms1
Molecular Assemblies of Minor Trigonal Molecules Regulated with the Help of Major Light-sensitive Components1
The Photopolymer Science and Technology Award1
The Photopolymer Science and Technology Award0
Feature-size Control by Pattern Transfer Etching in Nanoimprint Lithography for Half-pitch 24 nm Damascene Interconnect0
Measurement of Liquid Film Thickness Distribution Formed on a Two-fluid Jet Sprayed Surface Using a Fiber Optic Probe0
Hybrid Bonding Technology Utilizing Molding Compound and Photo Imageable Dielectric Systems0
Practical Biomimetic Frameworks with Specific Case Studies for Extracting and Applying Biological Solutions0
Development of a Novel Negative-Tone Dry Film Resist with PVA Layer for Wiring with 1.5/1.5 µm Line/Space0
Dispersion Stability of Organic Nanoparticles Prepared by Pulsed Laser Induced Fragmentation in Protein Solution0
Functionalization of Poly-L-Lactic Acid Microneedle Tips using Hydrogel Photopolymerization0
Molecular Dynamics Simulation of Pattern Formation for Negative-Type Resists in Electron Beam Lithography0
Synthesis of Thermosetting Polycarbonate with Ethynyl Terminals0
Photoresist for Water-developable Photolithography Process Using Plant-derived Hemicellulose0
Magnetic-Pneumatic Hybrid Soft Actuator0
Micro-injection Molding of Biodegradable Polylactic Acid Microstructures Using Amine-containing Gas-permeable Hybrid Molds0
Bio Roll-Up: Self-Assembly of Hydrogel Photoresists0
Superhydrophobic PDMS using Femtosecond Laser-Processed Surface Molds for Anti-Icing0
Synthesis of Highly Transparent Semi-aromatic Poly(amide–imide)s from Alicyclic Diamines and Dicarboxylic Acids Derived from 2,2'-Di(trifluoromethyl)benzidine with Trimellitic Anhydride0
Development of Non-Fullerene Acceptors with π-Extended Central Unit for Organic Photovoltaic Devices0
Synthesis of Botryosin-type Resist Material Containing Acetal Groups in the Main Chain and Its Sensitivity0
Highly Reliable Polyimide-based Thermal Interface Material Sheets for Power Modules0
Effect of UV-Light Irradiation on Charge-Accumulation States in PTzBT Polymer Solar Cells0
Synthesis of Resist Materials Containing Hemiacetal Groups and Their Resist Sensitivity0
Photo-induced Decrosslinking of Oxime-ester Based Covalent Adaptable Networks in Film State0
Polyimide-based Release Material for Rapid and Precise Mass Transfer of Semiconductor Chips0
Surface Hardness of UV-Solidified Coatings Containing In-situ Synthesized, Self-dispersed Nano-gel Domains as a Function of Surface Roughness and Viscoelastic Characteristics0
Synthesis of Pyrene-Substituted Azobenzene Derivatives and Their Assembly into Flat Structures for Stimuli-Induced Switching0
Vertical Chemical Unit Operation Using Microcapillary Arrays for Immunosorbent Assay0
Effects of Solvents on the Preparation of PLLA/PEDOT:PSS Conductive Polymer Alloy Films0
The Synthesis of the High Resolution i Line Novolak Resist0
Chemometric Raman Spectral Analysis of Diamond-like Carbon Films Deposited by Plasma Discharge0
Retraction of “Synthesis of Monomers Having a 2-Hydroxypyridyl Group and Their Application to Photo-adhesive Materials” [<i>J. Photopolym. Sci. Technol.</i>, <b>36</b> (2023) 20
Nanoscale Resist-Pattern Defects Clustered in the Micron Region Found by Soft X-ray Microscopy0
Glycidyl Methacrylate-Grafted Polysilanes: Synthesis and Properties0
Adhesion Improvement Mechanism of Polytetrafluoroethylene by Heat-assisted Atmospheric Pressure Glow Plasma Treatment0
Fabrication of Polyimide Nano-Particles by Precipitation Polymerization0
Miniaturization of Scattered Random Patterns Formed by Lens·less Speckle Lithography0
The Design and Synthesis of New NIR-Active Sensitizers for Use in Photochemical Processes and Controlled Polymerizations0
Ultrasound-Assisted Degradation of Poly(<i>p</i>-<i>tert</i>-butoxycarbonyloxystyrene) using TiO<sub>2</sub> and Photoacid Generators0
Synthesis of High Refractive Linear to Branched Polyguanamines from 2-Amino-4,6-dichloro-1,3,5-triazine with Aromatic Diamines0
Colloidal Crystal Films Consisting of Silica Particles Surface-modified with Polyacrylates Containing Branched Alkyl Chains0
The Development of Bile Duct Stent Having Antifouling Properties by Using Atmosphere Pressure Cold Plasma (2)0
Preparation of a Polysilane-(1-Pyrene)Methyl Methacrylate Copolymer0
Developing a Laparoscope Lens with Super Water-Repellent Antifouling Function using Biomimetic Materials0
Evaluation of Inorganic-organic Hybrid Resist Materials with Ultrafast Coherent High Harmonic Generation (HHG) EUV System Developed in QST0
Preparation of Polyimide-TiO<sub>2</sub> Hybrid Films by Synthesis of Polyamic Acid Having Carboxylic Acid Group Sidechains in the Presence of TiO<sub>2</sub>0
Aggregation of Au Colloids using Surface Acoustic Waves0
Observation Result of Chemical Composition Distribution of Resist Thin Film by Photoemission Electron Microscopy0
Dependence of Dissolution Kinetics of Main-Chain Scission Type Resists on Molecular Weight0
Clarification of Degradation of Aromatic Compounds by Oxygen Microbubbles Water0
Effect of Modified Chemical Junction of a Diblock Copolymer on the Microphase Separation Behavior0
Synthesis and characteristics of maleic anhydride-based photopolymers with pendant POSS groups for negative tone photoresists0
Unimolecular Benzodioxole-based Photoinitiators for Free Radical and Cationic Photopolymerization Under LED Light Irradiation0
Speculation of Mechanical Properties of Ni-W Micro-gears Fabricated by LIGA Process0
Synthesis, Properties, and Photovoltaic Characteristics of Fluoranthenedione-containing Nonfullerene Acceptors for Organic Solar Cells0
Effects of Solvent Polarity and Molecular Assembly on Photoisomerization of <i>p</i>-Hydroxyazobenzene Derivative0
Rheological Properties of Resin Films Incorporating Polymethacrylates with Ureylene Functional Groups0
Meeting Challenges of Advanced Packaging Designs with a Preimidized Polymer as Dielectric Material0
PFAS-free Rinse Materials for Pattern Collapse Mitigation in EUV Lithography0
Acid-responsive Emission Color Changes of Diarylaminobenzylideneanilines0
Interference of Photobase Generators on Covalent Bond Exchanges in Vinylogous Urea Vitrimers0
Characterization of Hydrogel Films with Reflective Colors Templated by Colloidal Crystals0
Fabrication of a Rose-Petal-Inspired Micro/Nanostructured Surface via the Ultraviolet Nanoimprint Lithography and Roll-Press Methods0
Surface Functionalization of Diamond-like Carbon Film with Biocompatible Polymer Brushes0
Modeling of Elastoplastic Deformation of Polymeric Microneedles using Finite Element Method0
Development of High Accurate Multi-Step Deep X-ray Exposure System Using Two-axial PZT Actuators0
Electron Generation in Tin-oxo Cage Extreme Ultraviolet Photoresists0
Developing an Endoscope Lens with Anti-Fogging and Anti-Fouling Properties using Nanoparticle Materials0
Rapid Surface Treatment of Polytetrafluoroethylene using Ar - Atmospheric Pressure Microwave Plasma0
Ultraviolet-curable Material with High Fluorine Content for Biomimetic Functional Structures Achieved by Nanoimprint Lithography with Gas-permeable Template for Life Science and Electronic Application0
Application of Self-aligned Quadruple Patterning to Fabrication of Nanoimprint Mold with Sub-12-nm Half-pitch0
Transfer Durability of Re-release Coated Replica Mold on Ultraviolet Nanoimprint Lithography0
Advanced Development Techniques for Extreme-Tight Pitch Patterning0
Determination of Radiation Dose Leading to Molecular Chain Destruction of Amino Acids0
Networked Polyphthalaldehydes Linked with Oxime Ether and Urethane Units and Their Photo-induced Depolymerization0
Development of A Low <i>k</i> Thermosetting Resin Based on 5,5’6,6’-Tetrahydroxy-3,3,3’,3’-Tetramethylspirobisindane with Decafluorobiphenyl Having Ethynyl Terminals0
Fabrication of Glass Microchannels Using Plant Roots and Nematodes0
Liquid Film Structure Formed by Two-Fluid Jet Impingement on a Rotating Disk0
Wettability Control of Ceramic Surfaces with Hierarchical Nano/Micro-patterns0
Progress in EUV Photoresists for High-Resolution Patterning0
Effect of Alternative Developer Solutions on EUVL Patterning0
Chemically Resolved IR-AFM Metrology of Sub-25 nm Half-Pitch Patterns in Self-Assembled Block Co-Polymers0
Development of Photo-curable Resin for 3D Printing Using Acrylic Monomers with Bisphenol Skeleton0
Projection Exposure Technology Using a Cone Mirror for Printing Patterns in a Lump on Inner Surfaces of Cylindrical Pipes0
Synthesis of Semiaromatic Polyguanamines from Tetraazacalix[2]arene[2]-triazine Dichloride with Aliphatic Diamines0
Switching the Solubility of Polymers using Intermolecular Reactions and Diffusion of Small Molecules0
Surface Nanopatterning of Bioabsorbable Materials Using Thermal Imprinting Technology0
Study of Dihedral-Corner-Reflector-Array Fabrication Process Using Soft X-ray Deep X-ray Lithography0
Influence of Thermo-Light Curing on the Microhardness and Fluoride Release of Glass-Ionomer Cements0
Synthesis of Low Dielectric Poly(ester imide)s Incorporating Double-Decker Silsesquioxane Units0
Manipulation of Polymer Solubility: Crosslinking, Thermal Activation and Variable-Temperature Bakes0
Synthesis of Sulfur-Containing High Refractive Index Polymers at Room Temperature and The Application in Lithography0
Novel Photoinitiator System for Simultaneous Physical drying and Free Radical Polymerization of Water-Borne Dispersions with Near-Infrared Excitation0
Synthesis of Radiation Curable Trimethylolpropane Epoxy Acrylate0
Retraction: Synthesis of Monomers Having a 2-Hydroxypyridyl Group and Their Application to Photo-adhesive Materials0
Dry Deposition and Dry Development of Metal Oxide Based Photoresist0
A Predictive Model for Polymerization Shrinkage Stress Derived from Photocuring Kinetics0
Photo-degradation of Di- and Trifunctional Oxime Ethers Bearing Polyphthalaldehyde Arms0
Insight into Charge Carrier Recombination Mechanisms in Lead Based Mixed Cation and Halide Perovskite0
Photoresist Design to Address Stochastics Issues in EUV Resists0
Synthesis and Resist Sensitive Property of Iodine-Containing Materials using Extreme Ultraviolet (EUV) Exposure Tool0
Fabrication of Freestanding Double-sided Through-hole Electrode Films using Imprint Technique0
EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing0
Relationship between Tg of Polyimide Resin and Resist Sensitivity in Three-Component Chemically Amplified Polyimide Resist0
Transient Swelling During Development of Poly(methyl methacrylate) Resist0
Synthesis and Electrophoretic Deposition of Polyimide with Methacrylic Groups on the Side Chain0
Structure Characterization of Polymer Nano-Film on the Difference of Lattice Point Compounds0
Development of Low-Residual-Stress Photosensitive Adhesive Materials for Wafer-Scale Microfluidic Device Fabrication0
Novel Thermobase Generator for Low Temperature Imidization of Polyamic Acid0
Amylopectin-based Eco-friendly Photoresist Material in Water-developable Lithography Processes for Surface Micropatterns on Polymer Substrates0
Spatial Distribution Analysis of Polymers in Resist Thin Film by Reflection-mode Resonant Soft X-ray Scattering0
Fabrication of SiO:CH Particle-agglomerated Films by PECVD with Vinyl-group Organosilicon Reactants0
Photoactive Compounds Effects on Removal Rate for Polystyrene-type Polymers by H<sub>2</sub>/O<sub>2</sub> Mixture Activated by Hot Tungsten Wire0
Using Machine Learning to Predict the Durability of a Mold for Producing Nanostructures in Ultraviolet Nanoimprint Lithography0
Stabilization of Spontaneous Orientation Polarization by Preventing Charge Injection from Electrodes0
Process and Sensitivity Optimisation of the Multi-Trigger Resist0
Micro Stirrer with Heater Mounted on SAW Actuator for High-speed Chemical Reaction0
Synthesis and Higher-order Structural Characterization of Polyimides Containing Chain-length-controlled Polysiloxanes0
ESR Analysis of Charge-Transporting Materials in Non-Fullerene Organic Solar Cells0
Development of Positive Tone-Type Photosensitive Materials Based on A Phenolic Resin with A Low Coefficient of Thermal Expansion0
Highly Functional Materials for Advanced Package0
Effect of Different Monomer Sequence of Polyacrylate Copolymers with Coumarin Moieties on their Photodimerization Reaction0
Synthesis and Characterization of a Non-Conjugated Backbone Polymer Bearing [1]Benzothieno[3,2-<i>b</i>][1]benzothiophene with a Herringbone Packing Motif0
Naphthoic Acid Derivatives as Photosensitizers for Short-wavelength α-Hydroxyacetophenone Photoinitiators0
Development of Bile Duct Stent with Antifouling Property Using Atmospheric Pressure and Low Temperature Plasma0
Resist Characteristic of Chemically Amplified Three-Component Novolac Resist Containing a Dissolution Inhibitor with Different Protection Ratio0
Biomimetic Diamond-like Carbon Coating on a Lumen of Small-diameter Long-sized Tube Modified Surface Uniformly with Carboxyl Group using Oxygen Plasma0
Low Transmission Loss Cu Wirings with Smooth Seed Layer and High Adhesion against Prepregs0
Friction Dynamics of Commercial Artificial Hair0
Laser Direct Writing of Ultra-thin Ag Wires with High Conductivity for High-performance UV Photodetectors0
The Photopolymer Science and Technology Award0
Investigation of Pressure Dependence in Photoresist Ashing Process using Microwave Excited Water Vapor Plasma0
Filling Behavior Observation of UV-curable Resin Using Bridge-Structure Mold0
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