Journal of Vacuum Science & Technology A

Papers
(The TQCC of Journal of Vacuum Science & Technology A is 4. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2021-01-01 to 2025-01-01.)
ArticleCitations
Band structure and strain distribution of InAs quantum dots encapsulated in (Al)GaAs asymmetric matrixes296
Study of the surface and interface properties of ultrathin nickel film on cerium layer by in situ magnetic sputtering77
Effects of the focus ring on the ion kinetics at the wafer edge in capacitively coupled plasma reactors73
VAMAS TWA2 interlaboratory comparison: Surface analysis of TiO2 nanoparticles using ToF-SIMS64
Long and flexible atmospheric pressure plasma jet probes for operation in humid environments52
Determination of recombination coefficients for hydrogen, oxygen, and nitrogen gasses via in situ radical probe system48
Large-scale synthesis of atomically thin ultrawide bandgap β-Ga2O3 using a liquid gallium squeezing technique47
Reconstruction changes drive surface diffusion and determine the flatness of oxide surfaces45
Photoelectron spectroscopic studies on metal halide perovskite materials32
Immersion ellipsometry for the uncorrelated determination of ultrathin film thickness and index of refraction: Theory and examples30
NiO/β-(AlxGa1−x)2O3/Ga2O3 heterojunction lateral rectifiers with reverse breakdown voltage >7 kV30
Atomic layer deposition of sodium fluoride thin films29
Localized phase transition of TiO2 thin films induced by sub-bandgap laser irradiation29
Molecular dynamics simulation of amine formation in plasma-enhanced chemical vapor deposition with hydrocarbon and amino radicals29
Influence of hydrogen-bonded 3-mercaptopropionic acid bilayers on binary self-assembled monolayer formation27
Promoting subsurface Sn incorporation at Nb(100) oxide surface sites leading to homogeneous Nb3Sn film growth for superconducting radiofrequency applications25
Growth of topological insulator Bi2Se3 particles on GaAs via droplet epitaxy24
Numerical study of the effects of discharge parameters on capacitively coupled plasma in a magnetic field22
Thermal atomic layer etching of amorphous and crystalline Al2O3 films22
Atomic layer etching of SiO2 using sequential exposures of Al(CH3)3 and H2/SF6 plasma22
Step barrier effects during early stages of the kinetic roughening of fcc(111) surfaces21
Heterovalent semiconductor structures and devices grown by molecular beam epitaxy21
CF4 plasma-based atomic layer etching of Al2O3 and surface smoothing effect21
Homoepitaxial GaN micropillar array by plasma-free photo-enhanced metal-assisted chemical etching20
Epitaxial growth of Bi, Sb, and Sn20
Optical constants of single-crystalline Ni(100) from 77 to 770 K from ellipsometry measurements20
Effects of duty cycle and nitrogen flow rate on the mechanical properties of (V,Mo)N coatings deposited by high-power pulsed magnetron sputtering20
Understanding the unique optical and vibrational signatures of sequential infiltration synthesis derived indium oxyhydroxide clusters for CO2 absorption20
CrN/AlN nanolaminates: Architecture, residual stresses, and cracking behavior20
Modulation of the LaFeO3 film growth by the terrace width of SrTiO3 substrates20
Growth of pentacene molecules on Tsai-type quasicrystals and related crystal surfaces20
Hyperfine interaction studies in the David Shirley group, 1960–1975. I. Low-temperature nuclear orientation19
Zirconia-titania-doped tantala optical coatings for low mechanical loss Bragg mirrors19
David Shirley: Pioneer, teacher, mentor, and visionary scientific leader19
On the interplay between a novel iron and iron-carbide atomic layer deposition process, the carbon nanotube growth, and the metal–carbon nanotube coating properties on silica substrates19
Temporal evolution of the ion flux to the target in rotational RF multimagnetron plasma18
Highly efficient plasma generation in inductively coupled plasmas using a parallel capacitor18
Study of synthesis strategies to improve the electrical properties of magnetron sputtered copper oxide thin films18
Hole selective nickel oxide as transparent conductive oxide17
Size distribution of clusters and nucleation preference of trimers during SiC (0001) surface epitaxial growth under low coverage17
Effects of metal redeposition in plasma sputtering17
Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition16
Remote inductively coupled plasmas in Ar/N2 mixtures and implications for plasma enhanced ALD16
Dependence of film structure on the film structure-independent equivalent film thickness in magnetron sputtering deposition of Ag thin films16
Epitaxial growth of highly textured ZnO thin films on Si using an AlN buffer layer by atomic layer deposition16
Chemical conversion of MoS2 thin films deposited by atomic layer deposition (ALD) into molybdenum nitride monitored by in situ reflectance measurements15
Oxygen incorporation in AlN films grown by plasma-enhanced atomic layer deposition15
True hero of the trade: On the critical contributions of Art Gossard to modern device techonology15
Corrosion resistance and conductivity of CrN, CrAlN, and CrTiN coatings applied to bipolar plates for proton exchange membrane fuel cells15
Best practices for performing quantitative TOF-SIMS analyses14
High resolution depth profiling using near-total-reflection hard x-ray photoelectron spectroscopy14
Effect of nonvertical ion bombardment due to edge effects on polymer surface morphology evolution and etching uniformity14
Nanostructured bi-metallic Pd–Ag alloy films for surface-enhanced Raman spectroscopy-based sensing application14
Molecular beam epitaxy of Pd-Fe graded alloy films for standing spin waves control14
Extending area selective deposition of ruthenium onto 3D SiO2-Si multilayer stacks14
Effect of bias voltage and nitrogen content on the morphological, structural, mechanical, and corrosion resistance properties of micro-alloyed Ti1−xAl0.8xP0.2XNy films deposited by high power impulse 13
Applications and mechanisms of anisotropic two-step Si3N4 etching with hydrogen plasma conditioning13
Dislocation avalanches in nanostructured molybdenum nanopillars13
Photoemission spectroscopy on photoresist materials: A protocol for analysis of radiation sensitive materials13
Impact of sputtering and redeposition on the morphological profile evolution during ion-beam etching of blazed gratings13
Plasma nitridation for atomic layer etching of Ni13
Core-shell metallic nanotube arrays for highly sensitive surface-enhanced Raman scattering (SERS) detection13
Low-temperature plasma atomic layer etching of molybdenum via sequential oxidation and chlorination13
Nitrogen-incorporated tetrahedral amorphous carbon optically transparent thin film electrode12
Properties of indium tin oxide thin films grown by Ar ion beam sputter deposition12
Evaluation of TiO2 and ZnO atomic layer deposition coated polyamide 66 fabrics for photocatalytic activity and antibacterial applications12
Impact of the DC intensity and electrode distance on pulsed-DC powder-pack boride layer growth kinetics12
Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices12
Peak intensities in Auger electron spectroscopy for quantification: Relationship between differentiated spectral intensities and direct peak areas12
Modeling of microtrenching and bowing effects in nanoscale Si inductively coupled plasma etching process12
Plasma-enhanced atomic layer deposition of WO3-SiO2 films using a heteronuclear precursor12
Study on etch characteristics of magnetic tunnel junction materials using rf-biased H2/NH3 reactive ion beam12
Structure evolution and mechanical properties of co-sputtered Zr-Al-B2 thin films12
Preparation and performance analysis of Ti-25Nb-3Zr-2Sn-3Mo microarc oxidized macro-micro-nano tertiary structure film layers11
Case study in machine learning for predicting moderate pressure plasma behavior11
Elusive supported surface M2Ox dimer active site (M = Re, W, Mo, Cr, V, Nb, and Ta)11
Area-selective atomic layer deposition of palladium11
Oxidative molecular layer deposition of PEDOT using volatile antimony(V) chloride oxidant11
Arsenic-flux dependence of surface morphology in InAs homoepitaxy11
Physical vapor deposition of the halide perovskite CsBi2Br711
X-ray absorption measurements at a bending magnet beamline with an Everhart–Thornley detector: A monolayer of Ho3N@C80 on graphene11
Effects of frequency and pulse width on electron density, hydrogen peroxide generation, and perfluorooctanoic acid mineralization in a nanosecond pulsed discharge gas-liquid plasma reactor11
Optimized thermoelectric performance of flexible Bi0.5Sb1.5Te3 thin film through PbTe incorporation11
Cinnamaldehyde adsorption and thermal decomposition on copper surfaces10
Titanium infiltration into ultrathin PMMA brushes10
Impact of plasma operating conditions on the ion energy and angular distributions in dual-frequency capacitively coupled plasma reactors using CF4 chemistry10
Epitaxial growth of the first two members of the Ban+1InnO2.5n+1 Ruddlesden–Popper homologous series10
Hardness, adhesion, and wear behavior of magnetron cosputtered Ti:Zr-O-N thin films10
Surface study of Pt-3d transition metal alloys, Pt3M (M = Ti, V), under CO oxidation reaction with ambient pressure x-ray photoelectron spectroscopy10
Elaboration and characterization of porous ultrathin gold films grown by ion beam assisted deposition10
Ultrawide bandgap vertical β-(AlxGa1−x)2O3 Schottky barrier diodes on free-standing β-Ga2O3 substrates10
Novel amide-based deep eutectic solvent electrolytes for high-performance lithium-ion batteries10
Effect of annealing on the magnetic anisotropy of GaMnAsP layers with graded P concentration10
Density functional theory calculations of mechanical and electronic properties of W1−xTaxN6, W1−xMoxN6, and Mo1−xTaxN6 (0 ≤ x ≤ 1) alloys in a hexagonal structure9
Ultrahigh density InGaN/GaN nanopyramid quantum dots for visible emissions with high quantum efficiency9
Area-selective molecular layer deposition of nylon 6,2 polyamide: Growth on carbon and inhibition on silica9
Deposition of sputtered NiO as a p-type layer for heterojunction diodes with Ga2O39
Use of in situ electrical conductance measurements to understand the chemical mechanisms and chamber wall effects during vapor phase infiltration doping of poly(aniline) with TiCl4 + H2O9
Adhesion layers between piezoelectric and magnetostrictive layers in a MEMS magneto-sensor stack: Influence on the phase transformation of deposited Co/Fe multilayers to magnetostrictive CoxFe19
Effects of processing parameters on the morphologies of complex sesquioxide thin films9
Corrosion behavior of the NiCrAlY and NiSiAlY alloys with salt mixtures of NaCl/Na2SO49
Over 6 MV/cm operation in β-Ga2O3 Schottky barrier diodes with IrO2 and RuO2 anodes deposited by molecular beam epitaxy9
Catalytic atomic layer deposition of amorphous alumina–silica thin films on carbon microfibers9
Reevaluation of XPS Pt 4f peak fitting: Ti 3s plasmon peak interference and Pt metallic peak asymmetry in Pt@TiO2 system9
Processing and characterization of chalcopyrite semiconductors for photovoltaic applications9
Tailoring structure, morphology, and tribo-mechanical properties of HiPIMS-deposited CrxNy coatings for enhanced performance in wear and corrosion protection9
Plasma-enhanced atomic layer deposition of aluminum-indium oxide thin films and associated device applications9
Comparison of 2D crystals formed by dissociative adsorption of fluorinated and nonfluorinated alkyl iodides on Cu(111)9
Inhibition of the atomic layer deposition of ZnO and SnO2 using a vapor-based polymer thin film8
High crystalline quality homoepitaxial Si-doped β-Ga2O3(010) layers with reduced structural anisotropy grown by hot-wall MOCVD8
Electron conducting Ag2Te nanowire/polymer thermoelectric thin films8
{100}-textured piezoelectric Pb(Zr,Ti)O3 films: Influence of Pb content in the PbxTiO3 seed layer on the electrical properties of chemical solution deposited Pb(Zr,Ti)O38
Area selective deposition of iron films using temperature sensitive masking materials and plasma electrons as reducing agents8
Controlling electron and hole concentration in MoS2 through scalable plasma processes8
Revisitation of reactive direct current magnetron sputtering discharge: Investigation of Mg–CF4, Mg–O2, and Ti–O2 discharges by probe measurements8
Assessing the feasibility of laser ablation coating removal (LACR) on legacy bridge steel: Coating removal and adhesion, and effects on mechanical properties8
Evaluation of nickel self-sputtering yields by molecular-dynamics simulation8
Retarded solid state dewetting of thin bismuth films with oxide capping layer8
Elucidating interactions of the epoxide ring on Pt(111) by comparing reaction pathways of propylene oxide and 1-epoxy-3-butene8
Al2O3 atomic layer deposition on a porous matrix of carbon fibers (FiberForm) for oxidation resistance8
Hierarchical colloid-based lithography for wettability tuning of semiconductor surfaces8
Correlating chemical and electronic states from quantitative photoemission electron microscopy of transition-metal dichalcogenide heterostructures8
Friction and wear behavior of C implanted copper via ion beam-assisted bombardment8
Mechanism for growth initiation on aminosilane-functionalized SiO2 during area-selective atomic layer deposition of ZrO28
Molecule deposition in mask-shielded regions revealed by selective Mg vapor deposition8
Extreme atomic-scale surface roughening: Amino acids on Ag on Au(111)8
Conformal coating of macroscopic nanoparticle compacts with ZnO via atomic layer deposition8
Significant decrease in surface charging of electrically isolated ionic liquid by cluster ion bombardment7
Control by atomic layer deposition over the chemical composition of nickel cobalt oxide for the oxygen evolution reaction7
Characterizing the composition, structure, and mechanical properties of magnetron sputtering physical vapor deposition TiN and TiSiN coatings7
Temperature dependent performance of ITO Schottky contacts on β-Ga2O37
Transformation from dendritic to triangular growth of WS2 via NaCl assisted low-pressure chemical vapor deposition7
High entropy alloy CrFeNiCoCu sputter deposited films: Structure, electrical properties, and oxidation7
Challenges in atomic layer etching of gallium nitride using surface oxidation and ligand-exchange7
Residual stress depth profiles self-developed in cathodic arc deposited Ti-Al-N coatings prepared at different constant substrate bias values7
Adapting FEFF to 5f angular momentum coupling7
Autonomous hybrid optimization of a SiO2 plasma etching mechanism7
Cut-and-pasting ligands: The structure/function relationships of a thermally robust Mo(VI) precursor7
Transport and trap states in proton irradiated ultra-thick κ-Ga2O37
Plasma enhanced atomic layer etching of high-k layers on WS27
Effects of nitrogen flow on the microstructure and mechanical properties of (TiZrNbMoTa)N high-entropy nitride films by magnetron sputtering7
Role of nanoscale surface defects on Sn adsorption and diffusion behavior on oxidized Nb(100)7
Lattice defects distribution of H+ implanted 4H-SiC investigated by deep-ultraviolet Raman spectroscopy7
Quasiatomic layer etching of silicon nitride enhanced by low temperature7
PbS quantum dot thin film dry etching7
Novel principal component analysis tool based on python for analysis of complex spectra of time-of-flight secondary ion mass spectrometry7
Effect of fabrication processes before atomic layer deposition on β-Ga2O3/HfO2/Cr/Au metal–oxide–semiconductor capacitors7
Effect of substrate and substrate temperature on the deposition of MoS2 by radio frequency magnetron sputtering7
Using metal precursors to passivate oxides for area selective deposition7
Control of etch profiles in high aspect ratio holes via precise reactant dosing in thermal atomic layer etching7
Molecular layer deposition of Nylon 2,6 polyamide polymer on flat and particle substrates in an isothermal enclosure containing a rotary reactor7
Hollow cathode plasma electron source for low temperature deposition of cobalt films by electron-enhanced atomic layer deposition7
Design principle of gradient elastic modulus transition layer via substrate mechanical property7
In situ atom-resolved observation of Si (111) 7×7 surface with F radical and Ar ion irradiation simulated atomic layer etching7
Preparation and study of high entropy alloy layer with double glow plasma NiCrMoWTi gradient6
Correlation between electrical conductivity and luminescence properties in β-Ga2O3:Cr3+ and β-Ga2O3:Cr,Mg single crystals6
First-principles calculations on adsorption-diffusion behavior of transition layer Ti atoms on the Fe surface6
Effect of SiO2 buffer layer on phase transition properties of VO2 films fabricated by low-pressure chemical vapor deposition6
Scalable synthesis of supported catalysts using fluidized bed atomic layer deposition6
Tuning microstructural and oxidative characteristics of direct current- and high-power pulsed magnetron sputtered MoSi2-based thin films6
Inner surface modification of polyethylene tubing induced by dielectric barrier discharge plasma6
Self-powered solar blind ultraviolet photodetector based on amorphous (In0.23Ga0.77)2O3/bixbyite (In0.67Ga0.33)2O3 heterojunction6
High enhancement, low cost, large area surface enhanced Raman scattering substrates all by atomic layer deposition on porous filter paper6
Investigation of arc spot splitting behavior on aluminum, titanium, and their alloy cathodes under different gas flows6
Area selective deposition of ruthenium on 3D structures6
Sn-modified BaTiO3 thin film with enhanced polarization6
Practical guide on chemometrics/informatics in x-ray photoelectron spectroscopy (XPS). II. Example applications of multiple methods to the degradation of cellulose and tartaric acid6
Influence of γ'N and ɛ'N phases on the properties of AISI 304L after low-temperature plasma nitrocarburizing6
Comparing sputter rates, depth resolution, and ion yields for different gas cluster ion beams (GCIB): A practical guide to choosing the best GCIB for every application6
Cr2O3–NiO mixed oxides thin films for p-type transparent conductive electrodes6
Nanostructured MoS2 thin films: Effect of substrate temperature on microstructure, optical, and electrical properties6
Design of Ga2O3 modulation doped field effect transistors6
Enhanced nucleation mechanism in ruthenium atomic layer deposition: Exploring surface termination and precursor ligand effects with RuCpEt(CO)26
Deposit and etchback approach for ultrathin Al2O3 films with low pinhole density using atomic layer deposition and atomic layer etching6
Role of oxygen flow rate on the structure and stoichiometry of cobalt oxide films deposited by reactive sputtering6
Early stage nucleation mechanism for SiC(0001) surface epitaxial growth6
Numerical ellipsometry: Artificial intelligence for real-time, in situ absorbing film process control6
Materials’ properties of low temperature deposited Cu/W and Cu/Cr multilayer thin films using high power impulse magnetron sputtering6
Effect of NH3 flow rate to titanium nitride as etch hard mask in thermal atomic layer deposition6
Analysis of pulsed direct current reactive magnetron sputtering on a silicon target6
Molecular beam epitaxy of polar III-nitride resonant tunneling diodes6
In situ x-ray photoelectron spectroscopy analysis of electrochemical interfaces in battery: Recent advances and remaining challenges6
Studies of electrical resistivity and magnetic properties of CuFe and CuNiFe films prepared by magnetron sputtering6
On the limitations of thermal atomic layer deposition of InN using ammonia6
Optical studies of pure and (Cu, Co) doped nickel zinc ferrite films deposited on quartz substrate5
Erratum: “Formation and desorption of nickel hexafluoroacetylacetonate Ni(hfac)2 on a nickel oxide surface in atomic layer etching processes” [J. Vac. Sci. Technol. A 38, 052602 (2020)]5
Type II band alignment of NiO/α-Ga2O3 for annealing temperatures up to 600 °C5
Using auxiliary electrochemical working electrodes as probe during contact glow discharge electrolysis: A proof of concept study5
Ordered deficient perovskite La2/3TiO3 films grown via molecular beam epitaxy5
Selective molecular gas phase etching in layered high aspect-ratio nanostructures for semiconductor processing. I. Modeling framework and simulation5
VO2 films on flexible thin polyimide films: Fabrication and characterization of electrical and optical properties in insulator-metal transition5
MoS2-assisted growth of highly-oriented AlN thin films by low-temperature van der Waals epitaxy5
Growth and characterization of α-Ga2O3 on sapphire and nanocrystalline β-Ga2O3 on diamond substrates by halide vapor phase epitaxy5
Performance and stability of Al-doped HfGaO thin-film transistors deposited by vapor cooling condensation system5
Kinetic Monte Carlo study on the effect of growth conditions on the epitaxial growth of 3C–SiC (0001) vicinal surface5
Germanium surface cleaning and ALD of a protective boron nitride overlayer5
Perspective on improving the quality of surface and material data analysis in the scientific literature with a focus on x-ray photoelectron spectroscopy (XPS)5
Guide to XPS data analysis: Applying appropriate constraints to synthetic peaks in XPS peak fitting5
Angle resolved x-ray photoelectron spectroscopy assessment of the structure and composition of nanofilms—including uncertainties—through the multilayer model5
Solid-source metal-organic MBE for elemental Ir and Ru films5
Transient photocapacitance spectroscopy of deep-levels in (001) β-Ga2O35
Effect of plasma nitriding on microstructure and wear behavior of electrodeposited FeCoNiCr coating5
Low temperature growth of single-phase and preferentially oriented ɛ-Ga2O3 films on sapphire substrates via atomic layer deposition5
Spherical-periodic order and relevant short-range structural units in simple crystal structures5
Internal chemical potential in mixed covalent-ionic photosensitive systems5
Defect species in Ga-doped ZnO films characterized by photoluminescence5
Erratum: “Acquisition and analysis of scanning tunneling spectroscopy data—WSe2 monolayer” [J. Vac. Sci. Technol. A 39, 011001 (2021)]5
Chirality-induced zigzag domain wall in in-plane magnetized ultrathin films5
Photoresponse of O2 plasma treated WS2 monolayers synthesized by chemical vapor deposition5
Optimization of three-dimensional metamaterials for terahertz energy harvesting5
High resolution synchrotron extended x-ray absorption fine structure and infrared spectroscopy analysis of MBE grown CdTe/InSb epifilms5
Manipulation of thin metal film morphology on weakly interacting substrates via selective deployment of alloying species5
Dynamical reverse folding and residual gas expansion models of flexible thin films5
Studies on the growth mechanism of aluminide coating on K444 alloy surface by chemical vapor deposition5
Conversion reactions in atomic layer processing with emphasis on ZnO conversion to Al2O3 by trimethylaluminum5
Electric discharge initiation in water with gas bubbles: A time scale approach5
Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance5
Crystallinity degradation and defect development in (AlxGa1−x)2O3 thin films with increased Al composition5
ERRATUM: “Chemical passivation of the perovskite layer and its real-time effect on the device performance in back-contact perovskite solar cells” [J. Vac. Sci. Technol. A 38, 060401 (2020)]5
Direct current and high power impulse magnetron sputtering discharges with a positively biased anode5
Following the propagation of erroneous x-ray photoelectron spectroscopy peak fitting through the literature. A genealogical approach5
Mechanism of residue formation on Ge-rich germanium antimony tellurium alloys after plasma etching5
Erratum: “MoS2-assisted growth of highly-oriented AlN thin films by low-temperature van der Waals epitaxy” [J. Vac. Sci. Technol. A 42, 050401 (2024)]5
Enhancement in the tribological performance of WSx/a-C multilayer films with Al sublayers in vacuum5
Selective mask deposition using SiCl4 plasma for highly selective etching process5
Preface for the AVS Peter Mark award 40th anniversary collection5
Atomic layer deposition of lithium metaphosphate from H3PO4 and P4O10 facilitated via direct liquid injection: Experiment and theory5
Atomic layer etching of SiO2 with self-limiting behavior on the surface modification step using sequential exposure of HF and NH35
In-cycle evolution of thickness and roughness parameters during oxygen plasma enhanced ZnO atomic layer deposition using in situ spectroscopic ellipsometry5
Aminosilane small molecule inhibitors for area-selective deposition: Study of substrate-inhibitor interfacial interactions5
Development of a process for flame retardant coating of textiles with bio-hybrid anchor peptides5
Deep level defect states in β-, α-, and ɛ-Ga2O3 crystals and films: Impact on device performance5
High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane5
Thermal transport of defective β-Ga2O3 and B(In)GaO3 alloys from atomistic simulations5
Computational modeling of a surfatron mode microwave plasma in NH3/N2 for remote radical generation in a silicon native oxide cleaning process5
Area selective atomic layer deposition of SnO2 as an etch resist in fluorine based processes4
Gate spacers etching of Si3N4 using cyclic approach for 3D CMOS devices4
Diffusion and magnetization of metal adatoms on single-layer molybdenum disulfide at elevated temperatures4
Epitaxial film growth by thermal laser evaporation4
Magnetic properties and magnetocaloric effect of (Fe70Ni30)96Mo4 thin films grown by molecular beam epitaxy4
Correlating surface stoichiometry and termination in SrTiO3 films grown by hybrid molecular beam epitaxy4
Nucleation of highly uniform AlN thin films by high volume batch ALD on 200 mm platform4
Substrate temperature dependence of GaN film deposited on sapphire substrate by high-density convergent plasma sputtering device4
Anisotropic magnetoresistance and planar Hall effect in correlated and topological materials4
Determination of stress in thin films using micro-machined buckled membranes4
Atomic layer deposition of MoNx thin films using a newly synthesized liquid Mo precursor4
Cathode spot dynamics in axial magnetic fields4
Interface-mediated ferroelectricity in PMN-PT/PZT flexible bilayer via pulsed laser deposition4
Measurements and model of UV-induced oxidation of aluminum4
Quantum size effects in Ag thin films grown on the fivefold surface of the icosahedral Al-Cu-Fe quasicrystal: Influence of the growth temperature4
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