Journal of Vacuum Science & Technology A

Article	Citations
Band structure and strain distribution of InAs quantum dots encapsulated in (Al)GaAs asymmetric matrixes	77
Study of the surface and interface properties of ultrathin nickel film on cerium layer by in situ magnetic sputtering	73
Effects of the focus ring on the ion kinetics at the wafer edge in capacitively coupled plasma reactors	64
VAMAS TWA2 interlaboratory comparison: Surface analysis of TiO2 nanoparticles using ToF-SIMS	52
Long and flexible atmospheric pressure plasma jet probes for operation in humid environments	48
Determination of recombination coefficients for hydrogen, oxygen, and nitrogen gasses via in situ radical probe system	47
Large-scale synthesis of atomically thin ultrawide bandgap β-Ga2O3 using a liquid gallium squeezing technique	45
Reconstruction changes drive surface diffusion and determine the flatness of oxide surfaces	32
NiO/β-(AlxGa1−x)2O3/Ga2O3 heterojunction lateral rectifiers with reverse breakdown voltage >7 kV	30
Photoelectron spectroscopic studies on metal halide perovskite materials	30
Localized phase transition of TiO2 thin films induced by sub-bandgap laser irradiation	29
Immersion ellipsometry for the uncorrelated determination of ultrathin film thickness and index of refraction: Theory and examples	29
Molecular dynamics simulation of amine formation in plasma-enhanced chemical vapor deposition with hydrocarbon and amino radicals	29
Localized surface plasmon resonance of Ag nanoparticle thin films deposited by direct-current magnetron sputtering	25
Atomic layer deposition of sodium fluoride thin films	24
Promoting subsurface Sn incorporation at Nb(100) oxide surface sites leading to homogeneous Nb3Sn film growth for superconducting radiofrequency applications	22
Influence of hydrogen-bonded 3-mercaptopropionic acid bilayers on binary self-assembled monolayer formation	22
Growth of topological insulator Bi2Se3 particles on GaAs via droplet epitaxy	22
Atomic layer etching of SiO2 using sequential exposures of Al(CH3)3 and H2/SF6 plasma	21
Numerical study of the effects of discharge parameters on capacitively coupled plasma in a magnetic field	21
Thermal atomic layer etching of amorphous and crystalline Al2O3 films	20
Epitaxial growth of Bi, Sb, and Sn	20
CF4 plasma-based atomic layer etching of Al2O3 and surface smoothing effect	20
Growth of pentacene molecules on Tsai-type quasicrystals and related crystal surfaces	20
Modulation of the LaFeO3 film growth by the terrace width of SrTiO3 substrates	20

Heterovalent semiconductor structures and devices grown by molecular beam epitaxy	20
Step barrier effects during early stages of the kinetic roughening of fcc(111) surfaces	20
Understanding the unique optical and vibrational signatures of sequential infiltration synthesis derived indium oxyhydroxide clusters for CO2 absorption	20
Effects of duty cycle and nitrogen flow rate on the mechanical properties of (V,Mo)N coatings deposited by high-power pulsed magnetron sputtering	19
CrN/AlN nanolaminates: Architecture, residual stresses, and cracking behavior	19
Homoepitaxial GaN micropillar array by plasma-free photo-enhanced metal-assisted chemical etching	19
Optical constants of single-crystalline Ni(100) from 77 to 770 K from ellipsometry measurements	19
Hyperfine interaction studies in the David Shirley group, 1960–1975. I. Low-temperature nuclear orientation	18
On the interplay between a novel iron and iron-carbide atomic layer deposition process, the carbon nanotube growth, and the metal–carbon nanotube coating properties on silica substrates	18
David Shirley: Pioneer, teacher, mentor, and visionary scientific leader	18
Study of synthesis strategies to improve the electrical properties of magnetron sputtered copper oxide thin films	17
Zirconia-titania-doped tantala optical coatings for low mechanical loss Bragg mirrors	17
Effects of metal redeposition in plasma sputtering	16
Temporal evolution of the ion flux to the target in rotational RF multimagnetron plasma	16
Size distribution of clusters and nucleation preference of trimers during SiC (0001) surface epitaxial growth under low coverage	16
Highly efficient plasma generation in inductively coupled plasmas using a parallel capacitor	16
Dependence of film structure on the film structure-independent equivalent film thickness in magnetron sputtering deposition of Ag thin films	15
Remote inductively coupled plasmas in Ar/N2 mixtures and implications for plasma enhanced ALD	15
Hole selective nickel oxide as transparent conductive oxide	15
Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition	15
True hero of the trade: On the critical contributions of Art Gossard to modern device techonology	14
Corrosion resistance and conductivity of CrN, CrAlN, and CrTiN coatings applied to bipolar plates for proton exchange membrane fuel cells	14
Chemical conversion of MoS2 thin films deposited by atomic layer deposition (ALD) into molybdenum nitride monitored by in situ reflectance measurements	14
Epitaxial growth of highly textured ZnO thin films on Si using an AlN buffer layer by atomic layer deposition	14
Oxygen incorporation in AlN films grown by plasma-enhanced atomic layer deposition	14
Dislocation avalanches in nanostructured molybdenum nanopillars	13
Molecular beam epitaxy of Pd-Fe graded alloy films for standing spin waves control	13
Extending area selective deposition of ruthenium onto 3D SiO2-Si multilayer stacks	13
Core-shell metallic nanotube arrays for highly sensitive surface-enhanced Raman scattering (SERS) detection	13
Best practices for performing quantitative TOF-SIMS analyses	13
High resolution depth profiling using near-total-reflection hard x-ray photoelectron spectroscopy	13
Effect of nonvertical ion bombardment due to edge effects on polymer surface morphology evolution and etching uniformity	13
Nanostructured bi-metallic Pd–Ag alloy films for surface-enhanced Raman spectroscopy-based sensing application	13
Study on etch characteristics of magnetic tunnel junction materials using rf-biased H2/NH3 reactive ion beam	12
Low-temperature plasma atomic layer etching of molybdenum via sequential oxidation and chlorination	12
Photoemission spectroscopy on photoresist materials: A protocol for analysis of radiation sensitive materials	12
Plasma-enhanced atomic layer deposition of WO3-SiO2 films using a heteronuclear precursor	12
Plasma nitridation for atomic layer etching of Ni	12
Applications and mechanisms of anisotropic two-step Si3N4 etching with hydrogen plasma conditioning	12
Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices	12
Nitrogen-incorporated tetrahedral amorphous carbon optically transparent thin film electrode	12
Effect of bias voltage and nitrogen content on the morphological, structural, mechanical, and corrosion resistance properties of micro-alloyed Ti1−xAl0.8xP0.2XNy films deposited by high power impulse	12
Impact of sputtering and redeposition on the morphological profile evolution during ion-beam etching of blazed gratings	12
Properties of indium tin oxide thin films grown by Ar ion beam sputter deposition	11
Impact of the DC intensity and electrode distance on pulsed-DC powder-pack boride layer growth kinetics	11
Optimized thermoelectric performance of flexible Bi0.5Sb1.5Te3 thin film through PbTe incorporation	11
Elusive supported surface M2Ox dimer active site (M = Re, W, Mo, Cr, V, Nb, and Ta)	11
Modeling of microtrenching and bowing effects in nanoscale Si inductively coupled plasma etching process	11
Peak intensities in Auger electron spectroscopy for quantification: Relationship between differentiated spectral intensities and direct peak areas	11
Effects of frequency and pulse width on electron density, hydrogen peroxide generation, and perfluorooctanoic acid mineralization in a nanosecond pulsed discharge gas-liquid plasma reactor	11

Structure evolution and mechanical properties of co-sputtered Zr-Al-B2 thin films	11
Arsenic-flux dependence of surface morphology in InAs homoepitaxy	11
Evaluation of TiO2 and ZnO atomic layer deposition coated polyamide 66 fabrics for photocatalytic activity and antibacterial applications	11
Surface study of Pt-3d transition metal alloys, Pt3M (M = Ti, V), under CO oxidation reaction with ambient pressure x-ray photoelectron spectroscopy	10
Ultrawide bandgap vertical β-(AlxGa1−x)2O3 Schottky barrier diodes on free-standing β-Ga2O3 substrates	10
X-ray absorption measurements at a bending magnet beamline with an Everhart–Thornley detector: A monolayer of Ho3N@C80 on graphene	10
Titanium infiltration into ultrathin PMMA brushes	10
Preparation and performance analysis of Ti-25Nb-3Zr-2Sn-3Mo microarc oxidized macro-micro-nano tertiary structure film layers	10
Case study in machine learning for predicting moderate pressure plasma behavior	10
Hardness, adhesion, and wear behavior of magnetron cosputtered Ti:Zr-O-N thin films	10
Effect of annealing on the magnetic anisotropy of GaMnAsP layers with graded P concentration	10
Area-selective atomic layer deposition of palladium	10
Oxidative molecular layer deposition of PEDOT using volatile antimony(V) chloride oxidant	10
Tailoring structure, morphology, and tribo-mechanical properties of HiPIMS-deposited CrxNy coatings for enhanced performance in wear and corrosion protection	9
Use of in situ electrical conductance measurements to understand the chemical mechanisms and chamber wall effects during vapor phase infiltration doping of poly(aniline) with TiCl4 + H2O	9
Ultrahigh density InGaN/GaN nanopyramid quantum dots for visible emissions with high quantum efficiency	9
Processing and characterization of chalcopyrite semiconductors for photovoltaic applications	9
Novel amide-based deep eutectic solvent electrolytes for high-performance lithium-ion batteries	9
Effects of processing parameters on the morphologies of complex sesquioxide thin films	9
Reevaluation of XPS Pt 4f peak fitting: Ti 3s plasmon peak interference and Pt metallic peak asymmetry in Pt@TiO2 system	9
Density functional theory calculations of mechanical and electronic properties of W1−xTaxN6, W1−xMoxN6, and Mo1−xTaxN6 (0 ≤ x ≤ 1) alloys in a hexagonal structure	9
Cinnamaldehyde adsorption and thermal decomposition on copper surfaces	9
Epitaxial growth of the first two members of the Ban+1InnO2.5n+1 Ruddlesden–Popper homologous series	9
Corrosion behavior of the NiCrAlY and NiSiAlY alloys with salt mixtures of NaCl/Na2SO4	9
Area-selective molecular layer deposition of nylon 6,2 polyamide: Growth on carbon and inhibition on silica	9
Adhesion layers between piezoelectric and magnetostrictive layers in a MEMS magneto-sensor stack: Influence on the phase transformation of deposited Co/Fe multilayers to magnetostrictive CoxFe1	9
Impact of plasma operating conditions on the ion energy and angular distributions in dual-frequency capacitively coupled plasma reactors using CF4 chemistry	9
Elaboration and characterization of porous ultrathin gold films grown by ion beam assisted deposition	9
Molecule deposition in mask-shielded regions revealed by selective Mg vapor deposition	8
Deposition of sputtered NiO as a p-type layer for heterojunction diodes with Ga2O3	8
{100}-textured piezoelectric Pb(Zr,Ti)O3 films: Influence of Pb content in the PbxTiO3 seed layer on the electrical properties of chemical solution deposited Pb(Zr,Ti)O3	8
Conformal coating of macroscopic nanoparticle compacts with ZnO via atomic layer deposition	8
Mechanism for growth initiation on aminosilane-functionalized SiO2 during area-selective atomic layer deposition of ZrO2	8
Hierarchical colloid-based lithography for wettability tuning of semiconductor surfaces	8
Over 6 MV/cm operation in β-Ga2O3 Schottky barrier diodes with IrO2 and RuO2 anodes deposited by molecular beam epitaxy	8
Catalytic atomic layer deposition of amorphous alumina–silica thin films on carbon microfibers	8
Retarded solid state dewetting of thin bismuth films with oxide capping layer	8
Extreme atomic-scale surface roughening: Amino acids on Ag on Au(111)	8
Al2O3 atomic layer deposition on a porous matrix of carbon fibers (FiberForm) for oxidation resistance	8
Inhibition of the atomic layer deposition of ZnO and SnO2 using a vapor-based polymer thin film	8
Plasma-enhanced atomic layer deposition of aluminum-indium oxide thin films and associated device applications	8
Comparison of 2D crystals formed by dissociative adsorption of fluorinated and nonfluorinated alkyl iodides on Cu(111)	8
Area selective deposition of iron films using temperature sensitive masking materials and plasma electrons as reducing agents	8
Controlling electron and hole concentration in MoS2 through scalable plasma processes	8
Revisitation of reactive direct current magnetron sputtering discharge: Investigation of Mg–CF4, Mg–O2, and Ti–O2 discharges by probe measurements	8
Elucidating interactions of the epoxide ring on Pt(111) by comparing reaction pathways of propylene oxide and 1-epoxy-3-butene	8
Lattice defects distribution of H+ implanted 4H-SiC investigated by deep-ultraviolet Raman spectroscopy	7
Control by atomic layer deposition over the chemical composition of nickel cobalt oxide for the oxygen evolution reaction	7
Adapting FEFF to 5f angular momentum coupling	7
Significant decrease in surface charging of electrically isolated ionic liquid by cluster ion bombardment	7
Evaluation of nickel self-sputtering yields by molecular-dynamics simulation	7
In situ atom-resolved observation of Si (111) 7×7 surface with F radical and Ar ion irradiation simulated atomic layer etching	7
PbS quantum dot thin film dry etching	7
Residual stress depth profiles self-developed in cathodic arc deposited Ti-Al-N coatings prepared at different constant substrate bias values	7
Hollow cathode plasma electron source for low temperature deposition of cobalt films by electron-enhanced atomic layer deposition	7
Using metal precursors to passivate oxides for area selective deposition	7
Quasiatomic layer etching of silicon nitride enhanced by low temperature	7
Cut-and-pasting ligands: The structure/function relationships of a thermally robust Mo(VI) precursor	7
Characterizing the composition, structure, and mechanical properties of magnetron sputtering physical vapor deposition TiN and TiSiN coatings	7
High crystalline quality homoepitaxial Si-doped β-Ga2O3(010) layers with reduced structural anisotropy grown by hot-wall MOCVD	7
Assessing the feasibility of laser ablation coating removal (LACR) on legacy bridge steel: Coating removal and adhesion, and effects on mechanical properties	7
Autonomous hybrid optimization of a SiO2 plasma etching mechanism	7
High entropy alloy CrFeNiCoCu sputter deposited films: Structure, electrical properties, and oxidation	7
Challenges in atomic layer etching of gallium nitride using surface oxidation and ligand-exchange	7
Effect of substrate and substrate temperature on the deposition of MoS2 by radio frequency magnetron sputtering	7
Transport and trap states in proton irradiated ultra-thick κ-Ga2O3	7
Novel principal component analysis tool based on python for analysis of complex spectra of time-of-flight secondary ion mass spectrometry	7
Friction and wear behavior of C implanted copper via ion beam-assisted bombardment	7
Correlating chemical and electronic states from quantitative photoemission electron microscopy of transition-metal dichalcogenide heterostructures	7
Effect of fabrication processes before atomic layer deposition on β-Ga2O3/HfO2/Cr/Au metal–oxide–semiconductor capacitors	7
Design principle of gradient elastic modulus transition layer via substrate mechanical property	7
Role of nanoscale surface defects on Sn adsorption and diffusion behavior on oxidized Nb(100)	7
Early stage nucleation mechanism for SiC(0001) surface epitaxial growth	6
Investigation of arc spot splitting behavior on aluminum, titanium, and their alloy cathodes under different gas flows	6
Inner surface modification of polyethylene tubing induced by dielectric barrier discharge plasma	6
Materials’ properties of low temperature deposited Cu/W and Cu/Cr multilayer thin films using high power impulse magnetron sputtering	6
Practical guide on chemometrics/informatics in x-ray photoelectron spectroscopy (XPS). II. Example applications of multiple methods to the degradation of cellulose and tartaric acid	6
Area selective deposition of ruthenium on 3D structures	6
Sn-modified BaTiO3 thin film with enhanced polarization	6
Control of etch profiles in high aspect ratio holes via precise reactant dosing in thermal atomic layer etching	6

Plasma enhanced atomic layer etching of high-k layers on WS2	6
Correlation between electrical conductivity and luminescence properties in β-Ga2O3:Cr3+ and β-Ga2O3:Cr,Mg single crystals	6
Studies of electrical resistivity and magnetic properties of CuFe and CuNiFe films prepared by magnetron sputtering	6
Nanostructured MoS2 thin films: Effect of substrate temperature on microstructure, optical, and electrical properties	6
Design of Ga2O3 modulation doped field effect transistors	6
Tuning microstructural and oxidative characteristics of direct current- and high-power pulsed magnetron sputtered MoSi2-based thin films	6
Enhanced nucleation mechanism in ruthenium atomic layer deposition: Exploring surface termination and precursor ligand effects with RuCpEt(CO)2	6
Numerical ellipsometry: Artificial intelligence for real-time, in situ absorbing film process control	6
Self-powered solar blind ultraviolet photodetector based on amorphous (In0.23Ga0.77)2O3/bixbyite (In0.67Ga0.33)2O3 heterojunction	6
Temperature dependent performance of ITO Schottky contacts on β-Ga2O3	6
Effects of nitrogen flow on the microstructure and mechanical properties of (TiZrNbMoTa)N high-entropy nitride films by magnetron sputtering	6
Deposit and etchback approach for ultrathin Al2O3 films with low pinhole density using atomic layer deposition and atomic layer etching	6
High enhancement, low cost, large area surface enhanced Raman scattering substrates all by atomic layer deposition on porous filter paper	6
Molecular beam epitaxy of polar III-nitride resonant tunneling diodes	6
Analysis of pulsed direct current reactive magnetron sputtering on a silicon target	6
First-principles calculations on adsorption-diffusion behavior of transition layer Ti atoms on the Fe surface	6
In situ x-ray photoelectron spectroscopy analysis of electrochemical interfaces in battery: Recent advances and remaining challenges	6
Preparation and study of high entropy alloy layer with double glow plasma NiCrMoWTi gradient	6
Role of oxygen flow rate on the structure and stoichiometry of cobalt oxide films deposited by reactive sputtering	6
Molecular layer deposition of Nylon 2,6 polyamide polymer on flat and particle substrates in an isothermal enclosure containing a rotary reactor	6
On the limitations of thermal atomic layer deposition of InN using ammonia	6
Transformation from dendritic to triangular growth of WS2 via NaCl assisted low-pressure chemical vapor deposition	6
Influence of γ'N and ɛ'N phases on the properties of AISI 304L after low-temperature plasma nitrocarburizing	5
Scalable synthesis of supported catalysts using fluidized bed atomic layer deposition	5
Following the propagation of erroneous x-ray photoelectron spectroscopy peak fitting through the literature. A genealogical approach	5
Using auxiliary electrochemical working electrodes as probe during contact glow discharge electrolysis: A proof of concept study	5
Chirality-induced zigzag domain wall in in-plane magnetized ultrathin films	5
Development of a process for flame retardant coating of textiles with bio-hybrid anchor peptides	5
Studies on the growth mechanism of aluminide coating on K444 alloy surface by chemical vapor deposition	5
Optimization of three-dimensional metamaterials for terahertz energy harvesting	5
Manipulation of thin metal film morphology on weakly interacting substrates via selective deployment of alloying species	5
Computational modeling of a surfatron mode microwave plasma in NH3/N2 for remote radical generation in a silicon native oxide cleaning process	5
Erratum: “Formation and desorption of nickel hexafluoroacetylacetonate Ni(hfac)2 on a nickel oxide surface in atomic layer etching processes” [J. Vac. Sci. Technol. A 38, 052602 (2020)]	5
Erratum: “Microscopic origins of radiative performance losses in thin-film solar cells at the example of (Ag,Cu)(In,Ga)Se2 devices” [J. Vac. Sci. Technol. A 42, 022803 (2024)]	5
Thermal transport of defective β-Ga2O3 and B(In)GaO3 alloys from atomistic simulations	5
Conversion reactions in atomic layer processing with emphasis on ZnO conversion to Al2O3 by trimethylaluminum	5
Effect of a-C:H:SiOx coating thickness on corrosion resistance and zeta potential level of Ti-6Al-4V	5
Selective molecular gas phase etching in layered high aspect-ratio nanostructures for semiconductor processing. I. Modeling framework and simulation	5
Solid-source metal-organic MBE for elemental Ir and Ru films	5
Effect of SiO2 buffer layer on phase transition properties of VO2 films fabricated by low-pressure chemical vapor deposition	5
Low temperature growth of single-phase and preferentially oriented ɛ-Ga2O3 films on sapphire substrates via atomic layer deposition	5
Cr2O3–NiO mixed oxides thin films for p-type transparent conductive electrodes	5
Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance	5
Germanium surface cleaning and ALD of a protective boron nitride overlayer	5
Performance and stability of Al-doped HfGaO thin-film transistors deposited by vapor cooling condensation system	5
Perspective on improving the quality of surface and material data analysis in the scientific literature with a focus on x-ray photoelectron spectroscopy (XPS)	5
High resolution synchrotron extended x-ray absorption fine structure and infrared spectroscopy analysis of MBE grown CdTe/InSb epifilms	5
Kinetic Monte Carlo study on the effect of growth conditions on the epitaxial growth of 3C–SiC (0001) vicinal surface	5
Growth and characterization of α-Ga2O3 on sapphire and nanocrystalline β-Ga2O3 on diamond substrates by halide vapor phase epitaxy	5
ERRATUM: “Chemical passivation of the perovskite layer and its real-time effect on the device performance in back-contact perovskite solar cells” [J. Vac. Sci. Technol. A 38, 060401 (2020)]	5
Atomic layer deposition of crystalline molybdenum trioxide and suboxide thin films using molybdenum(II) acetate dimer precursor	5
Atomic layer etching of SiO2 with self-limiting behavior on the surface modification step using sequential exposure of HF and NH3	5
High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane	5
Photoresponse of O2 plasma treated WS2 monolayers synthesized by chemical vapor deposition	5
Angle resolved x-ray photoelectron spectroscopy assessment of the structure and composition of nanofilms—including uncertainties—through the multilayer model	5
Effect of plasma nitriding on microstructure and wear behavior of electrodeposited FeCoNiCr coating	5
Effect of NH3 flow rate to titanium nitride as etch hard mask in thermal atomic layer deposition	5
Guide to XPS data analysis: Applying appropriate constraints to synthetic peaks in XPS peak fitting	5
MoS2-assisted growth of highly-oriented AlN thin films by low-temperature van der Waals epitaxy	5
Preface for the AVS Peter Mark award 40th anniversary collection	5
In-cycle evolution of thickness and roughness parameters during oxygen plasma enhanced ZnO atomic layer deposition using in situ spectroscopic ellipsometry	5
Atomic layer deposition of lithium metaphosphate from H3PO4 and P4O10 facilitated via direct liquid injection: Experiment and theory	5
Aminosilane small molecule inhibitors for area-selective deposition: Study of substrate-inhibitor interfacial interactions	5
Dynamical reverse folding and residual gas expansion models of flexible thin films	5
Erratum: “Acquisition and analysis of scanning tunneling spectroscopy data—WSe2 monolayer” [J. Vac. Sci. Technol. A 39, 011001 (2021)]	5
Erratum: “MoS2-assisted growth of highly-oriented AlN thin films by low-temperature van der Waals epitaxy” [J. Vac. Sci. Technol. A 42, 050401 (2024)]	5
Deep level defect states in β-, α-, and ɛ-Ga2O3 crystals and films: Impact on device performance	5
Comparing sputter rates, depth resolution, and ion yields for different gas cluster ion beams (GCIB): A practical guide to choosing the best GCIB for every application	5
Selective mask deposition using SiCl4 plasma for highly selective etching process	5
Internal chemical potential in mixed covalent-ionic photosensitive systems	5
Electric discharge initiation in water with gas bubbles: A time scale approach	5
Active learning with moment tensor potentials to predict material properties: Ti0.5Al0.5N at elevated temperature	4
Low temperature, area-selective atomic layer deposition of NiO and Ni	4
Effect of electrochemical cycling on microstructures of nanocomposite silicon electrodes using hyperpolarized 129Xe and 7Li NMR spectroscopy	4
Anisotropic magnetoresistance and planar Hall effect in correlated and topological materials	4
Nucleation of highly uniform AlN thin films by high volume batch ALD on 200 mm platform	4
Influence of substrate temperature on graphene oxide thin films synthesis by laser ablation technique	4
Interface-mediated ferroelectricity in PMN-PT/PZT flexible bilayer via pulsed laser deposition	4
Substrate temperature dependence of GaN film deposited on sapphire substrate by high-density convergent plasma sputtering device	4
Oxygen reduction reaction properties of vacuum-deposited Pt on thermally grown epitaxial graphene layers	4
Review of actinide core-level photoemission	4
Impact of chemical bonding difference of ALD Mo on SiO2 and Al2O3 on the effective work function of the two gate stacks	4
All-dry free radical polymerization inside nanopores: Ion-milling-enabled coating thickness profiling revealed “necking” phenomena	4
Diffusion and magnetization of metal adatoms on single-layer molybdenum disulfide at elevated temperatures	4
Atomic layer etching of gallium nitride using fluorine-based chemistry	4
Impact of precursor concentration on the properties of perovskite solar cells obtained from the dehydrated lead acetate precursors	4
Enhancing minority carrier lifetime in Ge: Insights from HF and HCl cleaning procedures	4
Mechanical and tribological properties of diamondlike carbon-coated polycarbonate	4
Impact of ion species on ion beam sputtered Ta2O5 layer quality parameters and on corresponding process productivity: A preinvestigation for large-area coatings	4
Properties of Schottky barrier diodes on heteroeptixial α-Ga2O3 thin films	4
Plasma electron characterization in electron chemical vapor deposition	4
Cathode spot dynamics in axial magnetic fields	4
Structural evolution and thermoelectric properties of Mg3SbxBi2−x thin films deposited by magnetron sputtering	4
Surprising stability of polar (001) surfaces of the Mott insulator GdTiO3	4
Gate spacers etching of Si3N4 using cyclic approach for 3D CMOS devices	4