Journal of Vacuum Science & Technology A

Papers
(The H4-Index of Journal of Vacuum Science & Technology A is 28. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2020-03-01 to 2024-03-01.)
ArticleCitations
Practical guide for curve fitting in x-ray photoelectron spectroscopy280
Practical guides for x-ray photoelectron spectroscopy (XPS): Interpreting the carbon 1s spectrum195
Introduction to x-ray photoelectron spectroscopy164
Practical guides for x-ray photoelectron spectroscopy: Quantitative XPS132
XPS guide: Charge neutralization and binding energy referencing for insulating samples113
Assessment of the frequency and nature of erroneous x-ray photoelectron spectroscopy analyses in the scientific literature104
Misconceptions in interpretation of nitrogen chemistry from x-ray photoelectron spectra94
X-ray photoelectron spectroscopy: A perspective on quantitation accuracy for composition analysis of homogeneous materials71
Practical guide to the use of backgrounds in quantitative XPS71
Thermal atomic layer etching: A review59
Introductory guide to backgrounds in XPS spectra and their impact on determining peak intensities59
Many routes to ferroelectric HfO2: A review of current deposition methods57
The role of plasma in plasma-enhanced atomic layer deposition of crystalline films48
Next generation nanopatterning using small molecule inhibitors for area-selective atomic layer deposition45
Ion implantation in β-Ga2O3: Physics and technology44
High-temperature low-pressure chemical vapor deposition of β-Ga2O342
Guide to making XPS measurements on nanoparticles42
Effect of metal contacts on (100) β-Ga2O3 Schottky barriers40
Optimization of HiPIMS discharges: The selection of pulse power, pulse length, gas pressure, and magnetic field strength35
Introduction to topical collection: Reproducibility challenges and solutions with a focus on guides to XPS analysis35
Sample handling, preparation and mounting for XPS and other surface analytical techniques33
Plasma deposition—Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition31
Effect of probe geometry during measurement of >100 A Ga2O3 vertical rectifiers30
Heteroepitaxial growth of β-Ga2O3 films on SiC via molecular beam epitaxy30
Deep level defect states in β-, α-, and ɛ-Ga2O3 crystals and films: Impact on device performance30
Epitaxial metals for interconnects beyond Cu29
Tutorial on forming through-silicon vias28
New strategies for conformal, superconformal, and ultrasmooth films by low temperature chemical vapor deposition28
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