IEEE Electron Device Letters

Papers
(The H4-Index of IEEE Electron Device Letters is 43. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2020-03-01 to 2024-03-01.)
ArticleCitations
Field-Plated Lateral Ga2O3 MOSFETs With Polymer Passivation and 8.03 kV Breakdown Voltage154
1-kV Sputtered p-NiO/n-Ga2O3 Heterojunction Diodes With an Ultra-Low Leakage Current Below $1~\mu$ A/cm2127
Ferroelectric HfO2 Memory Transistors With High-κ Interfacial Layer and Write Endurance Exceeding 1010 Cycles113
60-GHz Compact Dual-Mode On-Chip Bandpass Filter Using GaAs Technology108
Lateral β-Ga2O3 MOSFETs With High Power Figure of Merit of 277 MW/cm288
Millimeter-Wave On-Chip Bandpass Filter Based on Spoof Surface Plasmon Polaritons87
Demonstration of the p-NiOx/n-Ga2O3 Heterojunction Gate FETs and Diodes With BV2/Ron,sp Figures of Merit of 0.39 GW/cm2 and 1.38 GW/cm84
High-k Oxide Field-Plated Vertical (001) β-Ga2O3Schottky Barrier Diode With Baliga’s Figure of Merit Over 1 GW/cm281
All-Silicon Microdisplay Using Efficient Hot-Carrier Electroluminescence in Standard 0.18μm CMOS Technology75
Regrowth-Free GaN-Based Complementary Logic on a Si Substrate73
W-Band Power Performance of SiN-Passivated N-Polar GaN Deep Recess HEMTs73
Wideband and Low-Loss Surface Acoustic Wave Filter Based on 15° YX-LiNbO₃/SiO₂/Si Structure72
Forming-Free, Fast, Uniform, and High Endurance Resistive Switching From Cryogenic to High Temperatures in W/AlOx/Al2O3/Pt Bilayer Memristor72
3.3 kV Multi-Channel AlGaN/GaN Schottky Barrier Diodes With P-GaN Termination66
GaN HEMTs on Si With Regrown Contacts and Cutoff/Maximum Oscillation Frequencies of 250/204 GHz65
Improved Ferroelectric/Semiconductor Interface Properties in Hf0.5Zr0.5O2 Ferroelectric FETs by Low-Temperature Annealing65
2D MoS2-Based Threshold Switching Memristor for Artificial Neuron63
Prediction of FinFET Current-Voltage and Capacitance-Voltage Curves Using Machine Learning With Autoencoder62
6 kV/3.4 mΩ·cm2 Vertical β-Ga2O3 Schottky Barrier Diode With BV2/Ron,sp Performance Exceeding 1-D Unipolar Limit of GaN and SiC61
10 kV, 39 mΩ·cm2 Multi-Channel AlGaN/GaN Schottky Barrier Diodes59
Low-Power Artificial Neurons Based on Ag/TiN/HfAlOx/Pt Threshold Switching Memristor for Neuromorphic Computing57
Large Coupling Acoustic Wave Resonators Based on LiNbO₃/SiO₂/Si Functional Substrate56
Ferroelectric Switching in Sub-20 nm Aluminum Scandium Nitride Thin Films55
p-GaN Gate HEMT With Surface Reinforcement for Enhanced Gate Reliability53
Impact of Read Operation on the Performance of HfO2-Based Ferroelectric FETs52
Observation of Dynamic V TH of p-GaN Gate HEMTs by Fast Sweeping Characterization50
Oxide Synaptic Transistors Coupled With Triboelectric Nanogenerators for Bio-Inspired Tactile Sensing Application50
β-(Al0.18Ga0.82)2O3/Ga2O3 Double Heterojunction Transistor With Average Field of 5.5 MV/cm50
Quasi-Vertical GaN Schottky Barrier Diode on Silicon Substrate With 1010 High On/Off Current Ratio and Low Specific On-Resistance50
Identification of Trap States in p-GaN Layer of a p-GaN/AlGaN/GaN Power HEMT Structure by Deep-Level Transient Spectroscopy50
Multi-kV Class β-Ga₂O₃ MESFETs With a Lateral Figure of Merit Up to 355 MW/cm²49
An Enhancement-Mode Hydrogen-Terminated Diamond Field-Effect Transistor With Lanthanum Hexaboride Gate Material49
Variability Analysis for Ferroelectric FET Nonvolatile Memories Considering Random Ferroelectric-Dielectric Phase Distribution49
High-Brightness InGaN/GaN Micro-LEDs With Secondary Peak Effect for Displays48
Low Subthreshold Swing and High Mobility Amorphous Indium–Gallium–Zinc-Oxide Thin-Film Transistor With Thin HfO2 Gate Dielectric and Excellent Uniformity48
Beveled Fluoride Plasma Treatment for Vertical $\beta$ -Ga2O3Schottky Barrier Diode With High Reverse Blocking Voltage and Low Turn-On Voltage47
True Breakdown Voltage and Overvoltage Margin of GaN Power HEMTs in Hard Switching47
Scaled Atomic-Layer-Deposited Indium Oxide Nanometer Transistors With Maximum Drain Current Exceeding 2 A/mm at Drain Voltage of 0.7 V46
High Linearity and High Gain Performance of N-Polar GaN MIS-HEMT at 30 GHz45
CW Operation of a W-Band High-Gain Helical-Waveguide Gyrotron Traveling-Wave Tube45
E-Mode p-n Junction/AlGaN/GaN (PNJ) HEMTs44
Normally-Off-$\beta$ -Ga2O3 Power MOSFET With Ferroelectric Charge Storage Gate Stack Structure43
InP HEMTs for Sub-mW Cryogenic Low-Noise Amplifiers43
0.10802102088928