Journal of Vacuum Science & Technology A

Article	Citations
Practical guide for curve fitting in x-ray photoelectron spectroscopy	280
Practical guides for x-ray photoelectron spectroscopy (XPS): Interpreting the carbon 1s spectrum	195
Introduction to x-ray photoelectron spectroscopy	164
Practical guides for x-ray photoelectron spectroscopy: Quantitative XPS	132
XPS guide: Charge neutralization and binding energy referencing for insulating samples	113
Assessment of the frequency and nature of erroneous x-ray photoelectron spectroscopy analyses in the scientific literature	104
Misconceptions in interpretation of nitrogen chemistry from x-ray photoelectron spectra	94
Practical guide to the use of backgrounds in quantitative XPS	71
X-ray photoelectron spectroscopy: A perspective on quantitation accuracy for composition analysis of homogeneous materials	71
Introductory guide to backgrounds in XPS spectra and their impact on determining peak intensities	59
Thermal atomic layer etching: A review	59
Many routes to ferroelectric HfO2: A review of current deposition methods	57
The role of plasma in plasma-enhanced atomic layer deposition of crystalline films	48
Next generation nanopatterning using small molecule inhibitors for area-selective atomic layer deposition	45
Ion implantation in β-Ga2O3: Physics and technology	44
High-temperature low-pressure chemical vapor deposition of β-Ga2O3	42
Guide to making XPS measurements on nanoparticles	42
Effect of metal contacts on (100) β-Ga2O3 Schottky barriers	40
Optimization of HiPIMS discharges: The selection of pulse power, pulse length, gas pressure, and magnetic field strength	35
Introduction to topical collection: Reproducibility challenges and solutions with a focus on guides to XPS analysis	35
Sample handling, preparation and mounting for XPS and other surface analytical techniques	33
Plasma deposition—Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition	31
Effect of probe geometry during measurement of >100 A Ga2O3 vertical rectifiers	30
Heteroepitaxial growth of β-Ga2O3 films on SiC via molecular beam epitaxy	30
Deep level defect states in β-, α-, and ɛ-Ga2O3 crystals and films: Impact on device performance	30

Epitaxial metals for interconnects beyond Cu	29
New strategies for conformal, superconformal, and ultrasmooth films by low temperature chemical vapor deposition	28
Tutorial on forming through-silicon vias	28
Self-healing ceramic coatings that operate in extreme environments: A review	27
Uranium and arsenic unregulated water issues on Navajo lands	27
Etch selectivity during plasma-assisted etching of SiO2 and SiNx: Transitioning from reactive ion etching to atomic layer etching	27
Diffusion of dopants and impurities in β-Ga2O3	26
Systematic compositional analysis of sputter-deposited boron-containing thin films	25
Modeling of an atmospheric pressure plasma-liquid anodic interface: Solvated electrons and silver reduction	24
Atomic layer deposition of a uniform thin film on two-dimensional transition metal dichalcogenides	24
Manipulation of thin silver film growth on weakly interacting silicon dioxide substrates using oxygen as a surfactant	24
Epitaxial integration of BaTiO3 on Si for electro-optic applications	24
High responsivity solar-blind metal-semiconductor-metal photodetector based on α-Ga2O3	23
Introductory guide to the application of XPS to epitaxial films and heterostructures	22
Practical guide for x-ray photoelectron spectroscopy: Applications to the study of catalysts	21
Role of consistent terminology in XPS reproducibility	21
Quantum dot lasers—History and future prospects	20
Structure evolution and mechanical properties of hard tantalum diboride films	20
Correlation between electrical conductivity and luminescence properties in β-Ga2O3:Cr3+ and β-Ga2O3:Cr,Mg single crystals	20
Procedure which allows the performance and calibration of an XPS instrument to be checked rapidly and frequently	20
Impact of Cr2O3 additives on the gas-sensitive properties of β-Ga2O3 thin films to oxygen, hydrogen, carbon monoxide, and toluene vapors	19
Performance and reliability of β-Ga2O3 Schottky barrier diodes at high temperature	19
Reduction of unintentional Si doping in β-Ga2O3 grown via plasma-assisted molecular beam epitaxy	18
Guide to XPS data analysis: Applying appropriate constraints to synthetic peaks in XPS peak fitting	18
Green CVD—Toward a sustainable philosophy for thin film deposition by chemical vapor deposition	18
Thermal atomic layer etching of amorphous and crystalline Al2O3 films	18
β-(AlxGa1−x)2O3/Ga2O3 heterostructure Schottky diodes for improved VBR2/RON	17
Application of FEFF analyses to actinide 5f systems	17
Magnetron sputtering	17
O·, H·, and ·OH radical etching probability of polystyrene obtained for a radio frequency driven atmospheric pressure plasma jet	17
Low temperature ALD growth optimization of ZnO, TiO2, and Al2O3 to be used as a buffer layer in perovskite solar cells	16
Selective atomic layer etching of HfO2 over silicon by precursor and substrate-dependent selective deposition	16
Uncertainties in photoemission peak fitting accounting for the covariance with background parameters	16
Perspectives from research on metal-semiconductor contacts: Examples from Ga2O3, SiC, (nano)diamond, and SnS	16
Two-step growth of β-Ga2O3 films on (100) diamond via low pressure chemical vapor deposition	16
Surface damage formation during atomic layer etching of silicon with chlorine adsorption	16
Accuracy limitations for composition analysis by XPS using relative peak intensities: LiF as an example	15
Factors influencing surface carbon contamination in ambient-pressure x-ray photoelectron spectroscopy experiments	15
Area-selective molecular layer deposition of nylon 6,2 polyamide: Growth on carbon and inhibition on silica	15
Atomic layer deposition of AlN using atomic layer annealing—Towards high-quality AlN on vertical sidewalls	15
Versailles Project on Advanced Materials and Standards interlaboratory study on intensity calibration for x-ray photoelectron spectroscopy instruments using low-density polyethylene	15
Mechanism of SiN etching rate fluctuation in atomic layer etching	15
Conversion reactions in atomic layer processing with emphasis on ZnO conversion to Al2O3 by trimethylaluminum	15
Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition	15
Sideways deposition rate and ionized flux fraction in dc and high power impulse magnetron sputtering	15
In situ x-ray photoelectron spectroscopy analysis of electrochemical interfaces in battery: Recent advances and remaining challenges	15
Epitaxial superconductor-semiconductor two-dimensional systems for superconducting quantum circuits	14
Microstructure and optical properties of sputter-deposited Ga2O3 films	14
Atomic layer etching of GaN using Cl2 and He or Ar plasma	14
Thermal atomic layer etching of germanium-rich SiGe using an oxidation and “conversion-etch” mechanism	14

Band offsets at metalorganic chemical vapor deposited β-(AlxGa1−x)2O3/β-Ga2O3 interfaces—Crystalline orientation dependence	14
N-type doping of low-pressure chemical vapor deposition grown β-Ga2O3 thin films using solid-source germanium	14
Physical and chemical vapor deposition methods applied to all-inorganic metal halide perovskites	14
tert-butoxides as precursors for atomic layer deposition of alkali metal containing thin films	14
Insight into the removal and reapplication of small inhibitor molecules during area-selective atomic layer deposition of SiO2	14
Comparative study of two atomic layer etching processes for GaN	14
Interface structure and luminescence properties of epitaxial PbSe films on InAs(111)A	14
Heterovalent semiconductor structures and devices grown by molecular beam epitaxy	13
Hard x-ray photoelectron spectroscopy of tunable oxide interfaces	13
Design of Ga2O3 modulation doped field effect transistors	13
In situ surface analysis of an ion-energy-dependent chlorination layer on GaN during cyclic etching using Ar+ ions and Cl radicals	13
Role of high aspect-ratio thin-film metal deposition in Cu back-end-of-line technology	13
Inside the mysterious world of plasma: A process engineer’s perspective	13
Thickness-dependent optical properties of aluminum nitride films for mid-infrared wavelengths	13
Experimental determination of electron attenuation lengths in complex materials by means of epitaxial film growth: Advantages and challenges	13
Nanolaminated Al2O3/HfO2 dielectrics for silicon carbide based devices	13
On the formation of black silicon in SF6-O2 plasma: The clear, oxidize, remove, and etch (CORE) sequence and black silicon on demand	12
Role of physisorption in atomic layer etching of silicon nitride	12
Formation and desorption of nickel hexafluoroacetylacetonate Ni(hfac)2 on a nickel oxide surface in atomic layer etching processes	12
Kinetic modeling of ammonia decomposition at chemical vapor deposition conditions	12
Evaluation of TiO2 and ZnO atomic layer deposition coated polyamide 66 fabrics for photocatalytic activity and antibacterial applications	12
Universal scaling relationship for atomic layer etching	12
High power impulse magnetron sputtering of diamond-like carbon coatings	12
Chemical vapor deposition of metallic films using plasma electrons as reducing agents	12
Searching for superconductivity in high entropy oxide Ruddlesden–Popper cuprate films	12
Vapor deposition of quaternary ammonium methacrylate polymers with high antimicrobial activity: Synthetic route, toxicity assessment, and durability analysis	12
Effects of structured electrodes on electron power absorption and plasma uniformity in capacitive RF discharges	12
Temperature dependence of on–off ratio and reverse recovery time in NiO/β-Ga2O3 heterojunction rectifiers	12
Modified atomic layer deposition of MoS2 thin films	12
Effect of terminal methyl group concentration on critical properties and plasma resistance of organosilicate low-k dielectrics	12
Substrate orientation dependent current transport mechanisms in β-Ga2O3/Si based Schottky barrier diodes	11
Structure, stress, and mechanical properties of Mo-Al-N thin films deposited by dc reactive magnetron cosputtering: Role of point defects	11
Temperature dependent performance of ITO Schottky contacts on β-Ga2O3	11
In operando x-ray photoelectron spectroscopy study of mechanism of atomic layer etching of cobalt	11
Hf1−xZrxO2 and HfO2/ZrO2 gate dielectrics with extremely low density of interfacial defects using low temperature atomic layer deposition on GaN and InP	11
3D-printed and injection molded polymer matrix composites with 2D layered materials	11
Review on recent progress in patterning phase change materials	11
Perspective on improving the quality of surface and material data analysis in the scientific literature with a focus on x-ray photoelectron spectroscopy (XPS)	11
Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices	11
Structural and optical properties of (Zn,Mn)O thin films prepared by atomic layer deposition	11
In situ, in vivo, and in operando imaging and spectroscopy of liquids using microfluidics in vacuum	11
Raman scattering, emission, and deep defect evolution in ZnO:In thin films	11
Strengths of plasmon satellites in XPS: Real-time cumulant approach	11
Oxidative molecular layer deposition of PEDOT using volatile antimony(V) chloride oxidant	11
Influence of precursor dose and residence time on the growth rate and uniformity of vanadium dioxide thin films by atomic layer deposition	11
Topology of conductive clusters in sputtered high-quality VO2 thin films on the brink of percolation threshold during insulator-to-metal and metal-to-insulator transitions	11
The chemistry and energetics of the interface between metal halide perovskite and atomic layer deposited metal oxides	10
Plasma enhanced atomic layer deposition of textured aluminum nitride on platinized substrates for MEMS	10
Erratum: “Practical guides for x-ray photoelectron spectroscopy: First steps in planning, conducting, and reporting XPS measurements” [J. Vac. Sci. Technol. A 37, 031401 (2019)]	10
Molecular beam epitaxy of KTaO3	10
Atomic layer deposition and characterization of Zn-doped Ga2O3 films	10
Novel in situ sensing surface forces apparatus for measuring gold versus gold, hydrophobic, and biophysical interactions	10
Atomic layer etching of Si3N4 with high selectivity to SiO2 and poly-Si	10
New approach for an industrial low-temperature roll-to-roll CI(G)Se hybrid sputter coevaporation deposition process	10
Patterning nickel for extreme ultraviolet lithography mask application I. Atomic layer etch processing	10
Delta-doped β-(AlxGa1−x)2O3/Ga2O3 heterostructure field-effect transistors by ozone molecular beam epitaxy	10
Raman scattering study of nanoscale Mo/Si and Mo/Be periodic multilayer structures	10
Introduction to lateral resolution and analysis area measurements in XPS	10
Van der Waals epitaxy and remote epitaxy of LiNbO3 thin films by pulsed laser deposition	10
Reactor scale simulations of ALD and ALE: Ideal and non-ideal self-limited processes in a cylindrical and a 300 mm wafer cross-flow reactor	10
Epitaxial oxide thin films for oxygen electrocatalysis: A tutorial review	10
Nonlinear effects in low-energy ion sputtering of solids	10
Critical review of Ohmic and Schottky contacts to β-Ga2O3	10
Homoepitaxial GaN micropillar array by plasma-free photo-enhanced metal-assisted chemical etching	10
Erosion of focus rings in capacitively coupled plasma etching reactors	9
Atomic layer etching of SiO2 with self-limiting behavior on the surface modification step using sequential exposure of HF and NH3	9
High-capacity rotary drum for atomic layer deposition onto powders and small mechanical parts in a hot-walled viscous flow reactor	9
7.5 kV, 6.2 GW cm−2 NiO/β-Ga2O3 vertical rectifiers with on–off ratio greater than 1013	9
Low-pressure thermogravimetric analysis for finding sublimation temperatures for organic precursors in atomic/molecular layer deposition	9
Anisotropic magnetoresistance and planar Hall effect in correlated and topological materials	9
Surface properties and interactions of transition metal oxide nanoparticles: A perspective on sustainability	9
Large-scale synthesis of atomically thin ultrawide bandgap β-Ga2O3 using a liquid gallium squeezing technique	9
Operating modes and target erosion in high power impulse magnetron sputtering	9
Electrical properties of p-type Zn:Ga2O3 thin films	9
Synthesis and integration of thin film solid state electrolytes for 3D Li-ion microbatteries	9
Continuous polymer films deposited on top of porous substrates using plasma-enhanced atomic layer deposition and molecular layer deposition	9
Effects of thickness and interlayer on optical properties of AlN films at room and high temperature	9
Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition	9
Epitaxial growth of high-k BaxSr1−xTiO3 thin films on SrTiO3 (001) substrates by atomic layer deposition	9
Surface reaction of the hafnium precursor with a linked amido-cyclopentadienyl ligand: A density functional theory study	9

Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors	9
Al Kα XPS reference spectra of polyethylene for all instrument geometries	9
Photoluminescence, thermoluminescence, and cathodoluminescence of optimized cubic Gd2O3:Bi phosphor powder	8
Effect of capping layers on the near-surface region of SrVO3 films	8
Nitrogen ion-implanted resistive regions for edge termination of vertical Ga2O3 rectifiers	8
Atomic layer deposition and selective etching of ruthenium for area-selective deposition: Temperature dependence and supercycle design	8
Achieving reproducible data: Examples from surface analysis in semiconductor technology	8
Correlating surface stoichiometry and termination in SrTiO3 films grown by hybrid molecular beam epitaxy	8
On the response of gamma irradiation on atomic layer deposition-grown β-Ga2O3 films and Au-β-Ga2O3-Au deep ultraviolet solar-blind photodetectors	8
Practical guide on chemometrics/informatics in x-ray photoelectron spectroscopy (XPS). II. Example applications of multiple methods to the degradation of cellulose and tartaric acid	8
Vapor deposition of CsPbBr3 thin films by evaporation of CsBr and PbBr2	8
Enhancing nanostructured nickel-rich lithium-ion battery cathodes via surface stabilization	8
Engineering ordered arrangements of oxygen vacancies at the surface of superconducting La2CuO4 thin films	8
New development of nanoscale spectroscopy using scanning probe microscope	8
Atomic layer deposition of ruthenium using an ABC-type process: Role of oxygen exposure during nucleation	8
Area-selective chemical vapor deposition of cobalt from dicobalt octacarbonyl: Enhancement of dielectric-dielectric selectivity by adding a coflow of NH3	8
Fabrication of crystal plane oriented trenches in gallium nitride using SF6 + Ar dry etching and wet etching post-treatment	8
Vapor phase infiltration of aluminum oxide into benzocyclobutene-based polymer dielectrics to increase adhesion strength to thin film metal interconnects	8
Mechanism for growth initiation on aminosilane-functionalized SiO2 during area-selective atomic layer deposition of ZrO2	8
Atomic layer etching of metals with anisotropy, specificity, and selectivity	8
Pervasive artifacts revealed from magnetometry measurements of rare earth-transition metal thin films	8
Ultrahigh aspect ratio etching of silicon in SF6-O2 plasma: The clear-oxidize-remove-etch (CORE) sequence and chromium mask	8
Atomic layer etching of Al2O3 with NF3 plasma fluorination and trimethylaluminum ligand exchange	8
Effect of O2 plasma exposure time during atomic layer deposition of amorphous gallium oxide	8
Review of electrical contacts to phase change materials and an unexpected trend between metal work function and contact resistance to germanium telluride	8
Review of recent studies on nanoscale electrical junctions and contacts: Quantum tunneling, current crowding, and interface engineering	8
Effect of substrate bias on microstructure of epitaxial film grown by HiPIMS: An atomistic simulation	8
Techniques for epitaxial site-selective growth of quantum dots	7
Mitigating residual stress of high temperature CVD diamond films on vanadium carbide coated steel	7
Various evolution trends of sample thickness in fluorocarbon film deposition on SiO2	7
Polymethylmethacrylate wettability change spatially correlates with self-organized streamer microdischarge patterns in dielectric barrier discharge plasmas	7
Hollow cathode plasma electron source for low temperature deposition of cobalt films by electron-enhanced atomic layer deposition	7
Utilizing plasma modified SnO2 paper gas sensors to better understand gas-surface interactions at low temperatures	7
Oxygen incorporation in AlN films grown by plasma-enhanced atomic layer deposition	7
Precursor selection in hybrid molecular beam epitaxy of alkaline-earth stannates	7
Epitaxial growth of highly textured ZnO thin films on Si using an AlN buffer layer by atomic layer deposition	7
Packing of inhibitor molecules during area-selective atomic layer deposition studied using random sequential adsorption simulations	7
Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2	7
Area-selective atomic layer deposition of molybdenum oxide	7
Interface characteristics of β-Ga2O3/Al2O3/Pt capacitors after postmetallization annealing	7
Effect of pretreatment with ultrasonic vibration for plasma-processed multiwalled carbon nanotubes	7
Atomic layer deposition of HfO2 films using carbon-free tetrakis(tetrahydroborato)hafnium and water	7
Direct current and high power impulse magnetron sputtering discharges with a positively biased anode	7
Molecular dynamics simulation of Si trench etching with SiO2 hard masks	7
First principles study on the lattice thermal conductivity of α-phase Ga2O3	7
Etching with electron beam-generated plasmas: Selectivity versus ion energy in silicon-based films	7
Low-temperature plasma atomic layer etching of molybdenum via sequential oxidation and chlorination	7
Magnetic properties and resistive switching in mixture films and nanolaminates consisting of iron and silicon oxides grown by atomic layer deposition	7
Silicon nitride spacer etching selectively to silicon using CH3F/O2/He/SiCl4 plasma	7
Dry etching in the presence of physisorption of neutrals at lower temperatures	7
Spatially controlled stem cell differentiation via morphogen gradients: A comparison of static and dynamic microfluidic platforms	7
Thermodynamics and kinetics of H adsorption and intercalation for graphene on 6H-SiC(0001) from first-principles calculations	7
Highly selective and vertical etch of silicon dioxide using ruthenium films as an etch mask	7
Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition	7
Properties of secondary particles for the reactive ion beam sputtering of Ti and TiO2 using oxygen ions	7
MOCVD growth and band offsets of κ-phase Ga2O3 on c-plane sapphire, GaN- and AlN-on-sapphire, and (100) YSZ substrates	7
Practical guide on chemometrics/informatics in x-ray photoelectron spectroscopy (XPS). I. Introduction to methods useful for large or complex datasets	7
Microstructural and chemical analysis of polycrystalline LiNbO3 films obtained by room-temperature RF sputtering after various annealing durations	7
Lab-based operando x-ray photoelectron spectroscopy for probing low-volatile liquids and their interfaces across a variety of electrosystems	7
Rhombohedral boron nitride epitaxy on ZrB2	7
Deposition of sputtered NiO as a p-type layer for heterojunction diodes with Ga2O3	7
Underlying simplicity of 5f unoccupied electronic structure	7
Properties of indium tin oxide thin films grown by Ar ion beam sputter deposition	7
Atomic layer deposition of germanium-selenium-tellurium compounds for low-leakage, tunable ovonic threshold switches	7
Plasma enhanced atomic layer deposition of thin film Li1+xMn2−xO4 for realization of all solid-state 3D lithium-ion microbatteries	7
X-ray photoelectron spectroscopy analysis of TiBx (1.3 ≤ x ≤ 3.0) thin films	7
Probing copper-boron interactions in the Cu2B8− bimetallic cluster	7
Pulsed laser annealing of amorphous two-dimensional transition metal dichalcogenides	7
Atomic-layer etching of GaN by using an HBr neutral beam	7
Selective atomic layer deposition on flexible polymeric substrates employing a polyimide adhesive as a physical mask	6
Effect of N2/H2 plasma on the growth of InN thin films on sapphire by hollow-cathode plasma-assisted atomic layer deposition	6
Variation in plutonium dioxide sputter yields for 1–5 keV Ar+ ions	6
Growth and characterization of II-VI semiconductor multilayer quantum-well structures for two-color quantum well infrared photodetector applications	6
Ammonia assisted low temperature growth of In2O3 (111) epitaxial films on c-sapphire substrates by chemical vapor deposition technique	6
High thickness uniformity of 2-in. wafer-scale β-Ga2O3 films grown by MOCVD and photoelectrical properties	6
On the possible nature of deep centers in Ga2O3	6
Atomic layer deposition of sodium fluoride thin films	6
Thin film deposition research and its impact on microelectronics scaling	6
Review of key vertical-cavity laser and modulator advances enabled by advanced MBE technology	6
Focus ring geometry influence on wafer edge voltage distribution for plasma processes	6
Controlling conduction band alignment and carrier concentration in gallium-doped magnesium zinc oxide by reactive cosputtering	6
Adsorption and reaction kinetics of SO2 on graphene: An ultrahigh vacuum surface science study	6
Work function performance of a C12A7 electride surface exposed to low pressure low temperature hydrogen plasmas	6
Influence of the carrier wafer during GaN etching in Cl2 plasma	6
Design and implementation of floating field ring edge termination on vertical geometry β-Ga2O3 rectifiers	6
XPS analysis and electrical conduction mechanisms of atomic layer deposition grown Ta2O5 thin films onto p-Si substrates	6
Thermal induced depletion of cationic vacancies in NiO thin films evidenced by x-ray absorption spectroscopy at the O 1s threshold	6
Correlation between SiO2 growth rate and difference in electronegativity of metal–oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor	6
Role of organic molecules in enabling modern technology	6
Energy-dense Li metal anodes enabled by thin film electrolytes	6
Self-assembled vertically aligned nanocomposite systems integrated on silicon substrate: Progress and future perspectives	6
Effect of drift layer doping and NiO parameters in achieving 8.9 kV breakdown in 100 μm diameter and 4 kV/4 A in 1 mm diameter NiO/β-Ga2O3 rectifiers	6
Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions	6
In vacuo atomic layer deposition and electron tunneling characterization of ultrathin dielectric films for metal/insulator/metal tunnel junctions	6
Manipulation of thin metal film morphology on weakly interacting substrates via selective deployment of alloying species	6