Journal of Vacuum Science & Technology A

Article	Citations
Hardness, adhesion, and wear behavior of magnetron cosputtered Ti:Zr-O-N thin films	89
Self-powered solar blind ultraviolet photodetector based on amorphous (In0.23Ga0.77)2O3/bixbyite (In0.67Ga0.33)2O3 heterojunction	70
Erratum: “Microscopic origins of radiative performance losses in thin-film solar cells at the example of (Ag,Cu)(In,Ga)Se2 devices” [J. Vac. Sci. Technol. A 42, 022803 (2024)]	57
Transport and trap states in proton irradiated ultra-thick κ-Ga2O3	55
Erratum: “MoS2-assisted growth of highly-oriented AlN thin films by low-temperature van der Waals epitaxy” [J. Vac. Sci. Technol. A 42, 050401 (2024)]	52
High surface quality Y2SiO5 silicate-crystal waveguides etched by chlorine-based inductive coupled plasma reactive ion etching	48
Implementation of an artificial spiking neuron with photoreceptor functionality using gas discharge tubes	42
Enhancing chemical vapor deposition growth and fabrication techniques to maximize hole conduction in tungsten diselenide for monolithic CMOS integration	37
Friction and wear behavior of C implanted copper via ion beam-assisted bombardment	33
Novel principal component analysis tool based on python for analysis of complex spectra of time-of-flight secondary ion mass spectrometry	32
Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition	30
In situ metal organic chemical vapor deposition of ultrathin sp2-bonded boron nitride dielectric on gallium nitride	29
On the interplay between a novel iron and iron-carbide atomic layer deposition process, the carbon nanotube growth, and the metal–carbon nanotube coating properties on silica substrates	27
Peak intensities in Auger electron spectroscopy for quantification: Relationship between differentiated spectral intensities and direct peak areas	26
Use of in situ electrical conductance measurements to understand the chemical mechanisms and chamber wall effects during vapor phase infiltration doping of poly(aniline) with TiCl4 + H2O	23
Applications and mechanisms of anisotropic two-step Si3N4 etching with hydrogen plasma conditioning	22
Effects of duty cycle and nitrogen flow rate on the mechanical properties of (V,Mo)N coatings deposited by high-power pulsed magnetron sputtering	22
Size distribution of clusters and nucleation preference of trimers during SiC (0001) surface epitaxial growth under low coverage	22
Deposition of sputtered NiO as a p-type layer for heterojunction diodes with Ga2O3	21
Plasma enhanced atomic layer etching of high-k layers on WS2	21
Nitrogen-incorporated tetrahedral amorphous carbon optically transparent thin film electrode	21
Tailoring structure, morphology, and tribo-mechanical properties of HiPIMS-deposited CrxNy coatings for enhanced performance in wear and corrosion protection	21
Analysis of pulsed direct current reactive magnetron sputtering on a silicon target	21
Comparing sputter rates, depth resolution, and ion yields for different gas cluster ion beams (GCIB): A practical guide to choosing the best GCIB for every application	21
Core-shell metallic nanotube arrays for highly sensitive surface-enhanced Raman scattering (SERS) detection	20

High crystalline quality homoepitaxial Si-doped β-Ga2O3(010) layers with reduced structural anisotropy grown by hot-wall MOCVD	20
Understanding the unique optical and vibrational signatures of sequential infiltration synthesis derived indium oxyhydroxide clusters for CO2 absorption	19
Using auxiliary electrochemical working electrodes as probe during contact glow discharge electrolysis: A proof of concept study	19
Testing commonly used background removal procedures for XPS quantitation of homogeneous material: Fe2O3, a transition metal oxide example	18
Conformal coating of macroscopic nanoparticle compacts with ZnO via atomic layer deposition	18
Aminosilane small molecule inhibitors for area-selective deposition: Study of substrate-inhibitor interfacial interactions	18
Structural, electronic, and thermodynamic properties of Li3X (X = N, P, As) compounds for solid-state lithium-ion batteries	18
Application of high-spatial-resolution distributed fiber-optic sensing technique for neutral gas temperature mapping in inductively coupled Ar plasmas	17
Effect of the repeated application of First Contact™ polymer on xenon-difluoride passivated lithium fluoride on aluminum surfaces for space telescopes	17
Study on the modification of TC11 titanium alloy microarc oxidized film layer by ZrO2 particles	17
Kinetic Monte Carlo study on the effect of growth conditions on the epitaxial growth of 3C–SiC (0001) vicinal surface	17
Nonpyrophoric alternative to trimethylaluminum for the atomic layer deposition of Al2O3	16
Novel high-efficiency plasma nitriding process utilizing a high power impulse magnetron sputtering discharge	16
Methyl-methacrylate based aluminum hybrid film grown via three-precursor molecular layer deposition	16
Hot corrosion behavior of NiCoCrAlY laser cladding coating on 17-4PH stainless steel before and after high-current pulsed electron beam irradiation	16
Method for extracting the intrinsic diffusion coefficient from grain boundary diffusion depth profile	16
Ga+-focused ion beam damage in n-type Ga2O3	15
Enhancing minority carrier lifetime in Ge: Insights from HF and HCl cleaning procedures	15
Amorphous carbon thin films: Mechanisms of hydrogen incorporation during magnetron sputtering and consequences for the secondary electron emission	15
Ordered deficient perovskite La2/3TiO3 films grown via molecular beam epitaxy	15
Evaluation of stress and elastic energy relief efficiency in a hard coating with a metal interlayer—Using TiN/Ti as a model system	15
Significance of plasma-surface interactions in the etch behavior of low-k materials	15
Spin- and time-resolved photoelectron spectroscopy and diffraction studies using time-of-flight momentum microscopes	15
Modeling scale-up of particle coating by atomic layer deposition	14
Dependence of persistent photoconductivity on the thickness of β-Ga2O3 thin film photodetectors on c-plane sapphire via magnetron sputtering	14
Reactive magnetron sputtering of copper oxide coatings using the metallic mode assisted by RF-ICP source: Experiment and calculation	14
Structure and corrosion resistance of electron-beam-strengthened and micro-arc oxidized coatings on magnesium alloy AZ31	14
Enhanced plasma resistance of uniform ALD-Y2O3 thin films for chamber components’ coatings	14
Design and fabrication of color-generating nitride based thin-film optical filters for photovoltaic applications	14
Preparation of stable and highly hydrophobic coatings via one-step spray method and study of their anti-icing performance	14
Stability investigation of Eu3+ doped CaF2 thin film with ZnO coating under electron beam irradiation	14
In situ studies on atomic layer etching of aluminum oxide using sequential reactions with trimethylaluminum and hydrogen fluoride	14
Surface temperature of a 2 in. Ti target during DC magnetron sputtering	14
My times with Bill Wolfer	13
Micromechanical properties of micro- and nanocrystalline CVD diamond thin films with gradient microstructures and stresses	13
Radiation damage effects on electronic and optical properties of β-Ga2O3 from first-principles	13
Enhancement of CrN-polyetherimide adhesion by hardening substrate’s surface	13
Polydimethylsiloxane surface irradiated by nitrogen ions: Influence of low molecular fractions	13
Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition	13
Adsorption mechanism of dimeric Ga precursors in metalorganic chemical vapor deposition of gallium nitride	13
Preparation and hot corrosion properties of the AlCrFeCoNi0.5Si high-entropy alloy coating deposited by the air plasma spraying	13
Nucleation and quantum confinement of nano-platelet Bi2–Bi2Se3	13
Enhancing laser-driven flyer velocity by optimizing of modulation period of Al/Ti reactive multilayer films	12
Molybdenum erosion in iodine plasma at hollow cathode conditions	12
Comparison of triethylgallium and diethylgallium ethoxide for β-Ga2O3 growth by metalorganic vapor phase epitaxy	12
Probabilistic zero-dimensional model with calibration and uncertainty quantification for capacitively coupled plasma reactor simulations	12
Series resonance effects of a variable inductor termination on the nonpowered electrode in capacitively coupled plasmas	12
Selective vapor sensors with thin-film MoS2-coated optical fibers	12
Numerical ellipsometry: Advanced methods for design, testing, and use of artificial intelligence for absorbing films using Jones and/or Mueller measurements	12
Deposition of tungsten oxide films by reactive magnetron sputtering on different substrates	12

Substrate induced composition change during Ge2Sb2Te5 atomic layer deposition and study of initial reactions on SiO2 surface	12
Comprehensive ion-molecule reactive collision model for processing plasmas	12
Metalorganic chemical vapor deposition of (100) β-Ga2O3 on on-axis Ga2O3 substrates	12
Plasma enhanced atomic layer deposition of HfO2—A potential gate dielectric for GaN-based devices	12
Quantifying the resonant photoemission of radiation damaged Pu	12
Gliding arc discharge plasma treatment for promoting germination of wheat seed at low ambient temperature	12
Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon	11
Probing copper-boron interactions in the Cu2B8− bimetallic cluster	11
Quantification in high-energy resolution Auger electron spectroscopy; Proposal of a reference target convolution technique for direct spectra	11
Plasma induced damage on AlGaN/GaN heterostructure during gate opening for power devices	11
Photoemission study of plutonium oxycarbide	11
Erratum: “Ion beam assisted chemical vapor deposition of hybrid coatings—Process diagnostics and mechanisms” [J. Vac. Sci. Technol. A 39, 063003 (2021)]	11
Spatial atomic layer deposition: Transport-reaction modeling and experimental validation of film geometry	11
Correlation of interfacial and dielectric characteristics in atomic layer deposited Al2O3/TiO2 nanolaminates grown with different precursor purge times	11
Origin of enhanced thermal atomic layer etching of amorphous HfO2	11
Material and electrical characterization of ultrawide bandgap BN/AlN metal-insulator-semiconductor (MIS) Schottky diodes	11
Cathodoluminescence spectroscopy and Kelvin probe work function correlation of native point defect distributions with piezoelectric voltage in strained ZnO microwires	11
Structure and properties of piezoelectric aluminum nitride thin films deposited by radio-frequency magnetron sputtering for surface acoustic wave applications	11
Atomic step disorder on polycrystalline surfaces leads to spatially inhomogeneous work functions	10
Plasma enhanced atomic layer deposition of manganese nitride thin film from manganese amidinate and ammonia plasma	10
Moisture barrier coating of AlN and Al2O3 multilayer film prepared by low-temperature atomic layer deposition	10
AI-guided frame prediction techniques to model single crystal diamond growth	10
Atomic layer deposition of transition metal chalcogenide TaSx using Ta[N(CH3)2]3[NC(CH3)3] precursor and H2S plasma	10
Two step synthesis of ultrathin transition metal tellurides	10
Infinite selectivity in dry etching process for high-aspect-ratio hole using C7HF7 gas plasma	10
On the growth kinetics, texture, microstructure, and mechanical properties of tungsten carbonitride deposited by chemical vapor deposition	10
Effect of additive type and amount on structural and mechanical properties of ZrO2/B4C/Al2O3/SiC added Al 1050 based composite structures produced by vacuum infiltration—Comparative study	10
Self-assembled oligomeric structures of an asymmetric molecular linker; 4-isocyanophenyl disulfide on Au(111)	9
Comparison of three titanium-precursors for atomic-layer-deposited TiO2 for passivating contacts on silicon	9
Deposition rate and optical emissions in niobium oxide processes by reactive sputtering	9
Uppsala and Berkeley: Two essential laboratories in the development of modern photoelectron spectroscopy	9
Impact of working pressure on the crystallinity and mechanical properties of vanadium nitride coatings deposited in helium/nitrogen reactive plasma	9
Polarized photoluminescence from Sn, Fe, and unintentionally doped β-Ga2O3	9
Chemical mechanism for nucleation enhancement in atomic layer deposition of Pt by surface functionalization	9
Zn:DLC films via PECVD-HIPIMS: Evaluation of antimicrobial activity and cytotoxicity to mammalian cells	9
Morphology transformation of Ge2Sb2Te5 films induced by ultrashort laser pulses	9
Bottom angle control mechanism and optimization of slanted gratings for optical applications	9
Conformal and superconformal chemical vapor deposition of silicon carbide coatings	9
Microstructure and properties of laser cladding NiFeCrCoMo high entropy alloy coating on the surface of TP347 steel	9
Revealing the mechanism of interfacial adhesion enhancement between the SiO2 film and the GaAs substrate via plasma pre-treatments	9
Bio-tribocorrosion resistance of CoB–Co2B and Co2B layers on CoCrMo alloy	9
XPS investigation of monoatomic and cluster argon sputtering of zirconium dioxide	9
In situ diagnostics of the Si etching structures profile in ICP SF6/C4F8 plasma: Macrostructures	9
Low-temperature ALD of metallic cobalt using the CoCOhept precursor: Simulation-assisted process development for deposition on temperature sensitive 3D-structures	9
First-principles investigation on pressure-induced phase transitions and electronic properties in GeTe	9
Insight into the effect of coexistence of CO2 and H2 on stoichiometric and defective PuO2 surfaces hydriding from first-principles study	9
Study of microstructure and mechanical properties of cBN coatings on nanocrystalline diamond transition layer prepared by magnetron sputtering	9
Empirical analysis of a hollow cathode’s intensity distribution in the vacuum ultraviolet range	9
MOS structure with as-deposited ALD Al2O3/4H-SiC heterostructure with high electrical performance: Investigation of the interfacial region	9
Room-temperature atomic layer deposition of iron oxide using plasma excited humidified argon	9
Role of SiCl4 addition in CH3F/O2 based chemistry for Si3N4 etching selectively to SiO2, SiCO, and Si	9
Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition	9
Effect of data preprocessing and machine learning hyperparameters on mass spectrometry imaging models	9
In situ growth of ultrathin Y2O3 capping layers for Eu-organic thin films via atomic/molecular layer deposition	9
High throughput multiplexing reactor design for rapid screening of atomic/molecular layer deposition processes	9
High-quality GaN thin film deposition at low temperature by ECR plasma-assisted sputter deposition method and its dependence of sapphire substrate misorientation angle	9
Continuous wave laser-assisted evaporation of halide perovskite thin films from a single stoichiometric source	9
Spin-related negative magnetoresistance in germanium films	9
Spatiotemporal evolution of excitation temperature of vacuum arcs by tomography	9
Plasma-enhanced atomic layer deposition of crystalline GaN thin films on quartz substrates with sharp interfaces	9
Textured growth and electrical characterization of zinc sulfide on back-end-of-the-line compatible substrates	9
Scanning electron microscopy imaging of multilayer-doped GaN: Effects of surface band bending, surface roughness, and contamination layers on doping contrast	9
Bacterial and corrosion resistance of polytetrafluoroethylene-silver composite coatings by magnetron sputtering	8
Effects of N2 and O2 plasma treatments of quartz surfaces exposed to H2 plasmas	8
Growth and properties of Sn-doped sol-gel Ga2O3 thin films	8
Microkinetic based growth and property modeling of plasma enhanced atomic layer deposition silicon nitride thin film	8
Comparison of BCl3, TiCl4, and SOCl2 chlorinating agents for atomic layer etching of TiO2 and ZrO2 using tungsten hexafluoride	8
Optoelectronic properties of transparent oxide semiconductor ASnO3 (A = Ba, Sr, and Ca) epitaxial films and thin film transistors	8
Effect of magnetic field on capacitively coupled plasma modulated by electron beam injection	8
Boosting hole mobility in p-type SnOx (x < 2) film through Ge incorporation via co-sputtering	8
Effect of vacuum heat treatment on tribological properties of metal-doped CuS/MoS2 coating	8
Enhancing biocompatibility, mechanical properties, and corrosion resistance of laser cladding β-TiNb coatings	8
Cu2O/ZnO heterojunction self-powered photodetector performance regulation	8
Foldable electrochromic NiO films	8
Evaluation of electrical characteristics through band alignment and defect analysis of ultrathin Pt/ZrO2–Al2O3–ZrO2/TiN DRAM metal–insulator–metal capacitors	8
Neutral transport during etching of high aspect ratio features	8
Growth and optical properties of NiO thin films deposited by pulsed dc reactive magnetron sputtering	8
Link between cracking mechanisms of trilayer films on flexible substrates and electro-mechanical reliability under biaxial loading	8
Characterization of a broad beam Kaufman-type ion source operated with CHF3 and O2	8
Electroconductive and photoelectric properties of Pt/(100) β-Ga2O3 Schottky barrier diode based on Czochralski grown crystal	8

Wear and corrosion resistance of zinc-oxide and zirconium-oxide coated WE43 magnesium alloy	8
The growth of self-intercalated Nb1+xSe2 by molecular beam epitaxy: The effect of processing conditions on the structure and electrical resistivity	8
Insufficient reporting of x-ray photoelectron spectroscopy instrumental and peak fitting parameters (metadata) in the scientific literature	8
Thermal atomic layer etching of cobalt using sulfuryl chloride for chlorination and tetramethylethylenediamine or trimethylphosphine for ligand addition	8
Area-selective atomic/molecular layer deposition via block copolymer approach: Zn-benzene dithiol deposition as a case study	8
Transition metal nanolines grown on a functionalized silver substrate	8
Homogeneous high In content InxGa1−x N films by supercycle atomic layer deposition	8
Numerical ellipsometry: Artificial intelligence for rapid analysis of indium tin oxide films on silicon	8
Theoretical analysis of thermal spikes during ion bombardment of amorphous silicon nitride surfaces	8
Low temperature epitaxial growth of Cantor-nitride thin films by magnetic field assisted magnetron sputtering	8
Combining molecular beam epitaxy and low-energy electron microscopy with in situ magnetic susceptibility measurements within an integrated ultrahigh vacuum system	8
Surface treatment of TaN for sub-2 nm, smooth, and conducting atomic layer deposition Ru films	8
Synthesis and electrical behavior of VO2 thin films grown on SrRuO3 electrode layers	8
Regression analysis of temperature-dependent alumina atomic layer deposition growth per cycle using trimethylaluminum and water as precursors	8
Large redshift in photoluminescence of InAs/AlAs short-period superlattices due to highly ordered lateral composition modulation	8
Effect of interface roughness on the tribo-corrosion behavior of diamond like carbon coatings on titanium alloy	8
Improved optical efficiency of GaAs-based infrared vertical-cavity surface-emitting laser enabled by combining a metallic reflector and a Bragg reflector	7
In situ and ex situ quantification of nanoparticle fluxes in magnetron sputter inert gas condensation: A Cu nanoparticle case study	7
Plasma-enhanced atomic layer deposition of crystalline Ga2S3 thin films	7
Microstructure and properties of Mg/Ti joint welded by resistance spot welding with an aluminum interlayer	7
Area selective atomic layer deposition of ruthenium with phenol as a small molecule inhibitor	7
Effect of annealing on the magnetic anisotropy of GaMnAsP layers with graded P concentration	7
Effect of focus ring with external circuit on cathode edge sheath dynamics in a capacitively coupled plasma	7
Crystallization kinetics during layer exchange of 28Si implanted Al films for fabrication of quantum computers: A theoretical model	7
Challenges in porosity characterization of thin films: Cross-evaluation of different techniques	7
Effect of fabrication processes before atomic layer deposition on β-Ga2O3/HfO2/Cr/Au metal–oxide–semiconductor capacitors	7
Adapting FEFF to 5f angular momentum coupling	7
Materials’ properties of low temperature deposited Cu/W and Cu/Cr multilayer thin films using high power impulse magnetron sputtering	7
Chemical significance of x-ray photoelectron spectroscopy binding energy shifts: A Perspective	7
Half-century old Berkeley idea now finding missing links of nuclear quadrupole moments	7
Machine learning-based prediction of the electron energy distribution function and electron density of argon plasma from the optical emission spectra	7
An examination of the performance of molecular dynamics force fields: Silicon and silicon dioxide reactive ion etching	7
Sn-doping concentration dependence of electrical, optical, and magnetic properties in epitaxial Mn-doped indium tin oxide films deposited by RF magnetron sputtering	7
Near-surface electronic structure in strained Ni-ferrite films: An x-ray absorption spectroscopy study	7
Probing trade-off between critical size and velocity in cold-pray: An atomistic simulation	7
Effect of space charge-limited mechanism on the x-ray detection performance of Ni/Au β-Ga2O3 Schottky diode at high temperature	7
Interaction of Mg with the ionic liquid 1-butyl-1-methylpyrrolidinium bis(trifluoromethylsulfonyl)imide—An experimental and computational model study of the electrode–electrolyte interface in post-lit	7
Fabrication of antireflective coatings with self-cleaning function using Si–Ti modified hollow silicon mixed sol	7
Arsenic-flux dependence of surface morphology in InAs homoepitaxy	7
Effect of deposition temperature on the phase structure, mechanical performance, and corrosion resistance of CrMoN coatings prepared by magnetron sputtering	7
Design method for generating multiple colors with thickness-modulated thin-film optical filters for silicon solar cells	7
Evolution of β-Ga2O3 to γ -Ga2O3 solid-solution epitaxial films after high-temperature annealing	7
Influence of magnetic field strength on plasma, microstructure, and mechanical properties of Cr thin films deposited by MPPMS and DOMS	7
Variability of band alignment between WS2 and SiO2: Intrinsic versus extrinsic contributions	7
Effect of ozone and humidity addition on hydrogen peroxide generation characteristics of plasmas in oxygen bubbles	7
Interfacial oxide and other species in trimethylaluminum-pretreated atomic layer deposition-Al2O3/GaN characterized by sputter-assisted ToF-SIMS	7
Atomic layer deposition of nanofilms on porous polymer substrates: Strategies for success	7
Insight into the mechanism of lattice damage in ground and polished InAs substrates	7
In situ, simultaneous spectroscopic ellipsometry and quadrupole mass spectrometry studies of ZnO etching using Hacac and O2 plasma	7
XPS guide for insulators: Electron flood gun operation and optimization, surface charging, controlled charging, differential charging, useful FWHMs, problems and solutions, and advice	7
VAMAS TWA2 interlaboratory comparison: Surface analysis of TiO2 nanoparticles using ToF-SIMS	7
David Shirley: Pioneer, teacher, mentor, and visionary scientific leader	7
Optimizing indium concentration in ZnO thin films for enhanced optical, electronic, and thermoelectric applications	7
Benchmarking large language models for materials synthesis: The case of atomic layer deposition	7
Conduction band nonparabolicity, chemical potential, and carrier concentration of intrinsic InSb as a function of temperature	7
Numerical study of the effects of discharge parameters on capacitively coupled plasma in a magnetic field	6
Performance evaluation of GaN etching using Cl2-based plasma with bias pulsing	6
In-cycle evolution of thickness and roughness parameters during oxygen plasma enhanced ZnO atomic layer deposition using in situ spectroscopic ellipsometry	6
Investigation of the dielectric recovery process of vacuum arc in double breaks by planar laser-induced fluorescence	6
Development of a process for flame retardant coating of textiles with bio-hybrid anchor peptides	6
Wettability and corrosion resistance of zirconium nitride films obtained via reactive high-power impulse magnetron sputtering	6
Stabilizing far-from-equilibrium (Mo,Ti)S2 thin films by metal sulfurization at reduced temperature	6
Erratum: “Secondary ion mass spectrometry quantification: Do you remember when a factor of 2 was good enough?” [J. Vac. Sci. Technol. B 41, 030803 (2023)]	6
Ultrathin stable Ohmic contacts for high-temperature operation of β-Ga2O3 devices	6
Computational modeling of a surfatron mode microwave plasma in NH3/N2 for remote radical generation in a silicon native oxide cleaning process	6
Effect of SiO2 buffer layer on phase transition properties of VO2 films fabricated by low-pressure chemical vapor deposition	6
Atomic layer etching of SiO2 using sequential exposures of Al(CH3)3 and H2/SF6 plasma	6
Dynamical reverse folding and residual gas expansion models of flexible thin films	6
Investigation of arc spot splitting behavior on aluminum, titanium, and their alloy cathodes under different gas flows	6
Layer thickness dependent interface strengthening of nanolayered W/NbMoTaW medium-entropy alloys	6
CF4 plasma-based atomic layer etching of Al2O3 and surface smoothing effect	6
Properties of Schottky barrier diodes on heteroeptixial α-Ga2O3 thin films	6
Measurements of atomic hydrogen recombination coefficients and the reduction of Al2O3 using a heat flux sensor	6
Rapid preparation of superhydrophobic and corrosion-resistant surfaces based on etching-assisted phosphating modification and analysis of their corrosion resistance mechanisms	6
Computational fluid dynamics simulation of dual-showerhead configuration: Key to uniform large-scale chemical vapor deposition SiC coatings	6
Effect of drift layer doping and NiO parameters in achieving 8.9 kV breakdown in 100 μm diameter and 4 kV/4 A in 1 mm diameter NiO/β-Ga2O3 rectifiers	6
On simulating thin-film processes at the atomic scale using machine-learned force fields	6
Over 6 MV/cm operation in β-Ga2O3 Schottky barrier diodes with IrO2 and RuO2 anodes deposited by molecular beam epitaxy	6
Optical studies of pure and (Cu, Co) doped nickel zinc ferrite films deposited on quartz substrate	6
Practical guide on chemometrics/informatics in x-ray photoelectron spectroscopy (XPS). II. Example applications of multiple methods to the degradation of cellulose and tartaric acid	6
Thermoelectric performance of bulklike MoS2 thin films: Fabrication, characterization, and Seebeck coefficient analysis	6
Nucleation and growth of molybdenum disulfide grown by thermal atomic layer deposition on metal oxides	6
Influence of nitriding time on the microstructural evolution, mechanical properties, and tribological performance of Ti–N nitrided layers via microwave plasma nitriding	6
Erratum: “Isotropic atomic layer etching of MgO-doped lithium niobate using sequential exposures of H2 and SF6/Ar plasmas” [J. Vac. Sci. Technol. A 42, 062603 (2024)]	6
Growth of conformal TiN thin film with low resistivity and impurity via hollow cathode plasma atomic layer deposition	6
Enhancing the photo-response characteristics of graphene/n-Si based Schottky barrier photodiodes by increasing the number of graphene layers	6
On the possible nature of deep centers in Ga2O3	6
Ultraviolet photo-enhanced atomic layer deposition for improving dielectric properties of low temperature deposited Al2O3	6
Mechanism of residue formation on Ge-rich germanium antimony tellurium alloys after plasma etching	6
Interface-mediated ferroelectricity in PMN-PT/PZT flexible bilayer via pulsed laser deposition	6
6p valence relativistic effects in 5d photoemission spectrum of Pb atom and bonding properties of Pb-dimer using Dirac–Hartree–Fock formalism including many-body effects	6
Oxygen incorporation in AlN films grown by plasma-enhanced atomic layer deposition	6
Area selective PECVD on metal oxide resist	6
Proton irradiation effect on InAs/GaAs quantum dot solar cells	6
Sequence modeling for predicting three-dimensional plasma etching profiles with deep learning	6