OOIR: Observatory of International Research

Papers

(The H4-Index of Microelectronic Engineering is 22. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2021-09-01 to 2025-09-01.)

Article	Citations
Stress measurement based on magnetic Barkhausen noise for thin films	71
Optimizing dose parameters for enhanced maskless lithography in MoS2-based devices	61
Growth chemistry and electrical performance of ultrathin alumina formed by area selective vapor phase infiltration	60
Evolution of etch profile of <111> silicon in HNA solution	45
A simulation study of grayscale ice lithography for spiral phase plates in near infrared wavelengths	36
Editorial Board	36
Neural network for in-sensor time series recognition based on optoelectronic memristor	34
Plasma surface treatment of GeSn layers and its subsequent impact on Ni / GeSn solid-state reaction	33
A 10 kHz bandwidth low-power active negative feedback front-end amplifier based on unipolar IZO TFT technology	32
CMOS-compatible GaN-based high electron mobility transistors with gate-first technology	32
Humidity-dependent synaptic characteristics in gelatin-based organic transistors	31
A dual-mass fully decoupled MEMS gyroscope with optimized structural design for minimizing mechanical quadrature coupling	30
The effect of switching and cycle-to-cycle variations of RRAM on 4-bit encryption/decryption process	29
The role of etching gas purity in C4F8/Ar plasma to optimize SiO2 etching process	29
Digital filter on FPGA for subcellular resolution electrophysiology using a high-density CMOS-based microelectrode array	29
Selective functionalization of silicon nitride with a water-soluble etch-resistant polymer	27
Spin coating in semiconductor lithography: Advances in modeling and future prospects	25
A multi-user wearable waistband system for real-time health monitoring of respiration, ECG, and body temperature	25
Strategies and approaches for RFID tag integration in textiles	23
Simulation and optimization of reactor airflow and magnetic field for enhanced thin film uniformity in physical vapor deposition	23
A novel and reliable approach for controlling silicon membrane thickness with smooth surface	23
Optimization of edge bead removal (EBR) process to enhance defect reduction in optical lithography	22