OOIR: Observatory of International Research

Papers

(The H4-Index of Microelectronic Engineering is 21. The table below lists those papers that are above that threshold based on CrossRef citation counts [max. 250 papers]. The publications cover those that have been published in the past four years, i.e., from 2021-10-01 to 2025-10-01.)

Article	Citations
Neural network for in-sensor time series recognition based on optoelectronic memristor	74
CMOS-compatible GaN-based high electron mobility transistors with gate-first technology	62
Plasma surface treatment of GeSn layers and its subsequent impact on Ni / GeSn solid-state reaction	62
A dual-mass fully decoupled MEMS gyroscope with optimized structural design for minimizing mechanical quadrature coupling	47
Humidity-dependent synaptic characteristics in gelatin-based organic transistors	38
Evolution of etch profile of <111> silicon in HNA solution	37
Editorial Board	35
Stress measurement based on magnetic Barkhausen noise for thin films	35
The effect of switching and cycle-to-cycle variations of RRAM on 4-bit encryption/decryption process	34
A simulation study of grayscale ice lithography for spiral phase plates in near infrared wavelengths	34
A 10 kHz bandwidth low-power active negative feedback front-end amplifier based on unipolar IZO TFT technology	33
Growth chemistry and electrical performance of ultrathin alumina formed by area selective vapor phase infiltration	30
Optimizing dose parameters for enhanced maskless lithography in MoS2-based devices	30
A multi-user wearable waistband system for real-time health monitoring of respiration, ECG, and body temperature	30
The role of etching gas purity in C4F8/Ar plasma to optimize SiO2 etching process	29
Strategies and approaches for RFID tag integration in textiles	27
Simulation and optimization of reactor airflow and magnetic field for enhanced thin film uniformity in physical vapor deposition	26
Optimization of edge bead removal (EBR) process to enhance defect reduction in optical lithography	25
Spin coating in semiconductor lithography: Advances in modeling and future prospects	24
A novel and reliable approach for controlling silicon membrane thickness with smooth surface	23
Experimental and theoretical insights into electronic properties of oxygen-doped MoTe2 field effect transistor	23
Dependence of frequency-temperature stability on support tethers in dual-beam piezoresistive sensing MEMS resonators	21
Etch characteristics of cobalt thin films using high density plasma of CH3COCH3/Ar gas mixture	21
Selective functionalization of silicon nitride with a water-soluble etch-resistant polymer	21
Stable electrospray signal on a microfabricated glass chip with three-dimensional open edge and tiered depth geometries	21

Neural networks based on in-sensor computing of optoelectronic memristor