Journal of Photopolymer Science and Technology

Papers
(The median citation count of Journal of Photopolymer Science and Technology is 0. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2021-05-01 to 2025-05-01.)
ArticleCitations
Synthesis of Highly Ordered Si-Containing Fluorinated Block Copolymers11
Microstructure Formation on Poly (Methyl Methacrylate) Film Using Atmospheric Pressure Low-Temperature Plasma10
Positive-Tone Organoantimony Resists8
Synthesis of a Dipyridyl Disulfide Cross-linking Reagent and Its Application to Photo-adhesion of Dissimilar Materials8
Reliability Study for Photosensitive RDL Material8
Synthesis and Properties of Polyguanamines Containing <i>N</i>-Phenylmelamine Units8
Chemical Mechanisms of Metal-Based Extreme Ultraviolet Resists7
Birefringent Control of Photo-Oriented Polymeric Films by <i>in situ</i> Exchange of Functional Moieties6
Investigations of Matrix-Exposure Lithography Using Stacked Linear Arrays of Squared Optical Fibers6
Oriented Nanowire Arrays with Phthalocyanine – C<sub>60</sub> Multi-Heterojunctions6
Preparation of Rigid Polyimides from Various Dianhydrides and 4,4’’’-Diaminoquaterphenyl and Comparison with Properties of Polyimides from 3,3’’’,4,4’’’-<i>p</i>-Quaterphenyltetracarboxyli5
Comparison of Photoresist Sensitivity between KrF, EB and EUV Exposure5
Improved Uniformity of Photoresist Ashing for a Half-Inch Wafer with Double U-shaped Antenna Structure in a Microwave-Excited Water Vapor Plasma5
A Study On Ant Colony Optimization5
Polymeric Antibacterial Surfaces with Nano-pillar Arrays Mimicking Cicada Wings4
Biocompatibility of Different Universal Adhesives During Short and Long Periods on Rat Model4
Study on Fabrication of X-ray Collimators by X-ray Lithography Using Synchrotron Radiation4
Low Temperature Curable Low Dk & Df Polyimide for Redistribution Layer4
Synthesis of Kapton-type Polyamide Ester and Study of Their Electrophoretic Deposition Function4
Nanoimprint Lithography for Collagen Micropatterning at Low-Temperature 5℃ with TiO<sub>2</sub>-SiO<sub>2</sub> Gas-Permeable Porous Mold4
Optical Oxygen Measurement using Microneedle of Bioabsorable Polymer4
Functional Group Influence on Block Copolymer Segment Interactions: An Analysis via Flory–Huggins and Hansen Solubility Parameters4
Characterization of Photoacid Generator Bound Resist with X-ray Absorption Spectroscopy at NewSUBARU4
Electrical and Optical Model of Reverse Mode Liquid Crystal Cells with Low Driving Voltage4
Evaluation of Surface-Enhanced Raman Scattering Substrate Consisting of Gold Nanoparticles Grown on Nanoarrays of Boehmite Fabricated using Magnetron Sputtering Process4
Theory of Photodecomposable Base in Chemically Amplified Resist4
Resist Removal Using Laser Irradiation Combined with Ozone Water Treatment4
Development of Selenonium PAGs in EUV Lithography toward High Sensitivity Achievement4
Agitation inside the Liquid Film on Two-Fluid Jet Sprayed Surface4
Investigating High Opacity and Increased Activation Energy in the Multi-Trigger Resist4
Thermal Conversion of Polyamic Acid Gel to Polyimide Solution Having Amino Group Sidechains3
High-Refractive-Index Photosensitive Siloxane Coatings for Optical Fingerprint Sensor3
Randomness of Polymer Microstructure in the Resist Film as Shot Noise3
Development of Materials Informatics Platform3
High Speed Ashing of Ion Implanted Photoresist by Microwave Excited Water Vapor Plasma with Powered Substrate3
Computational Lithography for 3-Dimensional Fine Photolithography using Sophisticated Built-in Lens Mask3
Visible-Light Sensitive Reworkable Resins for Dental Application: Improved Stability3
Evaluation of Color Stability of Experimental Dental Composite Resins Prepared from Bis-EFMA, A Novel Monomer System3
Properties of Imidazolinium-containing Multiblock Amphiphile in Lipid Bilayer Membranes3
Composite Membrane of Bi<sub>2</sub>WO<sub>6</sub>-NCQDs Laminated Hetero-junction Loaded on PES Support for Photo-catalytic Degradation of Organic Pollutants3
Experimental Evaluation and Modeling of Adsorption Phenomena of Nanoliposomes on Poly(dimethylsiloxane) Surfaces3
Ultra-hydrophilic Diamond-like Carbon Coating on an Inner Surface of a Small-diameter Long Tube with an Amino Group by AC High-voltage Plasma Discharge3
Multi-Trigger Resist for EUV lithography3
Photoluminescence Properties of Copolyimides Containing Naphthalene Core and Analysis of Excitation Energy Transfer between the Dianhydride Moieties3
Synthesis of ABC/ACB-Type Triblock Copolymers Composed of Polystyrene and Polymethacrylate via Living Anionic Polymerization and Analyzing the Effect of Casting Solvents on Higher-Order Structures3
A Novel Process to Reduce Roughness in Chemically Amplified Resist (CAR) for Next-Generation Lithography3
Synthesis of Highly Luminescent CsPbCl<sub>3</sub> Perovskite Nanocrystals with Oleylammonium Chloride as an Alternative Halide Source3
Droplet-Dispensed Ultraviolet Nanoimprint Lithography in Mixed Condensable Gas of Trans-1,3,3,3-Tetrafluoropropene and Trans-1-Chloro-3,3,3-Trifluoropropene3
Temporal Variations of Optical Emission Spectra in Microwave-Excited Plasma in Saturated Water Vapor under Reduced Pressure during Photoresist Removal3
Behavior of Secondary Electrons: Estimation of the Ionization Yield in Poly(hydroxystyrene) under EUV Irradiation Based on Binary Encounter Theory and Continuous Slowing-Down Spectrum3
The Removal of Acid Violet 7 from Aqueous Solutions by Photocatalytic-Poly(Ethylene Glycol Dimethacrylate-<i>co</i>-4-Vinylpyridine)-Titanium Dioxide Nanocomposite Beads: Kinetic, Isotherm3
Improvement of Resist Characteristics by Synthesis of a Novel Dissolution Inhibitor for Chemically Amplified Three-Component Novolac Resist2
Present Status of EUV Interference Lithography at NewSUBARU2
Influence of Counteranions on the Performance of Tin-based EUV Photoresists2
Photo-reactivity of 2,4,6-Tris(benzylthio)-1,3,5-triazines and Accompanying Refractive Index Change2
Synthesis of Photo-degradable Polyphthalaldehyde Macromonomer and Adhesive Property Changes of its Copolymer with Butyl Acrylate on UV-irradiation2
Fabrication of Moth-eye Antireflective Nanostructures via Oxygen Ion-beam Etching on a UV-curable Polymer2
High Resolution and Low Stress Photo-Definable Polyimide2
Spatial Distribution Analysis of Functional Groups in Resist Thin Film Using Reflection-Mode Resonant Soft X-ray Scattering2
Soft Motion of Dielectric Driven Balloon Actuator2
Synthesis and Structural Characterization of Polyimide Containing Diphenylsiloxane Unit2
Immobilization of CYP1A2 and CYP Reductase onto Self-assembled Phospholipid Layer and Evaluation of their Activity2
Novel Temporary Bonding/Debonding System Enabling Advanced Packaging Process2
Spatial Distribution Imaging of Resist Thin Film with Micrometer Resolution using Reflection Type Soft X-ray Projection Microscope2
Evaluation of Basic Behavior of Acrylic Polymer Changing Composition by KrF, ArF and EUV Exposure2
Fabrication of Moth-eye-structured Films with Two Types of Resin Separated by Micro-order Regions2
Printing of Random Patterns on Stepped Surfaces Using Speckle Lithography2
Novel Low <i>D<sub>f</sub></i> Photosensitive Materials for Redistribution Layer2
Nanoimprint Lithography and Microinjection Molding Using Gas-Permeable Hybrid Mold for Antibacterial Nanostructures2
Preparation and Applications of a Polysilane-allyl Methacrylate Copolymer2
Stochastic Simulation Study of Pattern Formation in EUV resists with Photo-Decomposable Quenchers2
Effect of pH on Decomposition of Organic Compounds Using Ozone Microbubble Water2
Control of Radical Polymerization and Cationic Polymerization in Photocurable Resin for 3D Printers2
Designed, Flexible Electrochromic Display Device with Fe(II)-Based Metallo-Supramolecular Polymer Using Mechanically Etched ITO Film2
Printing of Random Needle-like Resist Patterns Utilizing Laser Speckle Lithography2
Spin-on Metal Oxide Hard Mask as Underlayer for EUV Lithography with Chemically Amplified Resist2
Thermal, Optical, and Dielectric Properties of Bio-based Polyimides Derived from an Isosorbide-containing Dianhydride and Diamines with Long Alkyl Chains1
Development of Bile Direct Stent Having Antifouling Properties by Atmospheric Pressure Low-Temperature Plasma1
Biomimetic Wave Propagation in Magnetic Soft Actuator1
Surface Cleaning and Modification of Oxide Films by Atomic Hydrogen Annealing1
Evaluating the Anti-biofilm Performance of Si and Resin Based Nanopillars1
Photomechanical Rolling Motion of Mixed Molecular Glass Microspheres Containing an Azobenzene-based Amorphous Molecular Material1
Grazing-Incidence Soft-X-ray Scattering for the Chemical Structure Size Distribution Analysis in EUV Resist1
Preparation of a Polysilane–Methacrylate Copolymer with Two Methacrylate Species1
Evaluation of Electron Blur for Different Electron Energies1
Direct Observation of Gastropod's Locomotion for Soft Robot Application1
The Impact of (Poly)glycerol in Developer on the Dissolution and Sensitivity of Positive-tone Photosensitive Polyimides1
Flexible in-plane Micro-Supercapacitor Prepared by Laser Annealing and Ablation of a Graphene/Polyamide Acid Composite1
Synthesis of Methacryl Monomer Having a 6-Chloropyridyl Group and Their Application to Photo-adhesive Material1
Self-assembly of Crosslinked Polyimides Templated by Block Copolymers for Fabrication of Porous Films1
Physical and Chemical Drying of Coatings with NIR Absorbers to Replace Oven Technologies1
Going Beyond the Ohnishi Parameter: Correlating Dissociation Energies to Polymer Etch Rates1
Crack Resistance Evaluation Method of Photoimageable Dielectrics for Redistribution Layer1
Investigation of Control of Water Contact Angle by Composition Control of SiCO<sub>x</sub>H<sub>y</sub> Film Formed on Si Substrate1
Study on Irradiation Effects by Femtosecond-pulsed Extreme Ultraviolet in Resist Materials1
Enhanced Adhesion and Resolution of Negative Photoresists on Copper Substrates with Polyglycerin-Based Methacrylate1
The Photopolymer Science and Technology Award1
Non-chemically Amplified Negative Molecular Resist Materials using Polarity Change by EUV Exposure1
Recent Status of the Stochastic Issues of Photoresist Materials in EUV Lithography1
Resist Thickness Dependence of Latent Images in Chemically Amplified Resists Used for Electron Beam Lithography1
Glass Microchannel Formation by Mycelium1
Low Stress and Low Temperature Curable Photosensitive Polyimide1
Heat Treatment for a Membrane Composed of Polymer Nanofibers and a Perfluorosulfonic-Acid Polymer Matrix: Effect on Proton-Exchange-Membrane Properties1
Durability Test of Replica Mold in UV Nanoimprinting and Enlargement of Mold Patterned Area by Mold Stitching1
Substitution Effect on Self-Assembly and the Resulting Fluorescence Efficiency of Triangular Azo Chromophores1
Molecular Dynamics Study of Dependence of Loading Pressure on Shear Properties of Organic Nanofilms1
Hybrid Soft Replica Molds for Residual Layer-Free Patterning1
Self-assembly of Amphiphilic Peptide in Phospholipid Membrane1
Protrusion Formation of Polymer Surface by Atomic Hydrogen Annealing1
Negative Photo-Definable Polyimide Dry Films for Fine and High Aspect Ratio Patterning1
Metal Purifiers Specific to Lithography Related Chemicals1
Effect of Acrylic and Epoxy Hybrid Crosslinker on the Mechanical Strength of Photocurable Resin for 3D Printing1
Surface Modification of Fluoropolymers by Atomic Hydrogen1
Designing Er<sup>3+</sup>/Ho<sup>3+</sup>-Doped Near-Infrared (NIR-II) Fluorescent Ceramic Particles for Avoiding Optical Absorption by Water1
Bright Outlook for High-tech Industry1
Preparation of poly(methyl methacrylate) photochromic microcapsules containing spiro-pyran by solvent volatilization1
Impact of Water Treatment Reactor using TiO<sub>2</sub>-coated Micropillar Made by UV-NIL1
Molecular Assemblies of Minor Trigonal Molecules Regulated with the Help of Major Light-sensitive Components1
Formation and Stability of Cs<sub>2</sub>SnBr<sub>6</sub> Perovskite Nanocrystals from CsSn<sub>2</sub>Br<sub>5</sub> Nanocubes1
EUV Photochemistry of α-Substituted Antimony Carboxylate Complexes1
The Photopolymer Science and Technology Award1
Characterization of Shape of Polymer Nano-Films Possessing Various Crosslinking Chain Length1
Expanding the Formation Region of Double Gyroid Structures from ABC Triblock Terpolymers by Solution Casting1
Erratum to “Synthesis, Properties, and Photovoltaic Characteristics of Arch- and S-shaped Naphthobisthiadiazole-based Acceptors”[J. Photopolym. Sci. Technol. 34 (2021) 285-290]1
Characteristic of Immunosorbent Assay using Micro Capillary Arrays coated by SiCOxHy CVD Films1
Development of Dimethylaminotolane-Incorporated Poly(<i>N</i>-Isopropylacrylamide) Gel Exhibiting External Stimuli Responsive Fluorescence1
A 3D-Simulation and Experimental Study of the Fluid Flow Around a Nano-Step Structure Formed by UV-NIL1
Proposal of hybrid deep learning systems for process and material design in thermal nanoimprint lithography1
Degradation of Modified Polystyrenes Having Degradable Units by Near Infrared Light Irradiation in The Presence of A Photon Upconversion Nanoparticle and A Photoacid Generator1
Three-dimensional Numerical Simulation of Liquid Film Formation and the Distribution of Cleaning Solutions on a Rotating Disk1
Fundamental Evaluation of KrF Resist Changing Formulation by EB and EUV Exposure1
Fabrication of Diffractive Waveplates by Scanning Wave Photopolymerization with Digital Light Processor1
Mechanistic Studies of Positive-Tone Organoantimony Resists1
Relationship between Defect Risks and Effective Reaction Radius for Deprotection in Chemically Amplified Resist Process for Extreme Ultraviolet Lithography1
Synthesis of Star-shaped Miktoarm Terpolymers Composed of Polyisoprene, Polystyrene, and Poly (2,2,2-trifluoroethyl methacrylate) via Arm-first Approach1
Characterization of Hydrogel Films with Reflective Colors Templated by Colloidal Crystals0
Molecular Dynamics Simulation of the Resist Filling Process in UV-nanoimprint Lithography0
Emission Properties of Hybrid Films of Benzylideneaniline-based Amorphous Molecular Materials with Organic Acids0
Water-Repellency Model of the Water Strider, <i>Aquarius paludum paludum</i>, by the Curved Structure of Leg Micro-Hairs0
Novel Thermobase Generator for Low Temperature Imidization of Polyamic Acid0
Ultrasound-Assisted Degradation of Poly(<i>p</i>-<i>tert</i>-butoxycarbonyloxystyrene) using TiO<sub>2</sub> and Photoacid Generators0
Influence of Thermo-Light Curing on the Microhardness and Fluoride Release of Glass-Ionomer Cements0
Photoresist for Water-developable Photolithography Process Using Plant-derived Hemicellulose0
Hybrid Bonding Technology Utilizing Molding Compound and Photo Imageable Dielectric Systems0
Synthesis and Resist Sensitive Property of Iodine-Containing Materials using Extreme Ultraviolet (EUV) Exposure Tool0
Synthesis of Amino Acid-derived Curing Reagents Containing a Disulfide Bond and Their Application to Anionic UV Curing Materials0
Study of Dihedral-Corner-Reflector-Array Fabrication Process Using Soft X-ray Deep X-ray Lithography0
Photoreaction of Polysilyne and Methyl Methacrylate0
Effects of Solvent Polarity and Molecular Assembly on Photoisomerization of <i>p</i>-Hydroxyazobenzene Derivative0
Top Thermal Annealing of 2D/3D Lead Halide Perovskites: Anisotropic Photoconductivity and Vertical Gradient of Dimensionality0
Multifunctional Top-Coats Strategy for DSA of High-χ Block Copolymers0
Relationship between Tg of Polyimide Resin and Resist Sensitivity in Three-Component Chemically Amplified Polyimide Resist0
Effect on Suppression of Biofilm Growth using Microstructures Inspired by Living Organism0
Synthesis of Pyrene-Substituted Azobenzene Derivatives and Their Assembly into Flat Structures for Stimuli-Induced Switching0
Viscoelastic Properties of Cholesteric Liquid Crystals from Hydroxypropyl Cellulose Derivatives0
Vertical Chemical Unit Operation Using Microcapillary Arrays for Immunosorbent Assay0
Wafer Edge Protection Layer: A Solution for Metal Contamination Issue in Advanced Patterning Process0
Developing an Endoscope Lens with Anti-Fogging and Anti-Fouling Properties using Nanoparticle Materials0
Affinity Analysis of Photoacid Generator in the Thin Film of Chemical Amplification Resist by Contact Angle Measurement0
Photo-induced Decrosslinking of Oxime-ester Based Covalent Adaptable Networks in Film State0
Insight into Charge Carrier Recombination Mechanisms in Lead Based Mixed Cation and Halide Perovskite0
Observation Result of Chemical Composition Distribution of Resist Thin Film by Photoemission Electron Microscopy0
Electron Generation in Tin-oxo Cage Extreme Ultraviolet Photoresists0
Photoinduced Charge Carrier Dynamics of Metal Chalcogenide Semiconductor Quantum Dot Sensitized TiO<sub>2</sub> Film for Photovoltaic Application0
Synthesis and Structure-Activity Relationship of <i>N</i>-Substituted Carbazole Oxime Ester Photoinitiators0
Resist Characteristic of Chemically Amplified Three-Component Novolac Resist Containing a Dissolution Inhibitor with Different Protection Ratio0
Application of Self-aligned Quadruple Patterning to Fabrication of Nanoimprint Mold with Sub-12-nm Half-pitch0
Analyses of Charge Accumulation of PTzBT Ternary Polymer Solar Cells Using ESR Spectroscopy0
Surface Hardness of UV-Solidified Coatings Containing In-situ Synthesized, Self-dispersed Nano-gel Domains as a Function of Surface Roughness and Viscoelastic Characteristics0
Removal of Novolac Photoresist with Various Concentrations of Photo-active Compound Using H<sub>2</sub>/O<sub>2</sub> Mixtures Activated on a Tungsten Hot-wire Catalyst0
Meeting Challenges of Advanced Packaging Designs with a Preimidized Polymer as Dielectric Material0
Magnetic-Pneumatic Hybrid Soft Actuator0
Development of Positive Tone-Type Photosensitive Materials Based on A Phenolic Resin with A Low Coefficient of Thermal Expansion0
Synthesis and Electrophoretic Deposition of Polyimide with Methacrylic Groups on the Side Chain0
Highly Functional Materials for Advanced Package0
Chemometric Raman Spectral Analysis of Diamond-like Carbon Films Deposited by Plasma Discharge0
Speculation of Mechanical Properties of Ni-W Micro-gears Fabricated by LIGA Process0
Photo-thermal Dual Cured Blends of TiO<sub>2</sub>/diarylfluorene Films with High Refractive Indices0
Stabilization of Spontaneous Orientation Polarization by Preventing Charge Injection from Electrodes0
Surface Nanopatterning of Bioabsorbable Materials Using Thermal Imprinting Technology0
Siloxane Oligomer with Random Structure for Use in Photosensitive White Decorative Coatings0
Characterization of Surface Variation of Chemically Amplified Photoresist to Evaluate Extreme Ultraviolet Lithography Stochastics Effects0
Biomimetic Diamond-like Carbon Coating on a Lumen of Small-diameter Long-sized Tube Modified Surface Uniformly with Carboxyl Group using Oxygen Plasma0
Aggregation of Au Colloids using Surface Acoustic Waves0
Novel Photoinitiator System for Simultaneous Physical drying and Free Radical Polymerization of Water-Borne Dispersions with Near-Infrared Excitation0
Photoactive Compounds Effects on Removal Rate for Polystyrene-type Polymers by H<sub>2</sub>/O<sub>2</sub> Mixture Activated by Hot Tungsten Wire0
Purification Method for Achieving Low Trace Metals in Ultra-High Purity Chemicals0
Novel EUV Underlayer Design for Metal Oxide Resist Patterning0
Synthesis of Semiaromatic Polyguanamines from Tetraazacalix[2]arene[2]-triazine Dichloride with Aliphatic Diamines0
Ultraviolet-curable Material with High Fluorine Content for Biomimetic Functional Structures Achieved by Nanoimprint Lithography with Gas-permeable Template for Life Science and Electronic Application0
Synthesis, Properties, and Photovoltaic Characteristics of Fluoranthenedione-containing Nonfullerene Acceptors for Organic Solar Cells0
Petal-like Microstructures Formed from Sterically Crowded Chromophores0
Polymer-Based Near-Infrared Afterglow Fluorescent Complex of Dye and Rare-Earth-Doped Ceramics0
Effects of Solvents on the Preparation of PLLA/PEDOT:PSS Conductive Polymer Alloy Films0
Effect of Cross-linker on Photosensitive Polyimide to Achieve Full Imidization and Lower Stress for Good Reliability0
Nanoimprint with CO<sub>2</sub> Ambient0
Effect of Alternative Developer Solutions on EUVL Patterning0
Networked Polyphthalaldehydes Linked with Oxime Ether and Urethane Units and Their Photo-induced Depolymerization0
Using Machine Learning to Predict the Durability of a Mold for Producing Nanostructures in Ultraviolet Nanoimprint Lithography0
Research on a New Lithography Method Utilizing Laser Speckles for Printing Random Patterns0
Synthesis of Highly Transparent Semi-aromatic Poly(amide–imide)s from Alicyclic Diamines and Dicarboxylic Acids Derived from 2,2'-Di(trifluoromethyl)benzidine with Trimellitic Anhydride0
Fundamental Evaluation of Resist on EUV Lithography at NewSUBARU Synchrotron Light Facility0
Environmental Dependence of Chemiluminescence Using Solvatochromic Molecules0
Retraction: Synthesis of Monomers Having a 2-Hydroxypyridyl Group and Their Application to Photo-adhesive Materials0
Projection Exposure Technology Using a Cone Mirror for Printing Patterns in a Lump on Inner Surfaces of Cylindrical Pipes0
Effect of Different Monomer Sequence of Polyacrylate Copolymers with Coumarin Moieties on their Photodimerization Reaction0
Synthesis of Botryosin-type Resist Material Containing Acetal Groups in the Main Chain and Its Sensitivity0
Synthesis of High Refractive Linear to Branched Polyguanamines from 2-Amino-4,6-dichloro-1,3,5-triazine with Aromatic Diamines0
Micro Stirrer with Heater Mounted on SAW Actuator for High-speed Chemical Reaction0
EUV Metal Oxide Resist Development Technology for Improved Sensitivity, Roughness and Pattern Collapse Margin for High Volume Manufacturing0
Rapid Surface Treatment of Polytetrafluoroethylene using Ar - Atmospheric Pressure Microwave Plasma0
Synthesis of Resist Materials Containing Hemiacetal Groups and Their Resist Sensitivity0
Investigation of Pressure Dependence in Photoresist Ashing Process using Microwave Excited Water Vapor Plasma0
Functionalization of Poly-L-Lactic Acid Microneedle Tips using Hydrogel Photopolymerization0
The Photopolymer Science and Technology Award0
Nodule Deformation on Cleaning of PVA Roller Brushes and its Relation to Cross-contamination0
Development of Bile Duct Stent with Antifouling Property Using Atmospheric Pressure and Low Temperature Plasma0
Synthesis and Characterization of High Refractive Index Polythiocyanurates0
Polyimide-based Release Material for Rapid and Precise Mass Transfer of Semiconductor Chips0
Photoresist Design to Address Stochastics Issues in EUV Resists0
Synthesis and characteristics of maleic anhydride-based photopolymers with pendant POSS groups for negative tone photoresists0
Development of Low-Residual-Stress Photosensitive Adhesive Materials for Wafer-Scale Microfluidic Device Fabrication0
Dry Deposition and Dry Development of Metal Oxide Based Photoresist0
Molecular Dynamics Simulation of Pattern Formation for Negative-Type Resists in Electron Beam Lithography0
Evolution of Secondary Electrons Emission During EUV Exposure in Photoresists0
Determination of Radiation Dose Leading to Molecular Chain Destruction of Amino Acids0
The Synthesis of the High Resolution i Line Novolak Resist0
Advanced Development Techniques for Extreme-Tight Pitch Patterning0
Colloidal Crystal Films Consisting of Silica Particles Surface-modified with Polyacrylates Containing Branched Alkyl Chains0
Process and Sensitivity Optimisation of the Multi-Trigger Resist0
Filling Behavior Observation of UV-curable Resin Using Bridge-Structure Mold0
Structure Characterization of Polymer Nano-Film on the Difference of Lattice Point Compounds0
Polymerizable Olefins Groups in Antimony EUV Photoresists0
Effect of Modified Chemical Junction of a Diblock Copolymer on the Microphase Separation Behavior0
Fabrication of Polyimide Nano-Particles by Precipitation Polymerization0
Etching Mechanism of Si-rich SiO<sub>x</sub> Film by Atomic Hydrogen Annealing0
Fabrication and Characterizations of Polymer Electrolyte Composite Membranes Consisted of Polymer Nanofiber Framework Bearing Connected Proton Conductive Pathways0
Adhesion Improvement Mechanism of Polytetrafluoroethylene by Heat-assisted Atmospheric Pressure Glow Plasma Treatment0
Amylopectin-based Eco-friendly Photoresist Material in Water-developable Lithography Processes for Surface Micropatterns on Polymer Substrates0
Fabrication of a Rose-Petal-Inspired Micro/Nanostructured Surface via the Ultraviolet Nanoimprint Lithography and Roll-Press Methods0
Improved Hole-Transporting Properties in Conjugated Polymers Mixed with Polystyrene as an Insulating Polymer0
Development of A Low <i>k</i> Thermosetting Resin Based on 5,5’6,6’-Tetrahydroxy-3,3,3’,3’-Tetramethylspirobisindane with Decafluorobiphenyl Having Ethynyl Terminals0
Influence of Glycerol in Developer on Novolak-Type Positive-Tone Resist Solubility0
Progress in EUV Photoresists for High-Resolution Patterning0
The Measurement of the Refractive Index <i>n</i> and <i>k</i> Value of the EUV Resist by EUV Reflectivity Measurement Method0
Synthesis of Highly Ordered Fluorinated Copolymers with One Polyhydroxystyrene Block for Subsequent Metal Incorporation0
Fabrication of SiO:CH Particle-agglomerated Films by PECVD with Vinyl-group Organosilicon Reactants0
Synthesis and Optical Properties of Completely Etherified Hydroxypropyl Cellulose Derivatives0
Flexible and Semi-Transparent Antenna for ISM Band Fabricated by Direct Laser Writing0
Developing a Laparoscope Lens with Super Water-Repellent Antifouling Function using Biomimetic Materials0
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