Journal of Vacuum Science & Technology A

Article	Citations
Self-powered solar blind ultraviolet photodetector based on amorphous (In0.23Ga0.77)2O3/bixbyite (In0.67Ga0.33)2O3 heterojunction	128
Implementation of an artificial spiking neuron with photoreceptor functionality using gas discharge tubes	86
Enhancing chemical vapor deposition growth and fabrication techniques to maximize hole conduction in tungsten diselenide for monolithic CMOS integration	75
Friction and wear behavior of C implanted copper via ion beam-assisted bombardment	68
In situ metal organic chemical vapor deposition of ultrathin sp2-bonded boron nitride dielectric on gallium nitride	64
Peak intensities in Auger electron spectroscopy for quantification: Relationship between differentiated spectral intensities and direct peak areas	63
Nitrogen-incorporated tetrahedral amorphous carbon optically transparent thin film electrode	58
Novel principal component analysis tool based on python for analysis of complex spectra of time-of-flight secondary ion mass spectrometry	48
Size distribution of clusters and nucleation preference of trimers during SiC (0001) surface epitaxial growth under low coverage	46
Structural, electronic, and thermodynamic properties of Li3X (X = N, P, As) compounds for solid-state lithium-ion batteries	38
Study on the modification of TC11 titanium alloy microarc oxidized film layer by ZrO2 particles	38
Comparing sputter rates, depth resolution, and ion yields for different gas cluster ion beams (GCIB): A practical guide to choosing the best GCIB for every application	36
Understanding the unique optical and vibrational signatures of sequential infiltration synthesis derived indium oxyhydroxide clusters for CO2 absorption	35
Kinetic Monte Carlo study on the effect of growth conditions on the epitaxial growth of 3C–SiC (0001) vicinal surface	32
Cathodoluminescence of β-Ga2O3:Fe (2¯01) irradiated with boron ions	30
Erratum: “MoS2-assisted growth of highly-oriented AlN thin films by low-temperature van der Waals epitaxy” [J. Vac. Sci. Technol. A 42, 050401 (2024)]	30
Using auxiliary electrochemical working electrodes as probe during contact glow discharge electrolysis: A proof of concept study	29
Core-shell metallic nanotube arrays for highly sensitive surface-enhanced Raman scattering (SERS) detection	29
Application of high-spatial-resolution distributed fiber-optic sensing technique for neutral gas temperature mapping in inductively coupled Ar plasmas	29
Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition	27
Hardness, adhesion, and wear behavior of magnetron cosputtered Ti:Zr-O-N thin films	26
High surface quality Y2SiO5 silicate-crystal waveguides etched by chlorine-based inductive coupled plasma reactive ion etching	26
GaN lateral pn junctions by MBE in situ selective area sublimation and regrowth	26
Effects of duty cycle and nitrogen flow rate on the mechanical properties of (V,Mo)N coatings deposited by high-power pulsed magnetron sputtering	25
Testing commonly used background removal procedures for XPS quantitation of homogeneous material: Fe2O3, a transition metal oxide example	24

Transport and trap states in proton irradiated ultra-thick κ-Ga2O3	24
Erratum: “Microscopic origins of radiative performance losses in thin-film solar cells at the example of (Ag,Cu)(In,Ga)Se2 devices” [J. Vac. Sci. Technol. A 42, 022803 (2024)]	23
Structure evolution and properties of Ni films deposited by RF magnetron sputtering with and without H2-assistance	22
Applications and mechanisms of anisotropic two-step Si3N4 etching with hydrogen plasma conditioning	22
Analysis of pulsed direct current reactive magnetron sputtering on a silicon target	22
Tailoring structure, morphology, and tribo-mechanical properties of HiPIMS-deposited CrxNy coatings for enhanced performance in wear and corrosion protection	22
Conformal coating of macroscopic nanoparticle compacts with ZnO via atomic layer deposition	22
Deposition of sputtered NiO as a p-type layer for heterojunction diodes with Ga2O3	22
Effect of Ti buffer layer on stress and time evolution characteristics of boron carbide thin films	22
Aminosilane small molecule inhibitors for area-selective deposition: Study of substrate-inhibitor interfacial interactions	21
High crystalline quality homoepitaxial Si-doped β-Ga2O3(010) layers with reduced structural anisotropy grown by hot-wall MOCVD	21
Effect of the repeated application of First Contact™ polymer on xenon-difluoride passivated lithium fluoride on aluminum surfaces for space telescopes	21
Evaluation of stress and elastic energy relief efficiency in a hard coating with a metal interlayer—Using TiN/Ti as a model system	20
Nonpyrophoric alternative to trimethylaluminum for the atomic layer deposition of Al2O3	20
Bayesian-optimized kinetic Monte Carlo modeling of Na electrodeposition on Cu	20
Microstructure and performance of microarc oxidation coatings doped with yttrium on TA4 commercial pure titanium	19
Hot corrosion behavior of NiCoCrAlY laser cladding coating on 17-4PH stainless steel before and after high-current pulsed electron beam irradiation	19
Significance of plasma-surface interactions in the etch behavior of low-k materials	19
Ga+-focused ion beam damage in n-type Ga2O3	19
Structure and corrosion resistance of electron-beam-strengthened and micro-arc oxidized coatings on magnesium alloy AZ31	19
Ordered deficient perovskite La2/3TiO3 films grown via molecular beam epitaxy	18
Method for extracting the intrinsic diffusion coefficient from grain boundary diffusion depth profile	18
Homogeneous nanosheet single quantum well on extremely thin silicon-on-insulator technology	18
Novel high-efficiency plasma nitriding process utilizing a high power impulse magnetron sputtering discharge	18
Stability investigation of Eu3+ doped CaF2 thin film with ZnO coating under electron beam irradiation	17
Surface temperature of a 2 in. Ti target during DC magnetron sputtering	17
Designing pulsed plasma etch processes by genetic algorithm	17
Impact of arsenic species on InAs/GaSb type II superlattice grown by molecular beam epitaxy	17
Amorphous carbon thin films: Mechanisms of hydrogen incorporation during magnetron sputtering and consequences for the secondary electron emission	17
Reactive magnetron sputtering of copper oxide coatings using the metallic mode assisted by RF-ICP source: Experiment and calculation	17
Modeling scale-up of particle coating by atomic layer deposition	16
Thick, low doped (001) gallium oxide drift layers at 100 mm via halide vapor phase epitaxy	16
N4,5 x-ray absorption spectroscopy of α-plutonium	16
Preparation of stable and highly hydrophobic coatings via one-step spray method and study of their anti-icing performance	16
Enhanced plasma resistance of uniform ALD-Y2O3 thin films for chamber components’ coatings	16
Enhancing minority carrier lifetime in Ge: Insights from HF and HCl cleaning procedures	16
Dependence of persistent photoconductivity on the thickness of β-Ga2O3 thin film photodetectors on c-plane sapphire via magnetron sputtering	16
Numerical ellipsometry: Advanced methods for design, testing, and use of artificial intelligence for absorbing films using Jones and/or Mueller measurements	15
Polydimethylsiloxane surface irradiated by nitrogen ions: Influence of low molecular fractions	15
Structure and properties of piezoelectric aluminum nitride thin films deposited by radio-frequency magnetron sputtering for surface acoustic wave applications	15
My times with Bill Wolfer	15
Nucleation and quantum confinement of nano-platelet Bi2–Bi2Se3	15
Atomic layer deposition of ZrO2 using a novel high-temperature precursor, (nPrCp)Zr(NMe2)3	15
Enhancement of CrN-polyetherimide adhesion by hardening substrate’s surface	15
Adsorption mechanism of dimeric Ga precursors in metalorganic chemical vapor deposition of gallium nitride	15
Comparison of triethylgallium and diethylgallium ethoxide for β-Ga2O3 growth by metalorganic vapor phase epitaxy	14
Direct observation of half-cycle adsorption of aminosilane precursors by in situ XPS	14
Comprehensive ion-molecule reactive collision model for processing plasmas	14
Material and electrical characterization of ultrawide bandgap BN/AlN metal-insulator-semiconductor (MIS) Schottky diodes	14
Preparation and hot corrosion properties of the AlCrFeCoNi0.5Si high-entropy alloy coating deposited by the air plasma spraying	14

Probabilistic zero-dimensional model with calibration and uncertainty quantification for capacitively coupled plasma reactor simulations	14
High-performance vertical β -Ga2O3 Schottky barrier diodes utilizing sputtered p-NiO double mesa junction termination extension	14
Substrate induced composition change during Ge2Sb2Te5 atomic layer deposition and study of initial reactions on SiO2 surface	13
Plasma enhanced atomic layer deposition of HfO2—A potential gate dielectric for GaN-based devices	13
Design and fabrication of color-generating nitride based thin-film optical filters for photovoltaic applications	13
Gliding arc discharge plasma treatment for promoting germination of wheat seed at low ambient temperature	13
Spatial atomic layer deposition: Transport-reaction modeling and experimental validation of film geometry	13
Enhancing laser-driven flyer velocity by optimizing of modulation period of Al/Ti reactive multilayer films	13
Vibrational studies of gas source molecular beam epitaxy grown InAs1−x−yPySbx epilayers by infrared reflectivity and Raman scattering	13
Series resonance effects of a variable inductor termination on the nonpowered electrode in capacitively coupled plasmas	13
Temperature dependence of the growth per cycle during molecular layer deposition of polyurea on plasma deposited SiO2	13
Correlation of interfacial and dielectric characteristics in atomic layer deposited Al2O3/TiO2 nanolaminates grown with different precursor purge times	13
Increasing the spatial uniformity of SiO2 films produced by plasma enhanced chemical vapor deposition using capacitively coupled plasmas with structured electrodes	13
Molybdenum erosion in iodine plasma at hollow cathode conditions	13
Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon	12
Plasma induced damage on AlGaN/GaN heterostructure during gate opening for power devices	12
Profile evolution and mechanisms in pulsed-bias plasma etching of high-aspect-ratio silicon pillars for wafer-scale metasurface manufacturing	12
Denoising strategies for three-dimensional visualization of multilayer thin-film interfaces via angle-resolved hard x-ray photoelectron spectroscopy	12
High-quality GaN thin film deposition at low temperature by ECR plasma-assisted sputter deposition method and its dependence of sapphire substrate misorientation angle	12
Radiation damage effects on electronic and optical properties of β-Ga2O3 from first-principles	12
Metalorganic chemical vapor deposition of (100) β-Ga2O3 on on-axis Ga2O3 substrates	12
Quantifying the resonant photoemission of radiation damaged Pu	12
Cathodoluminescence spectroscopy and Kelvin probe work function correlation of native point defect distributions with piezoelectric voltage in strained ZnO microwires	12
Quantification in high-energy resolution Auger electron spectroscopy; Proposal of a reference target convolution technique for direct spectra	12
Deposition of tungsten oxide films by reactive magnetron sputtering on different substrates	12
Micromechanical properties of micro- and nanocrystalline CVD diamond thin films with gradient microstructures and stresses	12
Impact of Ga deposition and desorption on the properties of high Al-fraction AlGaN grown by plasma-assisted molecular beam epitaxy	12
Probing surface corrosion in δ-Pu with synchrotron radiation	12
In situ diagnostics of the Si etching structures profile in ICP SF6/C4F8 plasma: Macrostructures	12
Photoemission study of plutonium oxycarbide	12
High throughput multiplexing reactor design for rapid screening of atomic/molecular layer deposition processes	11
Bio-tribocorrosion resistance of CoB–Co2B and Co2B layers on CoCrMo alloy	11
Textured growth and electrical characterization of zinc sulfide on back-end-of-the-line compatible substrates	11
Spin-related negative magnetoresistance in germanium films	11
Plasma enhanced atomic layer deposition of manganese nitride thin film from manganese amidinate and ammonia plasma	11
Effect of additive type and amount on structural and mechanical properties of ZrO2/B4C/Al2O3/SiC added Al 1050 based composite structures produced by vacuum infiltration—Comparative study	11
Infinite selectivity in dry etching process for high-aspect-ratio hole using C7HF7 gas plasma	11
Deposition rate and optical emissions in niobium oxide processes by reactive sputtering	11
Study of microstructure and mechanical properties of cBN coatings on nanocrystalline diamond transition layer prepared by magnetron sputtering	11
Controlled nucleation of metal-sulfide layers via surface functionalization with sulfur species: Enhanced initial growth of GaSx thin films	11
First-principles investigation on pressure-induced phase transitions and electronic properties in GeTe	11
Conformal and superconformal chemical vapor deposition of silicon carbide coatings	11
Moisture barrier coating of AlN and Al2O3 multilayer film prepared by low-temperature atomic layer deposition	11
Spatiotemporal evolution of excitation temperature of vacuum arcs by tomography	11
Chemical mechanism for nucleation enhancement in atomic layer deposition of Pt by surface functionalization	11
Morphology transformation of Ge2Sb2Te5 films induced by ultrashort laser pulses	11
Low-temperature ALD of metallic cobalt using the CoCOhept precursor: Simulation-assisted process development for deposition on temperature sensitive 3D-structures	11
Insight into the effect of coexistence of CO2 and H2 on stoichiometric and defective PuO2 surfaces hydriding from first-principles study	11
Empirical analysis of a hollow cathode’s intensity distribution in the vacuum ultraviolet range	11
On the growth kinetics, texture, microstructure, and mechanical properties of tungsten carbonitride deposited by chemical vapor deposition	11
Erratum: “Ion beam assisted chemical vapor deposition of hybrid coatings—Process diagnostics and mechanisms” [J. Vac. Sci. Technol. A 39, 063003 (2021)]	11
Atomic layer deposition of transition metal chalcogenide TaSx using Ta[N(CH3)2]3[NC(CH3)3] precursor and H2S plasma	10
Study investigating the thermal behavior of an atmospheric pressure plasma jet on conductive and nonconductive mesh surfaces	10
Polarized photoluminescence from Sn, Fe, and unintentionally doped β-Ga2O3	10
Plasma-enhanced atomic layer deposition of crystalline GaN thin films on quartz substrates with sharp interfaces	10
Bottom angle control mechanism and optimization of slanted gratings for optical applications	10
AI-guided frame prediction techniques to model single crystal diamond growth	10
Comparison of three titanium-precursors for atomic-layer-deposited TiO2 for passivating contacts on silicon	10
Microstructure and properties of laser cladding NiFeCrCoMo high entropy alloy coating on the surface of TP347 steel	10
Zn:DLC films via PECVD-HIPIMS: Evaluation of antimicrobial activity and cytotoxicity to mammalian cells	10
Continuous wave laser-assisted evaporation of halide perovskite thin films from a single stoichiometric source	10
Role of substrate heating in controlling meltpool behavior and reaction layer formation by the multibeam laser directed energy deposition	10
Noninvasive method for monitoring plasma parameters and dielectric thickness applicable to plasma processing	10
Plasma characteristics of fixed and swept frequency power supplies in pulsed inductively coupled plasma	10
Thermomechanical properties of aluminum oxide thin films made by atomic layer deposition	10
MOS structure with as-deposited ALD Al2O3/4H-SiC heterostructure with high electrical performance: Investigation of the interfacial region	10
In situ growth of ultrathin Y2O3 capping layers for Eu-organic thin films via atomic/molecular layer deposition	10
Effect of data preprocessing and machine learning hyperparameters on mass spectrometry imaging models	10
Scanning electron microscopy imaging of multilayer-doped GaN: Effects of surface band bending, surface roughness, and contamination layers on doping contrast	10
Impact of working pressure on the crystallinity and mechanical properties of vanadium nitride coatings deposited in helium/nitrogen reactive plasma	10
XPS investigation of monoatomic and cluster argon sputtering of zirconium dioxide	10
Revealing the mechanism of interfacial adhesion enhancement between the SiO2 film and the GaAs substrate via plasma pre-treatments	10
Crystalline β-Ga2O3 thin films deposited via reactive magnetron sputtering of a liquid Ga target	10
GeSn alloys with ∼21% Sn grown by effusion cell molecular beam epitaxy	9
Effect of scanning speed on microstructure and wear resistance of AlFeNb0.5NiTi high-entropy alloy coatings by laser cladding	9
Theoretical analysis of thermal spikes during ion bombardment of amorphous silicon nitride surfaces	9
Role of SiCl4 addition in CH3F/O2 based chemistry for Si3N4 etching selectively to SiO2, SiCO, and Si	9
Thermal atomic layer etching of cobalt using sulfuryl chloride for chlorination and tetramethylethylenediamine or trimethylphosphine for ligand addition	9
Growth and optical properties of NiO thin films deposited by pulsed dc reactive magnetron sputtering	9
Neutral transport during etching of high aspect ratio features	9

Link between cracking mechanisms of trilayer films on flexible substrates and electro-mechanical reliability under biaxial loading	9
Low temperature epitaxial growth of Cantor-nitride thin films by magnetic field assisted magnetron sputtering	9
Boosting hole mobility in p-type SnOx (x < 2) film through Ge incorporation via co-sputtering	9
Vapor phase deposition of alumina on interior surfaces of tritium storage containers	9
Growth and properties of Sn-doped sol-gel Ga2O3 thin films	9
The growth of self-intercalated Nb1+xSe2 by molecular beam epitaxy: The effect of processing conditions on the structure and electrical resistivity	9
β-Ga2O3 MOSFETs on highly uniform 2-in. unintentionally doped vertical Bridgman substrates	9
Microkinetic based growth and property modeling of plasma enhanced atomic layer deposition silicon nitride thin film	9
Electroconductive and photoelectric properties of Pt/(100) β-Ga2O3 Schottky barrier diode based on Czochralski grown crystal	9
Homogeneous high In content InxGa1−x N films by supercycle atomic layer deposition	9
Numerical ellipsometry: Artificial intelligence for rapid analysis of indium tin oxide films on silicon	9
Effect of magnetic field on capacitively coupled plasma modulated by electron beam injection	9
Large redshift in photoluminescence of InAs/AlAs short-period superlattices due to highly ordered lateral composition modulation	9
Self-assembled oligomeric structures of an asymmetric molecular linker; 4-isocyanophenyl disulfide on Au(111)	9
Wear and corrosion resistance of zinc-oxide and zirconium-oxide coated WE43 magnesium alloy	9
Regression analysis of temperature-dependent alumina atomic layer deposition growth per cycle using trimethylaluminum and water as precursors	9
Effect of vacuum heat treatment on tribological properties of metal-doped CuS/MoS2 coating	9
Combining molecular beam epitaxy and low-energy electron microscopy with in situ magnetic susceptibility measurements within an integrated ultrahigh vacuum system	9
Characterization of a broad beam Kaufman-type ion source operated with CHF3 and O2	9
Enhancing biocompatibility, mechanical properties, and corrosion resistance of laser cladding β-TiNb coatings	9
Comparison of BCl3, TiCl4, and SOCl2 chlorinating agents for atomic layer etching of TiO2 and ZrO2 using tungsten hexafluoride	9
Insight into the mechanism of lattice damage in ground and polished InAs substrates	8
Area selective atomic layer deposition of ruthenium with phenol as a small molecule inhibitor	8
Cu2O/ZnO heterojunction self-powered photodetector performance regulation	8
Plasma-enhanced atomic layer deposition of crystalline Ga2S3 thin films	8
Insufficient reporting of x-ray photoelectron spectroscopy instrumental and peak fitting parameters (metadata) in the scientific literature	8
Evaluation of carbon incorporation in sulfide thin films grown by hybrid pulsed laser deposition	8
Effect of ozone and humidity addition on hydrogen peroxide generation characteristics of plasmas in oxygen bubbles	8
An examination of the performance of molecular dynamics force fields: Silicon and silicon dioxide reactive ion etching	8
Sn-doping concentration dependence of electrical, optical, and magnetic properties in epitaxial Mn-doped indium tin oxide films deposited by RF magnetron sputtering	8
Influence of magnetic field strength on plasma, microstructure, and mechanical properties of Cr thin films deposited by MPPMS and DOMS	8
Annealing effect on the Si-Ga2O3 thin films by PEALD for various applications with mechanism analysis	8
In situ and ex situ quantification of nanoparticle fluxes in magnetron sputter inert gas condensation: A Cu nanoparticle case study	8
Effect of space charge-limited mechanism on the x-ray detection performance of Ni/Au β-Ga2O3 Schottky diode at high temperature	8
Improved optical efficiency of GaAs-based infrared vertical-cavity surface-emitting laser enabled by combining a metallic reflector and a Bragg reflector	8
Design method for generating multiple colors with thickness-modulated thin-film optical filters for silicon solar cells	8
Foldable electrochromic NiO films	8
Fabrication of antireflective coatings with self-cleaning function using Si–Ti modified hollow silicon mixed sol	8
Conduction band nonparabolicity, chemical potential, and carrier concentration of intrinsic InSb as a function of temperature	8
Benchmarking large language models for materials synthesis: The case of atomic layer deposition	8
Crystallization kinetics during layer exchange of 28Si implanted Al films for fabrication of quantum computers: A theoretical model	8
Synthesis of multilayer diamond-like carbon/SiC lubricating coating for the steel drill-bit based on magnetron sputtering	8
Evaluation of electrical characteristics through band alignment and defect analysis of ultrathin Pt/ZrO2–Al2O3–ZrO2/TiN DRAM metal–insulator–metal capacitors	8
Area-selective atomic/molecular layer deposition via block copolymer approach: Zn-benzene dithiol deposition as a case study	8
Transition metal nanolines grown on a functionalized silver substrate	8
Bacterial and corrosion resistance of polytetrafluoroethylene-silver composite coatings by magnetron sputtering	8
Surface treatment of TaN for sub-2 nm, smooth, and conducting atomic layer deposition Ru films	8
Variability of band alignment between WS2 and SiO2: Intrinsic versus extrinsic contributions	8
Near-surface electronic structure in strained Ni-ferrite films: An x-ray absorption spectroscopy study	8
Explainable integration of process and optical parameters for plasma etch depth prediction	8
Preparation and thermal stability of Mo/AlMoONH/AlMoONL/AlxOy solar selective absorption coatings	8
Investigation of arc spot splitting behavior on aluminum, titanium, and their alloy cathodes under different gas flows	7
Evolution of β-Ga2O3 to γ -Ga2O3 solid-solution epitaxial films after high-temperature annealing	7
Performance of AI agents based on reasoning language models on ALD process optimization tasks	7
XPS guide for insulators: Electron flood gun operation and optimization, surface charging, controlled charging, differential charging, useful FWHMs, problems and solutions, and advice	7
Challenges in porosity characterization of thin films: Cross-evaluation of different techniques	7
Area selective PECVD on metal oxide resist	7
Review of the research status and development of laser cladding high-entropy alloys	7
Columnar growth and surface chemistry of NiFeCrCo high entropy alloy thin films by magnetron sputtering	7
Properties of Schottky barrier diodes on heteroeptixial α-Ga2O3 thin films	7
Rapid preparation of superhydrophobic and corrosion-resistant surfaces based on etching-assisted phosphating modification and analysis of their corrosion resistance mechanisms	7
CF4 plasma-based atomic layer etching of Al2O3 and surface smoothing effect	7
Chemical significance of x-ray photoelectron spectroscopy binding energy shifts: A Perspective	7
Cut-and-pasting ligands: The structure/function relationships of a thermally robust Mo(VI) precursor	7
Adsorption-controlled epitaxy and twin control of γ -GaSe on GaAs (111)B	7
O2/Ar inductively coupled plasma etching of boron-doped single-crystal diamond	7
Effect of deposition temperature on the phase structure, mechanical performance, and corrosion resistance of CrMoN coatings prepared by magnetron sputtering	7
Microstructure and properties of Mg/Ti joint welded by resistance spot welding with an aluminum interlayer	7
Atomic layer etching of SiO2 using sequential exposures of Al(CH3)3 and H2/SF6 plasma	7
Machine learning-based prediction of the electron energy distribution function and electron density of argon plasma from the optical emission spectra	7
Probing trade-off between critical size and velocity in cold-pray: An atomistic simulation	7
Interfacial oxide and other species in trimethylaluminum-pretreated atomic layer deposition-Al2O3/GaN characterized by sputter-assisted ToF-SIMS	7
Materials’ properties of low temperature deposited Cu/W and Cu/Cr multilayer thin films using high power impulse magnetron sputtering	7
Dynamical reverse folding and residual gas expansion models of flexible thin films	7
In situ XPS investigation of β-Ga2O3 surface chemistry for the development of SF6/Ar based plasma atomic layer etching processes	7
Reevaluation of XPS Pt 4f peak fitting: Ti 3s plasmon peak interference and Pt metallic peak asymmetry in Pt@TiO2 system	7
Molecular beam epitaxy growth of wafer-scale SnSe van der Waals ultrathin layers	7
Defining the relative proton irradiation hardness of β-Ga2O3	7
Numerical study of the effects of discharge parameters on capacitively coupled plasma in a magnetic field	7
Arsenic-flux dependence of surface morphology in InAs homoepitaxy	7
VAMAS TWA2 interlaboratory comparison: Surface analysis of TiO2 nanoparticles using ToF-SIMS	7
Temperature-dependent reaction pathways of fluorination and nitridation in native Nb oxide under NF3/H-radical exposure	7
Over 6 MV/cm operation in β-Ga2O3 Schottky barrier diodes with IrO2 and RuO2 anodes deposited by molecular beam epitaxy	7
Atomic layer deposition of nanofilms on porous polymer substrates: Strategies for success	7
Effect of focus ring with external circuit on cathode edge sheath dynamics in a capacitively coupled plasma	7
In situ, simultaneous spectroscopic ellipsometry and quadrupole mass spectrometry studies of ZnO etching using Hacac and O2 plasma	7
Practical guide on chemometrics/informatics in x-ray photoelectron spectroscopy (XPS). II. Example applications of multiple methods to the degradation of cellulose and tartaric acid	7
Environment-dependent tribological behavior of W—S—Si nanocomposite films induced by silicon incorporation	7
Proton irradiation effect on InAs/GaAs quantum dot solar cells	7
Origin of chemical shifts in K 2p x-ray photoelectron spectra	7
Sequence modeling for predicting three-dimensional plasma etching profiles with deep learning	7
On the limitations of thermal atomic layer deposition of InN using ammonia	7
Modifying the zeta potential of silica particles via atomic layer deposition of nanoscale oxide coatings	7
Optimizing indium concentration in ZnO thin films for enhanced optical, electronic, and thermoelectric applications	7
Evolution of Raman and photoluminescence response in molybdenum disulfide thin films deposited via thermal atomic layer deposition	7