Journal of Vacuum Science & Technology A

Article	Citations
Practical guides for x-ray photoelectron spectroscopy (XPS): Interpreting the carbon 1s spectrum	266
Assessment of the frequency and nature of erroneous x-ray photoelectron spectroscopy analyses in the scientific literature	121
Practical guide to the use of backgrounds in quantitative XPS	92
Thermal atomic layer etching: A review	73
Many routes to ferroelectric HfO2: A review of current deposition methods	73
Next generation nanopatterning using small molecule inhibitors for area-selective atomic layer deposition	63
Ion implantation in β-Ga2O3: Physics and technology	52
Introduction to topical collection: Reproducibility challenges and solutions with a focus on guides to XPS analysis	47
Effect of metal contacts on (100) β-Ga2O3 Schottky barriers	45
Deep level defect states in β-, α-, and ɛ-Ga2O3 crystals and films: Impact on device performance	44
Effect of probe geometry during measurement of >100 A Ga2O3 vertical rectifiers	34
Epitaxial integration of BaTiO3 on Si for electro-optic applications	32
High responsivity solar-blind metal-semiconductor-metal photodetector based on α-Ga2O3	30
Diffusion of dopants and impurities in β-Ga2O3	30
Systematic compositional analysis of sputter-deposited boron-containing thin films	29
Quantum dot lasers—History and future prospects	27
Guide to XPS data analysis: Applying appropriate constraints to synthetic peaks in XPS peak fitting	27
Magnetron sputtering	25
Correlation between electrical conductivity and luminescence properties in β-Ga2O3:Cr3+ and β-Ga2O3:Cr,Mg single crystals	24
Searching for superconductivity in high entropy oxide Ruddlesden–Popper cuprate films	22
Conversion reactions in atomic layer processing with emphasis on ZnO conversion to Al2O3 by trimethylaluminum	22
Critical review of Ohmic and Schottky contacts to β-Ga2O3	22
Impact of Cr2O3 additives on the gas-sensitive properties of β-Ga2O3 thin films to oxygen, hydrogen, carbon monoxide, and toluene vapors	21
Microstructure and optical properties of sputter-deposited Ga2O3 films	21
Accuracy limitations for composition analysis by XPS using relative peak intensities: LiF as an example	21

Perspective on improving the quality of surface and material data analysis in the scientific literature with a focus on x-ray photoelectron spectroscopy (XPS)	21
Surface damage formation during atomic layer etching of silicon with chlorine adsorption	21
Atomic layer etching of GaN using Cl2 and He or Ar plasma	20
β-(AlxGa1−x)2O3/Ga2O3 heterostructure Schottky diodes for improved VBR2/RON	20
Thickness-dependent optical properties of aluminum nitride films for mid-infrared wavelengths	20
Performance and reliability of β-Ga2O3 Schottky barrier diodes at high temperature	20
Hard x-ray photoelectron spectroscopy of tunable oxide interfaces	20
Mechanism of SiN etching rate fluctuation in atomic layer etching	20
Thermal atomic layer etching of germanium-rich SiGe using an oxidation and “conversion-etch” mechanism	20
Green CVD—Toward a sustainable philosophy for thin film deposition by chemical vapor deposition	20
Thermal atomic layer etching of amorphous and crystalline Al2O3 films	20
Factors influencing surface carbon contamination in ambient-pressure x-ray photoelectron spectroscopy experiments	19
Epitaxial superconductor-semiconductor two-dimensional systems for superconducting quantum circuits	19
Two-step growth of β-Ga2O3 films on (100) diamond via low pressure chemical vapor deposition	19
In situ x-ray photoelectron spectroscopy analysis of electrochemical interfaces in battery: Recent advances and remaining challenges	19
Area-selective molecular layer deposition of nylon 6,2 polyamide: Growth on carbon and inhibition on silica	18
Atomic layer deposition of AlN using atomic layer annealing—Towards high-quality AlN on vertical sidewalls	18
Effects of structured electrodes on electron power absorption and plasma uniformity in capacitive RF discharges	18
Versailles Project on Advanced Materials and Standards interlaboratory study on intensity calibration for x-ray photoelectron spectroscopy instruments using low-density polyethylene	17
Insight into the removal and reapplication of small inhibitor molecules during area-selective atomic layer deposition of SiO2	17
Interface structure and luminescence properties of epitaxial PbSe films on InAs(111)A	17
N-type doping of low-pressure chemical vapor deposition grown β-Ga2O3 thin films using solid-source germanium	17
Effect of drift layer doping and NiO parameters in achieving 8.9 kV breakdown in 100 μm diameter and 4 kV/4 A in 1 mm diameter NiO/β-Ga2O3 rectifiers	17
Universal scaling relationship for atomic layer etching	16
Design of Ga2O3 modulation doped field effect transistors	16
Chemical significance of x-ray photoelectron spectroscopy binding energy shifts: A Perspective	16
Modified atomic layer deposition of MoS2 thin films	16
Homoepitaxial GaN micropillar array by plasma-free photo-enhanced metal-assisted chemical etching	16
Ultrahigh purity conditions for nitride growth with low oxygen content by plasma-enhanced atomic layer deposition	16
Band offsets at metalorganic chemical vapor deposited β-(AlxGa1−x)2O3/β-Ga2O3 interfaces—Crystalline orientation dependence	16
Selective generation of reactive oxygen species in plasma-activated water using CO2 plasma	15
Wafer-level uniformity of atomic-layer-deposited niobium nitride thin films for quantum devices	15
Substrate orientation dependent current transport mechanisms in β-Ga2O3/Si based Schottky barrier diodes	15
Evaluation of TiO2 and ZnO atomic layer deposition coated polyamide 66 fabrics for photocatalytic activity and antibacterial applications	15
7.5 kV, 6.2 GW cm−2 NiO/β-Ga2O3 vertical rectifiers with on–off ratio greater than 1013	14
Delta-doped β-(AlxGa1−x)2O3/Ga2O3 heterostructure field-effect transistors by ozone molecular beam epitaxy	14
Novel in situ sensing surface forces apparatus for measuring gold versus gold, hydrophobic, and biophysical interactions	14
Reactor scale simulations of ALD and ALE: Ideal and non-ideal self-limited processes in a cylindrical and a 300 mm wafer cross-flow reactor	13
Heteroepitaxial growth of Ga2O3 on 4H-SiC by liquid-injection MOCVD for improved thermal management of Ga2O3 power devices	13
Atomic layer etching of Si3N4 with high selectivity to SiO2 and poly-Si	13
Plasma-enhanced atomic layer deposited indium oxide film using a novel dimethylbutylamino-trimethylindium precursor for thin film transistors	13
Temperature dependent performance of ITO Schottky contacts on β-Ga2O3	13
Sticking coefficients of selenium and tellurium	13
Electrical properties of p-type Zn:Ga2O3 thin films	13
Heterovalent semiconductor structures and devices grown by molecular beam epitaxy	13
Atomic layer etching of SiO2 with self-limiting behavior on the surface modification step using sequential exposure of HF and NH3	12
Packing of inhibitor molecules during area-selective atomic layer deposition studied using random sequential adsorption simulations	12
Dry etching in the presence of physisorption of neutrals at lower temperatures	12
Atomic layer deposition and characterization of Zn-doped Ga2O3 films	12
Van der Waals epitaxy and remote epitaxy of LiNbO3 thin films by pulsed laser deposition	12

ToF-SIMS in battery research: Advantages, limitations, and best practices	12
Review of major technologies improving surface performances of Ti alloys for implant biomaterials	12
Deposition of sputtered NiO as a p-type layer for heterojunction diodes with Ga2O3	12
Hf1−xZrxO2 and HfO2/ZrO2 gate dielectrics with extremely low density of interfacial defects using low temperature atomic layer deposition on GaN and InP	12
Temperature dependence of on–off ratio and reverse recovery time in NiO/β-Ga2O3 heterojunction rectifiers	12
Molecular beam epitaxy of KTaO3	12
Al Kα XPS reference spectra of polyethylene for all instrument geometries	11
First principles study on the lattice thermal conductivity of α-phase Ga2O3	11
Oxidative molecular layer deposition of PEDOT using volatile antimony(V) chloride oxidant	11
Etching with electron beam-generated plasmas: Selectivity versus ion energy in silicon-based films	11
Highly selective and vertical etch of silicon dioxide using ruthenium films as an etch mask	11
Engineering ordered arrangements of oxygen vacancies at the surface of superconducting La2CuO4 thin films	11
Strengths of plasmon satellites in XPS: Real-time cumulant approach	11
Molecular dynamics simulation of Si trench etching with SiO2 hard masks	11
Molecular dynamics simulation of oxide-nitride bilayer etching with energetic fluorocarbon ions	11
Probing copper-boron interactions in the Cu2B8− bimetallic cluster	11
Anisotropic magnetoresistance and planar Hall effect in correlated and topological materials	11
Hydrogen permeation barriers and preparation techniques: A review	11
Epitaxial oxide thin films for oxygen electrocatalysis: A tutorial review	11
Operating modes and target erosion in high power impulse magnetron sputtering	10
Germanium dioxide: A new rutile substrate for epitaxial film growth	10
Area-selective atomic layer deposition enabled by competitive adsorption	10
Atomic layer deposition and selective etching of ruthenium for area-selective deposition: Temperature dependence and supercycle design	10
Mechanism for growth initiation on aminosilane-functionalized SiO2 during area-selective atomic layer deposition of ZrO2	10
Plasma enhanced atomic layer deposition of textured aluminum nitride on platinized substrates for MEMS	10
Erratum: “Practical guides for x-ray photoelectron spectroscopy: First steps in planning, conducting, and reporting XPS measurements” [J. Vac. Sci. Technol. A 37, 031401 (2019)]	10
On the response of gamma irradiation on atomic layer deposition-grown β-Ga2O3 films and Au-β-Ga2O3-Au deep ultraviolet solar-blind photodetectors	10
Erosion of focus rings in capacitively coupled plasma etching reactors	10
Effect of O2 plasma exposure time during atomic layer deposition of amorphous gallium oxide	10
Rhombohedral boron nitride epitaxy on ZrB2	10
Atmospheric pressure plasma functionalization of polystyrene	10
Effect of capping layers on the near-surface region of SrVO3 films	10
Influence of the carrier wafer during GaN etching in Cl2 plasma	10
Nitrogen ion-implanted resistive regions for edge termination of vertical Ga2O3 rectifiers	9
MOCVD growth and band offsets of κ-phase Ga2O3 on c-plane sapphire, GaN- and AlN-on-sapphire, and (100) YSZ substrates	9
Effects of thickness and interlayer on optical properties of AlN films at room and high temperature	9
Oxygen incorporation in AlN films grown by plasma-enhanced atomic layer deposition	9
Controlled thin-film deposition of α or β Ga2O3 by ion-beam sputtering	9
Vapor deposition of CsPbBr3 thin films by evaporation of CsBr and PbBr2	9
Modification of β-gallium oxide electronic properties by irradiation with high-energy electrons	9
On the possible nature of deep centers in Ga2O3	9
Correlating surface stoichiometry and termination in SrTiO3 films grown by hybrid molecular beam epitaxy	9
Large-scale synthesis of atomically thin ultrawide bandgap β-Ga2O3 using a liquid gallium squeezing technique	9
Photoluminescence spectroscopy of Cr3+ in β-Ga2O3 and (Al0.1Ga0.9)2O3	9
Surface reaction of the hafnium precursor with a linked amido-cyclopentadienyl ligand: A density functional theory study	9
Degradation of methylene blue by pulsed nanosecond discharge in Ar, O2, and N2 gaseous bubbles in water: Evaluation of direct and postprocessing modes	9
Techniques for epitaxial site-selective growth of quantum dots	9
Work function performance of a C12A7 electride surface exposed to low pressure low temperature hydrogen plasmas	9
Practical guide on chemometrics/informatics in x-ray photoelectron spectroscopy (XPS). II. Example applications of multiple methods to the degradation of cellulose and tartaric acid	9
Review of recent studies on nanoscale electrical junctions and contacts: Quantum tunneling, current crowding, and interface engineering	9
Angular distribution of titanium ions and neutrals in high-power impulse magnetron sputtering discharges	9
Mitigating residual stress of high temperature CVD diamond films on vanadium carbide coated steel	8
Plasma-enhanced atomic layer deposition of SiO2 film using capacitively coupled Ar/O2 plasmas: A computational investigation	8
X-ray photoelectron spectroscopy analysis of TiBx (1.3 ≤ x ≤ 3.0) thin films	8
Theoretical study of the adsorption of Lewis acids on MoS2 in relation to atomic layer deposition of Al2O3	8
Interface characteristics of β-Ga2O3/Al2O3/Pt capacitors after postmetallization annealing	8
Various evolution trends of sample thickness in fluorocarbon film deposition on SiO2	8
Epitaxial growth of highly textured ZnO thin films on Si using an AlN buffer layer by atomic layer deposition	8
Insufficient reporting of x-ray photoelectron spectroscopy instrumental and peak fitting parameters (metadata) in the scientific literature	8
Sympetalous defects in metalorganic vapor phase epitaxy (MOVPE)-grown homoepitaxial β-Ga2O3 films	8
Thermodynamics and kinetics of H adsorption and intercalation for graphene on 6H-SiC(0001) from first-principles calculations	8
Atomic layer etching of Al2O3 with NF3 plasma fluorination and trimethylaluminum ligand exchange	8
Voltage waveform tailoring for high aspect ratio plasma etching of SiO2 using Ar/CF4/O2 mixtures: Consequences of ion and electron distributions on etch profiles	8
Ultrawide bandgap vertical β-(AlxGa1−x)2O3 Schottky barrier diodes on free-standing β-Ga2O3 substrates	8
Erratum: “Practical guide for curve fitting in x-ray photoelectron spectroscopy” [J. Vac. Sci. Technol. A 38, 061203 (2020)]	8
Machine learning approach to thickness prediction fromin situspectroscopic ellipsometry data for atomic layer deposition processes	8
Enhancing nanostructured nickel-rich lithium-ion battery cathodes via surface stabilization	8
Model analysis of the feature profile evolution during Si etching in HBr-containing plasmas	8
Room-temperature and high-quality HfO2/SiO2 gate stacked film grown by neutral beam enhanced atomic layer deposition	8
Practical guide on chemometrics/informatics in x-ray photoelectron spectroscopy (XPS). I. Introduction to methods useful for large or complex datasets	8
Low-temperature plasma atomic layer etching of molybdenum via sequential oxidation and chlorination	8
Deposit and etchback approach for ultrathin Al2O3 films with low pinhole density using atomic layer deposition and atomic layer etching	7
Properties of indium tin oxide thin films grown by Ar ion beam sputter deposition	7
Vacuum ultraviolet enhanced atomic layer etching of ruthenium films	7
Modification of a force field for molecular dynamics simulations of silicon etching by chlorine atoms	7
Surface ligand removal in atomic layer deposition of GaN using triethylgallium	7
Oxygen-induced surface reconstructions on curved Ag(111)	7
Epitaxial growth of 3C-SiC film by microwave plasma chemical vapor deposition in H2-CH4-SiH4 mixtures: Optical emission spectroscopy study	7
Functional plasma-sprayed hydroxylapatite coatings for medical application: Clinical performance requirements and key property enhancement	7
Metalorganic chemical vapor deposition of (100) β-Ga2O3 on on-axis Ga2O3 substrates	7

High thickness uniformity of 2-in. wafer-scale β-Ga2O3 films grown by MOCVD and photoelectrical properties	7
Wettability and corrosion resistance of zirconium nitride films obtained via reactive high-power impulse magnetron sputtering	7
Nanosecond pulsed plasma discharge for remediation of simulated wastewater containing thiazine and azo dyes as model pollutants	7
Hollow cathode plasma electron source for low temperature deposition of cobalt films by electron-enhanced atomic layer deposition	7
Investigation of mechanical and microstructural properties of sputter-deposited Zr-Ni3Al coatings	7
Manipulation of thin metal film morphology on weakly interacting substrates via selective deployment of alloying species	7
Evaluation of the accuracy of stopping and range of ions in matter simulations through secondary ion mass spectrometry and Rutherford backscattering spectrometry for low energy heavy ion implantation	7
Polymethylmethacrylate wettability change spatially correlates with self-organized streamer microdischarge patterns in dielectric barrier discharge plasmas	7
Underlying simplicity of 5f unoccupied electronic structure	7
Atomic layer deposition onto fabrics of carbon and silicon carbide fibers: Preparation of multilayers comprising alumina, titania-furfuryl alcohol hybrid, and titanium phosphate	7
Innovative remote plasma source for atomic layer deposition for GaN devices	7
Plasma enhanced atomic layer deposition of thin film Li1+xMn2−xO4 for realization of all solid-state 3D lithium-ion microbatteries	7
Target ion and neutral spread in high power impulse magnetron sputtering	7
Approaching ultrathin VO2 films on sapphire (001) substrates by biased reactive sputtering: Characteristic morphology and its effect on the infrared-light switching	7
Design and implementation of floating field ring edge termination on vertical geometry β-Ga2O3 rectifiers	7
Direct current and high power impulse magnetron sputtering discharges with a positively biased anode	7
Structure evolution and mechanical properties of co-sputtered Zr-Al-B2 thin films	7
Relationship between local coordinates and thermal conductivity in amorphous carbon	7
Phase transition behavior in nanostructured VO2 with M1, M2, and R phases observed via temperature-dependent XRD measurements	7
Deep UV AlGaN LED reliability for long duration space missions	7
Precursor selection in hybrid molecular beam epitaxy of alkaline-earth stannates	7
In-Cu alloy substrates for low-temperature chemical vapor deposition of Mo2C	7
Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2	7
Controlling conduction band alignment and carrier concentration in gallium-doped magnesium zinc oxide by reactive cosputtering	7
Molecular dynamics study of SiO2 nanohole etching by fluorocarbon ions	7
Ultrathin stable Ohmic contacts for high-temperature operation of β-Ga2O3 devices	7
Adsorption and reaction kinetics of SO2 on graphene: An ultrahigh vacuum surface science study	7
Challenges in porosity characterization of thin films: Cross-evaluation of different techniques	6
Review of key vertical-cavity laser and modulator advances enabled by advanced MBE technology	6
Plasma enhanced atomic layer deposition and atomic layer etching of gallium oxide using trimethylgallium	6
Properties of secondary ions in ion beam sputtering of Ga2O3	6
Kinetics of the low-pressure chemical vapor deposited tungsten nitride process using tungsten hexafluoride and ammonia precursors	6
Radical probe system for in situ measurements of radical densities of hydrogen, oxygen, and nitrogen	6
Disclosing the response of the surface electronic structure in SrTiO3 (001) to strain	6
Cryogenic nanoscale etching of silicon nitride selectively to silicon by alternating SiF4/O2 and Ar plasmas	6
Real-time monitoring of atomic layer etching in Cl2/Ar pulsed gas, pulsed power plasmas by optical emission spectroscopy	6
Impact of chemical bonding difference of ALD Mo on SiO2 and Al2O3 on the effective work function of the two gate stacks	6
Control of etch profiles in high aspect ratio holes via precise reactant dosing in thermal atomic layer etching	6
Characterizations of two-dimensional materials with cryogenic ultrahigh vacuum near-field optical microscopy in the visible range	6
Atomic layer deposition of sodium fluoride thin films	6
Plasma-assisted gas-phase aggregation of clusters for functional nanomaterials	6
Study of SnO/ɛ-Ga2O3 p–n diodes in planar geometry	6
Synthesis and electrical behavior of VO2 thin films grown on SrRuO3 electrode layers	6
Gas-phase surface functionalization of SiNx with benzaldehyde to increase SiO2 to SiNx etch selectivity in atomic layer etching	6
Focus ring geometry influence on wafer edge voltage distribution for plasma processes	6
Comprehensive ion-molecule reactive collision model for processing plasmas	6
Atomic layer deposition of TbF3 thin films	6
Growth and characterization of II-VI semiconductor multilayer quantum-well structures for two-color quantum well infrared photodetector applications	6
Self-assembled vertically aligned nanocomposite systems integrated on silicon substrate: Progress and future perspectives	6
Evaluation of nickel self-sputtering yields by molecular-dynamics simulation	6
Atmospheric pressure plasma reduction of copper oxide to copper metal	6
Selective atomic layer deposition on flexible polymeric substrates employing a polyimide adhesive as a physical mask	6
Radio-frequency magnetron sputter deposition of ultrathick boron carbide films	6
Conductive TiN thin films grown by plasma-enhanced atomic layer deposition: Effects of N-sources and thermal treatments	6
Thermal versus radiation-assisted defect annealing in β-Ga2O3	6
Acquisition and analysis of scanning tunneling spectroscopy data—WSe2 monolayer	6
Modeling atomic layer deposition process parameters to achieve dense nanocrystal-based nanocomposites	6
Deposition of tungsten oxide films by reactive magnetron sputtering on different substrates	6
Plasma enhanced atomic layer deposition of titanium nitride-molybdenum nitride solid solutions	6
Properties of Schottky barrier diodes on heteroeptixial α-Ga2O3 thin films	6
Molecular beam epitaxy of polar III-nitride resonant tunneling diodes	6
Epitaxial growth of the first two members of the Ban+1InnO2.5n+1 Ruddlesden–Popper homologous series	6
Low-temperature atomic layer deposition of indium oxide thin films using trimethylindium and oxygen plasma	5
X-ray spectroscopic identification of strain and structure-based resonances in a series of saturated carbon-cage molecules: Adamantane, twistane, octahedrane, and cubane	5
Two step synthesis of ultrathin transition metal tellurides	5
High temperature isotropic and anisotropic etching of silicon carbide using forming gas	5
Characteristics of carbon-containing low-k dielectric SiCN thin films deposited via remote plasma atomic layer deposition	5
Atomic layer deposition of GdF3 thin films	5
Spin- and time-resolved photoelectron spectroscopy and diffraction studies using time-of-flight momentum microscopes	5
Ga+-focused ion beam damage in n-type Ga2O3	5
Growth and characterization of α-Ga2O3 on sapphire and nanocrystalline β-Ga2O3 on diamond substrates by halide vapor phase epitaxy	5
Effects of frequency and pulse width on electron density, hydrogen peroxide generation, and perfluorooctanoic acid mineralization in a nanosecond pulsed discharge gas-liquid plasma reactor	5
Area-selective atomic layer deposition of Al2O3 on SiNx with SiO2 as the nongrowth surface	5
Thermal atomic layer etching of cobalt using sulfuryl chloride for chlorination and tetramethylethylenediamine or trimethylphosphine for ligand addition	5
Shake loss intensities in x-ray photoelectron spectroscopy: Theory, experiment, and atomic composition accuracy for MgO and related compounds	5
Propagation of nanosecond plasmas in liquids—Streamer velocities and streamer lengths	5
Harmonic suppression and uniformity improvement of plasma density in capacitively coupled plasma	5
Thermal stability of band offsets of NiO/GaN	5
Material properties and performance of ErAs:In(Al)GaAs photoconductors for 1550 nm laser operation	5
Impact of precursor concentration on the properties of perovskite solar cells obtained from the dehydrated lead acetate precursors	5
Crystallinity degradation and defect development in (AlxGa1−x)2O3 thin films with increased Al composition	5
Area selective deposition of ruthenium on 3D structures	5
High resolution depth profiling using near-total-reflection hard x-ray photoelectron spectroscopy	5
Design of line seeds for glancing angle deposition	5
Scaling of atomic layer etching of SiO2 in fluorocarbon plasmas: Transient etching and surface roughness	5
Hybrid molecular beam epitaxy growth of BaTiO3 films	5
Spontaneous etching of B2O3 by HF gas studied using infrared spectroscopy, mass spectrometry, and density functional theory	5
In situ ellipsometry aided rapid ALD process development and parameter space visualization of cerium oxide nanofilms	5
Multiple carrier transport in high-quality α-Sn films grown on CdTe (001) by molecular beam epitaxy	5
In situ studies on atomic layer etching of aluminum oxide using sequential reactions with trimethylaluminum and hydrogen fluoride	5
Desorption characteristics of selenium and tellurium thin films	5
Low temperature Topographically Selective Deposition by Plasma Enhanced Atomic Layer Deposition with ion bombardment assistance	5
Aminosilane small molecule inhibitors for area-selective deposition: Study of substrate-inhibitor interfacial interactions	5
Functionalized carbon nanotubes for thermionic emission and cooling applications	5
NiO/β-(AlxGa1−x)2O3/Ga2O3 heterojunction lateral rectifiers with reverse breakdown voltage >7 kV	5