Journal of Vacuum Science & Technology A

Papers
(The H4-Index of Journal of Vacuum Science & Technology A is 20. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2021-09-01 to 2025-09-01.)
ArticleCitations
Use of in situ electrical conductance measurements to understand the chemical mechanisms and chamber wall effects during vapor phase infiltration doping of poly(aniline) with TiCl4 + H2O96
Core-shell metallic nanotube arrays for highly sensitive surface-enhanced Raman scattering (SERS) detection78
In situ metal organic chemical vapor deposition of ultrathin sp2-bonded boron nitride dielectric on gallium nitride52
On the interplay between a novel iron and iron-carbide atomic layer deposition process, the carbon nanotube growth, and the metal–carbon nanotube coating properties on silica substrates51
Implementation of an artificial spiking neuron with photoreceptor functionality using gas discharge tubes46
High surface quality Y2SiO5 silicate-crystal waveguides etched by chlorine-based inductive coupled plasma reactive ion etching46
Application of high-spatial-resolution distributed fiber-optic sensing technique for neutral gas temperature mapping in inductively coupled Ar plasmas43
Friction and wear behavior of C implanted copper via ion beam-assisted bombardment42
Analysis of pulsed direct current reactive magnetron sputtering on a silicon target38
Enhancing chemical vapor deposition growth and fabrication techniques to maximize hole conduction in tungsten diselenide for monolithic CMOS integration31
Transport and trap states in proton irradiated ultra-thick κ-Ga2O330
Erratum: “MoS2-assisted growth of highly-oriented AlN thin films by low-temperature van der Waals epitaxy” [J. Vac. Sci. Technol. A 42, 050401 (2024)]30
Peak intensities in Auger electron spectroscopy for quantification: Relationship between differentiated spectral intensities and direct peak areas28
Extreme atomic-scale surface roughening: Amino acids on Ag on Au(111)28
Using auxiliary electrochemical working electrodes as probe during contact glow discharge electrolysis: A proof of concept study26
Testing commonly used background removal procedures for XPS quantitation of homogeneous material: Fe2O3, a transition metal oxide example26
Kinetic Monte Carlo study on the effect of growth conditions on the epitaxial growth of 3C–SiC (0001) vicinal surface26
Novel principal component analysis tool based on python for analysis of complex spectra of time-of-flight secondary ion mass spectrometry25
Plasma enhanced atomic layer etching of high-k layers on WS224
Study on the modification of TC11 titanium alloy microarc oxidized film layer by ZrO2 particles20
Influence of plasma species on the early-stage growth kinetics of epitaxial InN grown by plasma-enhanced atomic layer deposition20
Effects of duty cycle and nitrogen flow rate on the mechanical properties of (V,Mo)N coatings deposited by high-power pulsed magnetron sputtering20
Nitrogen-incorporated tetrahedral amorphous carbon optically transparent thin film electrode20
Understanding the unique optical and vibrational signatures of sequential infiltration synthesis derived indium oxyhydroxide clusters for CO2 absorption20
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